Isamu Hanyu

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Test photomask, flare evaluation method, and flare compensation method
- Patent number 6,986,973
- Issue date Jan 17, 2006
- Fujitsu Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 6,420,094
- Issue date Jul 16, 2002
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist material and process for the formation...
- Patent number 6,207,342
- Issue date Mar 27, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 6,045,976
- Issue date Apr 4, 2000
- Fujitsu, Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned mask having a transparent etching stopper layer
- Patent number 5,876,877
- Issue date Mar 2, 1999
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,607,821
- Issue date Mar 4, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift optical mask and method of correcting defects in optica...
- Patent number 5,561,010
- Issue date Oct 1, 1996
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composite semiconductor substrate having a single crystal substrate...
- Patent number 5,506,433
- Issue date Apr 9, 1996
- Fujitsu Limited
- Tatsuya Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical exposure method
- Patent number 5,465,220
- Issue date Nov 7, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical mask and exposure method using the optical mask
- Patent number 5,428,478
- Issue date Jun 27, 1995
- Fujitsu, Ltd.
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and an optical mask for use in projectio...
- Patent number 5,418,093
- Issue date May 23, 1995
- Fujitsu Limited
- Satoru Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composite semiconductor substrate and a fabrication process thereof
- Patent number 5,413,951
- Issue date May 9, 1995
- Fujitsu Limited
- Tatsuya Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method of fabricating the same
- Patent number 5,368,963
- Issue date Nov 29, 1994
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Test photomask, flare evaluation method, and flare compensation method
- Publication number 20040023130
- Publication date Feb 5, 2004
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Isamu Hanyu

Person

Patents Grantslast 30 patents

Test photomask, flare evaluation method, and flare compensation method

Optical exposure method

Chemically amplified resist material and process for the formation...

Optical exposure method

Patterned mask having a transparent etching stopper layer

Optical exposure method

Phase shift optical mask and method of correcting defects in optica...

Composite semiconductor substrate having a single crystal substrate...

Optical exposure method

Optical mask and exposure method using the optical mask

Projection exposure method and an optical mask for use in projectio...

Composite semiconductor substrate and a fabrication process thereof

Photomask and method of fabricating the same

Patents Applicationslast 30 patents

Test photomask, flare evaluation method, and flare compensation method