Ingemar Carlsson

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Resistivity-based adjustment of measurements from in-situ monitoring
- Patent number 11,199,605
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Resistivity-based calibration of in-situ electromagnetic inductive...
- Patent number 11,079,459
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Kun Xu
- G01 - MEASURING TESTING
Information Patent Grant
Inductive monitoring of conductive loops
- Patent number 10,741,459
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Wei Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Endpoint control of multiple substrate zones of varying thickness i...
- Patent number 10,589,397
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Alain Duboust
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Determination of gain for eddy current sensor
- Patent number 10,556,315
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Endpoint detection with compensation for filtering
- Patent number 10,427,272
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Determination of gain for eddy current sensor
- Patent number 10,207,386
- Issue date Feb 19, 2019
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Inductive monitoring of conductive trench depth
- Patent number 10,103,073
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Wei Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Inductive monitoring of conductive trench depth
- Patent number 9,754,846
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Wei Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Adjusting eddy current measurements
- Patent number 9,636,797
- Issue date May 2, 2017
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback control using detection of clearance and adjustment for un...
- Patent number 9,472,475
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Determination of gain for eddy current sensor
- Patent number 9,281,253
- Issue date Mar 8, 2016
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Determination of gain for eddy current sensor
- Patent number 9,275,917
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
In-situ monitoring system with monitoring of elongated region
- Patent number 9,205,527
- Issue date Dec 8, 2015
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback control of polishing using optical detection of clearance
- Patent number 9,073,169
- Issue date Jul 7, 2015
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
High sensitivity eddy current monitoring system
- Patent number 9,023,667
- Issue date May 5, 2015
- Applied Materials, Inc.
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Grant
Endpoint control of multiple substrates of varying thickness on the...
- Patent number 8,694,144
- Issue date Apr 8, 2014
- Applied Materials, Inc.
- Alain Duboust
- B24 - GRINDING POLISHING
Information Patent Grant
Control of overpolishing of multiple substrates on the same platen...
- Patent number 8,616,935
- Issue date Dec 31, 2013
- Applied Materials, Inc.
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Endpoint control of multiple-wafer chemical mechanical polishing
- Patent number 8,295,967
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Eddy current sensor with enhanced edge resolution
- Patent number 8,284,560
- Issue date Oct 9, 2012
- Applied Materials, Inc.
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Grant
Determining physical property of substrate
- Patent number 8,014,004
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
High throughput measurement system
- Patent number 7,952,708
- Issue date May 31, 2011
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for generating a library of spectra
- Patent number 7,840,375
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Determining physical property of substrate
- Patent number 7,746,485
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Determining physical property of substrate
- Patent number 7,444,198
- Issue date Oct 28, 2008
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Determination of position of sensor measurements during polishing
- Patent number 7,097,537
- Issue date Aug 29, 2006
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
RESISTIVITY-BASED ADJUSTMENT OF THRESHOLDS FOR IN-SITU MONITORING
- Publication number 20220043095
- Publication date Feb 10, 2022
- Applied Materials, Inc.
- Kun Xu
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR
- Publication number 20190134775
- Publication date May 9, 2019
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
INDUCTIVE MONITORING OF CONDUCTIVE LOOPS
- Publication number 20190035699
- Publication date Jan 31, 2019
- Applied Materials, Inc.
- Wei Lu
- B24 - GRINDING POLISHING
Information Patent Application
RESISTIVITY-BASED ADJUSTMENT OF MEASUREMENTS FROM IN-SITU MONITORING
- Publication number 20180203089
- Publication date Jul 19, 2018
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
RESISTIVITY-BASED CALIBRATION OF IN-SITU ELECTROMAGNETIC INDUCTIVE...
- Publication number 20180203090
- Publication date Jul 19, 2018
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
Endpoint Detection With Compensation for Filtering
- Publication number 20180079052
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH
- Publication number 20170365532
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT CONTROL OF MULTIPLE SUBSTRATE ZONES OF VARYING THICKNESS I...
- Publication number 20170151647
- Publication date Jun 1, 2017
- Applied Materials, Inc.
- Alain Duboust
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR
- Publication number 20160158908
- Publication date Jun 9, 2016
- Applied Materials, Inc.
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH
- Publication number 20150371913
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING EDDY CURRENT MEASUREMENTS
- Publication number 20150224623
- Publication date Aug 13, 2015
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR
- Publication number 20150118766
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR
- Publication number 20150118765
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT CONTROL OF MULTIPLE SUBSTRATES OF VARYING THICKNESS ON THE...
- Publication number 20140222188
- Publication date Aug 7, 2014
- Applied Materials, Inc.
- Alain Duboust
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-SITU MONITORING SYSTEM WITH MONITORING OF ELONGATED REGION
- Publication number 20140127971
- Publication date May 8, 2014
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
CONTROL OF POLISHING OF MULTIPLE SUBSTRATES ON THE SAME PLATEN IN C...
- Publication number 20140030956
- Publication date Jan 30, 2014
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Control Of Overpolishing Of Multiple Substrates On the Same Platen...
- Publication number 20140024293
- Publication date Jan 23, 2014
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Feedback Control Using Detection Of Clearance And Adjustment For Un...
- Publication number 20130224890
- Publication date Aug 29, 2013
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDDY CURRENT MONITORING OF METAL RESIDUE OR METAL PILLARS
- Publication number 20120276817
- Publication date Nov 1, 2012
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Application
HIGH SENSITIVITY EDDY CURRENT MONITORING SYSTEM
- Publication number 20120276661
- Publication date Nov 1, 2012
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Application
EDDY CURRENT MONITORING OF METAL FEATURES
- Publication number 20120276662
- Publication date Nov 1, 2012
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Application
Feedback Control of Polishing Using Optical Detection of Clearance
- Publication number 20120064801
- Publication date Mar 15, 2012
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT CONTROL OF MULTIPLE SUBSTRATES OF VARYING THICKNESS ON THE...
- Publication number 20120053717
- Publication date Mar 1, 2012
- Alain Duboust
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Control of Overpolishing of Multiple Substrates on the Same Platen...
- Publication number 20110300775
- Publication date Dec 8, 2011
- Applied Materials, Inc.
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Determining Physical Property of Substrate
- Publication number 20110294400
- Publication date Dec 1, 2011
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA
- Publication number 20110046918
- Publication date Feb 24, 2011
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
Determining Physical Property of Substrate
- Publication number 20100261413
- Publication date Oct 14, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
EDDY CURRENT SENSOR WITH ENHANCED EDGE RESOLUTION
- Publication number 20100124792
- Publication date May 20, 2010
- Applied Materials, Inc.
- Hassan G. Iravani
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT CONTROL OF MULTIPLE-WAFER CHEMICAL MECHANICAL POLISHING
- Publication number 20100120330
- Publication date May 13, 2010
- Applied Materials, Inc.
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT CONTROL OF MULTIPLE-WAFER CHEMICAL MECHANICAL POLISHING
- Publication number 20100120331
- Publication date May 13, 2010
- Applied Materials, Inc.
- Ingemar Carlsson
- B24 - GRINDING POLISHING

