Jack Kuo

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
DC bias in plasma process
- Patent number 12,217,936
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 11,854,766
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 11,404,245
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer for side wall passivation
- Patent number 11,121,025
- Issue date Sep 14, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra low silicon loss high dose implant strip
- Patent number 9,564,344
- Issue date Feb 7, 2017
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilicon etch with high selectivity
- Patent number 8,916,477
- Issue date Dec 23, 2014
- Novellus Systems, Inc.
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,859,432
- Issue date Oct 14, 2014
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced passivation process to protect silicon prior to high dose...
- Patent number 8,721,797
- Issue date May 13, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,313,635
- Issue date Nov 20, 2012
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 7,811,409
- Issue date Oct 12, 2010
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DC Bias in Plasma Process
- Publication number 20240071722
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC Bias in Plasma Process
- Publication number 20220359158
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Layer for Side Wall Passivation
- Publication number 20200105586
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry Ashing by Secondary Excitation
- Publication number 20200098588
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jack Kuo-Ping Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC Bias in Plasma Process
- Publication number 20190267211
- Publication date Aug 29, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20150332933
- Publication date Nov 19, 2015
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON ETCH WITH HIGH SELECTIVITY
- Publication number 20150075715
- Publication date Mar 19, 2015
- Novellus Systems, Inc.
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON ETCH WITH HIGH SELECTIVITY
- Publication number 20140004707
- Publication date Jan 2, 2014
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20130056022
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA P...
- Publication number 20110146909
- Publication date Jun 23, 2011
- LAM RESEARCH CORPORATION
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE...
- Publication number 20110139175
- Publication date Jun 16, 2011
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20110143548
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20100319813
- Publication date Dec 23, 2010
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20080178906
- Publication date Jul 31, 2008
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of removing resist from substrates in resist stripping cham...
- Publication number 20060228889
- Publication date Oct 12, 2006
- Erik A. Edelberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20050284573
- Publication date Dec 29, 2005
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for wet cleaning quartz surfaces of components for plasma p...
- Publication number 20050274396
- Publication date Dec 15, 2005
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

DC bias in plasma process

DC bias in plasma process

DC bias in plasma process

Layer for side wall passivation

Ultra low silicon loss high dose implant strip

Polysilicon etch with high selectivity

Bare aluminum baffles for resist stripping chambers

Enhanced passivation process to protect silicon prior to high dose...

Bare aluminum baffles for resist stripping chambers

Bare aluminum baffles for resist stripping chambers

Patents Applicationslast 30 patents

DC Bias in Plasma Process

DC Bias in Plasma Process

Layer for Side Wall Passivation

Dry Ashing by Secondary Excitation

DC Bias in Plasma Process

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP

POLYSILICON ETCH WITH HIGH SELECTIVITY

POLYSILICON ETCH WITH HIGH SELECTIVITY

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA P...

ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE...

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

Bare aluminum baffles for resist stripping chambers

Methods of removing resist from substrates in resist stripping cham...

Bare aluminum baffles for resist stripping chambers

Methods for wet cleaning quartz surfaces of components for plasma p...