Indrajit Lahiri

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Removal of process residues on the backside of a substrate
- Patent number 8,083,963
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Patent number 7,582,167
- Issue date Sep 1, 2009
- Applied Materials, Inc.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Patent number 7,279,049
- Issue date Oct 9, 2007
- Applied Materials, Inc.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma dielectric etch process including ex-situ backside polymer r...
- Patent number 7,276,447
- Issue date Oct 2, 2007
- Applied Materials, Inc.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring the position of a semiconductor...
- Patent number 7,107,125
- Issue date Sep 12, 2006
- Applied Materials, Inc.
- Pyongwon Yim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MONITORING THE POSITION OF A SEMICONDUCTOR PROCESSING ROBOT
- Publication number 20100145513
- Publication date Jun 10, 2010
- Applied Materials, Inc.
- Pyongwon Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF PROCESS RESIDUES ON THE BACKSIDE OF A SUBSTRATE
- Publication number 20080194111
- Publication date Aug 14, 2008
- APPLIED MATERIALS, INC.
- Gerardo A. Delgadino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REDUCING ENTRAPMENT OF FOREIGN MATTER ALONG A MOVEABL...
- Publication number 20080017115
- Publication date Jan 24, 2008
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DIELECTRIC ETCH PROCESS INCLUDING EX-SITU BACKSIDE POLYMER R...
- Publication number 20070238305
- Publication date Oct 11, 2007
- APPLIED MATERIALS, INC.
- Gerardo A. Delgadino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MONITORING THE POSITION OF A SEMICONDUCTOR PROCESSING ROBOT
- Publication number 20060224276
- Publication date Oct 5, 2006
- Pyongwon Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for reducing entrapment of foreign matter along a moveabl...
- Publication number 20050172905
- Publication date Aug 11, 2005
- APPLIED MATERIALS, INC.
- Andrzej Kaszuba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for monitoring the position of a semiconductor...
- Publication number 20050096794
- Publication date May 5, 2005
- APPLIED MATERIALS, INC.
- Pyongwon Yim
- H01 - BASIC ELECTRIC ELEMENTS

Indrajit Lahiri

Person

Patents Grantslast 30 patents

Removal of process residues on the backside of a substrate

Apparatus for reducing entrapment of foreign matter along a moveabl...

Apparatus for reducing entrapment of foreign matter along a moveabl...

Plasma dielectric etch process including ex-situ backside polymer r...

Method and apparatus for monitoring the position of a semiconductor...

Patents Applicationslast 30 patents

METHOD FOR MONITORING THE POSITION OF A SEMICONDUCTOR PROCESSING ROBOT

REMOVAL OF PROCESS RESIDUES ON THE BACKSIDE OF A SUBSTRATE

APPARATUS FOR REDUCING ENTRAPMENT OF FOREIGN MATTER ALONG A MOVEABL...

PLASMA DIELECTRIC ETCH PROCESS INCLUDING EX-SITU BACKSIDE POLYMER R...

METHOD FOR MONITORING THE POSITION OF A SEMICONDUCTOR PROCESSING ROBOT

Apparatus for reducing entrapment of foreign matter along a moveabl...

Method and apparatus for monitoring the position of a semiconductor...