Ingemar Carlsson

Person

Patents Grantslast 30 patents

Resistivity-based adjustment of measurements from in-situ monitoring

Resistivity-based calibration of in-situ electromagnetic inductive...

Inductive monitoring of conductive loops

Endpoint control of multiple substrate zones of varying thickness i...

Determination of gain for eddy current sensor

Endpoint detection with compensation for filtering

Determination of gain for eddy current sensor

Inductive monitoring of conductive trench depth

Inductive monitoring of conductive trench depth

Adjusting eddy current measurements

Feedback control using detection of clearance and adjustment for un...

Determination of gain for eddy current sensor

Determination of gain for eddy current sensor

In-situ monitoring system with monitoring of elongated region

Feedback control of polishing using optical detection of clearance

High sensitivity eddy current monitoring system

Endpoint control of multiple substrates of varying thickness on the...

Control of overpolishing of multiple substrates on the same platen...

Endpoint control of multiple-wafer chemical mechanical polishing

Eddy current sensor with enhanced edge resolution

Determining physical property of substrate

High throughput measurement system

Methods and apparatus for generating a library of spectra

Determining physical property of substrate

Determining physical property of substrate

Determination of position of sensor measurements during polishing

Patents Applicationslast 30 patents

RESISTIVITY-BASED ADJUSTMENT OF THRESHOLDS FOR IN-SITU MONITORING

DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

INDUCTIVE MONITORING OF CONDUCTIVE LOOPS

RESISTIVITY-BASED ADJUSTMENT OF MEASUREMENTS FROM IN-SITU MONITORING

RESISTIVITY-BASED CALIBRATION OF IN-SITU ELECTROMAGNETIC INDUCTIVE...

Endpoint Detection With Compensation for Filtering

INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH

ENDPOINT CONTROL OF MULTIPLE SUBSTRATE ZONES OF VARYING THICKNESS I...

DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH

ADJUSTING EDDY CURRENT MEASUREMENTS

DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

DETERMINATION OF GAIN FOR EDDY CURRENT SENSOR

ENDPOINT CONTROL OF MULTIPLE SUBSTRATES OF VARYING THICKNESS ON THE...

IN-SITU MONITORING SYSTEM WITH MONITORING OF ELONGATED REGION

CONTROL OF POLISHING OF MULTIPLE SUBSTRATES ON THE SAME PLATEN IN C...

Control Of Overpolishing Of Multiple Substrates On the Same Platen...

Feedback Control Using Detection Of Clearance And Adjustment For Un...

EDDY CURRENT MONITORING OF METAL RESIDUE OR METAL PILLARS

HIGH SENSITIVITY EDDY CURRENT MONITORING SYSTEM

EDDY CURRENT MONITORING OF METAL FEATURES

Feedback Control of Polishing Using Optical Detection of Clearance

ENDPOINT CONTROL OF MULTIPLE SUBSTRATES OF VARYING THICKNESS ON THE...

Control of Overpolishing of Multiple Substrates on the Same Platen...

Determining Physical Property of Substrate

METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA

Determining Physical Property of Substrate

EDDY CURRENT SENSOR WITH ENHANCED EDGE RESOLUTION

ENDPOINT CONTROL OF MULTIPLE-WAFER CHEMICAL MECHANICAL POLISHING

ENDPOINT CONTROL OF MULTIPLE-WAFER CHEMICAL MECHANICAL POLISHING