Ingo Saenger

Person

Heidenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 10,151,982
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization measuring device, lithography apparatus, measuring arr...
- Patent number 10,041,836
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source for generating a usable output beam for a projecti...
- Patent number 9,955,563
- Issue date Apr 24, 2018
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,817,317
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for compensating at least one defect of an opt...
- Patent number 9,798,249
- Issue date Oct 24, 2017
- Carl Zeiss SMT GmbH
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror
- Patent number 9,678,439
- Issue date Jun 13, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly for increasing the etendue
- Patent number 9,678,432
- Issue date Jun 13, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror system comprising at least one mirror for use for guiding il...
- Patent number 9,665,008
- Issue date May 30, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Collector
- Patent number 9,645,503
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for compensating a defect of a channel of a mi...
- Patent number 9,632,413
- Issue date Apr 25, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, in particular of a microlithographic projection exp...
- Patent number 9,588,433
- Issue date Mar 7, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithographically transferring a pattern on a light sensit...
- Patent number 9,581,910
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for an EUV lithography device and facet mirror...
- Patent number 9,551,941
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,507,269
- Issue date Nov 29, 2016
- Carl Zeiss SMT GmbH
- Christoph Hennerkes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus...
- Patent number 9,500,956
- Issue date Nov 22, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for a microlithographic projection exposure apparatu...
- Patent number 9,488,918
- Issue date Nov 8, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source for generating a used output beam for a projection...
- Patent number 9,477,025
- Issue date Oct 25, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for a microlithographic projection exposure apparatu...
- Patent number 9,448,489
- Issue date Sep 20, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system for a microlithographic projection exposure apparatu...
- Patent number 9,442,385
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-influencing optical arrangement, in particular in a mi...
- Patent number 9,411,245
- Issue date Aug 9, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,405,202
- Issue date Aug 2, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,323,156
- Issue date Apr 26, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,316,920
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for a projection exposure apparatus
- Patent number 9,195,057
- Issue date Nov 24, 2015
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,182,677
- Issue date Nov 10, 2015
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G02 - OPTICS
Information Patent Grant
Method for adjusting an optical system of a microlithographic proje...
- Patent number 9,140,994
- Issue date Sep 22, 2015
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system for a microlithographic projection exposure apparatus
- Patent number 8,922,753
- Issue date Dec 30, 2014
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 8,917,433
- Issue date Dec 23, 2014
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system, in particular of a microlithographic projection exp...
- Patent number 8,891,060
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Optical system, in particular of a microlithographic projection exp...
- Patent number 8,098,366
- Issue date Jan 17, 2012
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20160195815
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...
- Publication number 20160004164
- Publication date Jan 7, 2016
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY FOR INCREASING THE ETENDUE
- Publication number 20150355552
- Publication date Dec 10, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EUV LIGHT SOURCE FOR GENERATING A USED OUTPUT BEAM FOR A PROJECTION...
- Publication number 20150323874
- Publication date Nov 12, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
POLARIZATION MEASURING DEVICE, LITHOGRAPHY APPARATUS, MEASURING ARR...
- Publication number 20150323387
- Publication date Nov 12, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...
- Publication number 20150301455
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150277235
- Publication date Oct 1, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...
- Publication number 20150173163
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR
- Publication number 20150160561
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20150160566
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150085272
- Publication date Mar 26, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20150062551
- Publication date Mar 5, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150029480
- Publication date Jan 29, 2015
- Carl Zeiss SMT GMBH
- Frank Schlesener
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR COMPENSATING A DEFECT OF A CHANNEL OF A MI...
- Publication number 20150017589
- Publication date Jan 15, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20140362360
- Publication date Dec 11, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
METHOD FOR ADJUSTING AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJE...
- Publication number 20140362362
- Publication date Dec 11, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPT...
- Publication number 20140347646
- Publication date Nov 27, 2014
- Vladimir Dmitriev
- G02 - OPTICS
Information Patent Application
POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MI...
- Publication number 20140313498
- Publication date Oct 23, 2014
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20140285788
- Publication date Sep 25, 2014
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140268085
- Publication date Sep 18, 2014
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
MIRROR SYSTEM COMPRISING AT LEAST ONE MIRROR FOR USE FOR GUIDING IL...
- Publication number 20140226142
- Publication date Aug 14, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
COLLECTOR
- Publication number 20140192339
- Publication date Jul 10, 2014
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140168739
- Publication date Jun 19, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...
- Publication number 20140132942
- Publication date May 15, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20140111785
- Publication date Apr 24, 2014
- Christoph Hennerkes
- G02 - OPTICS
Information Patent Application
Optical system, in particular of a microlithographic projection exp...
- Publication number 20130271741
- Publication date Oct 17, 2013
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20130077077
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130050673
- Publication date Feb 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM...
- Publication number 20110194093
- Publication date Aug 11, 2011
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20110149261
- Publication date Jun 23, 2011
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS

Ingo Saenger

Person

Patents Grantslast 30 patents

Illumination system of a microlithographic projection exposure appa...

Polarization measuring device, lithography apparatus, measuring arr...

EUV light source for generating a usable output beam for a projecti...

Optical system of a microlithographic projection exposure apparatus

Method and apparatus for compensating at least one defect of an opt...

Mirror

Optical assembly for increasing the etendue

Mirror system comprising at least one mirror for use for guiding il...

Collector

Apparatus and method for compensating a defect of a channel of a mi...

Optical system, in particular of a microlithographic projection exp...

Method of lithographically transferring a pattern on a light sensit...

Illumination system for an EUV lithography device and facet mirror...

Illumination optical unit for projection lithography

Optical system of a microlithographic projection exposure apparatus...

Optical system for a microlithographic projection exposure apparatu...

EUV light source for generating a used output beam for a projection...

Optical system for a microlithographic projection exposure apparatu...

Optical system for a microlithographic projection exposure apparatu...

Polarization-influencing optical arrangement, in particular in a mi...

Optical system of a microlithographic projection exposure apparatus

Optical system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure appa...

Illumination optical unit for a projection exposure apparatus

Optical system of a microlithographic projection exposure apparatus

Method for adjusting an optical system of a microlithographic proje...

Optical system for a microlithographic projection exposure apparatus

Optical system of a microlithographic projection exposure apparatus

Optical system, in particular of a microlithographic projection exp...

Optical system, in particular of a microlithographic projection exp...

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...

OPTICAL ASSEMBLY FOR INCREASING THE ETENDUE

EUV LIGHT SOURCE FOR GENERATING A USED OUTPUT BEAM FOR A PROJECTION...

POLARIZATION MEASURING DEVICE, LITHOGRAPHY APPARATUS, MEASURING ARR...

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...

MIRROR

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXP...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

APPARATUS AND METHOD FOR COMPENSATING A DEFECT OF A CHANNEL OF A MI...

ILLUMINATION OPTICAL UNIT FOR A PROJECTION EXPOSURE APPARATUS

METHOD FOR ADJUSTING AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJE...

METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPT...

POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MI...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MIRROR SYSTEM COMPRISING AT LEAST ONE MIRROR FOR USE FOR GUIDING IL...

COLLECTOR

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

Optical system, in particular of a microlithographic projection exp...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM...

OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXP...