Jacky Huang

Person

Chu-Bei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
System for improving critical dimension uniformity
- Patent number 8,027,529
- Issue date Sep 27, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extracting ordinary and extraordinary optical characteristics for c...
- Patent number 7,787,685
- Issue date Aug 31, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jacky Huang
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for optimizing sub-nanometer critical dimension u...
- Patent number 7,777,884
- Issue date Aug 17, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ming Ke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving critical dimension uniformity
- Patent number 7,732,109
- Issue date Jun 8, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving accuracy of critical dimension metr...
- Patent number 7,580,129
- Issue date Aug 25, 2009
- Taiwan Semiconductor Manufacturing Company
- Shinn-Sheng Yu
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for optical measurement
- Patent number 7,349,086
- Issue date Mar 25, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joung-Wei Liou
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
System For Improving Critical Dimension Uniformity
- Publication number 20100201961
- Publication date Aug 12, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY
- Publication number 20080248403
- Publication date Oct 9, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Optimizing Lithography Focus and/or Energy Us...
- Publication number 20080233487
- Publication date Sep 25, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jacky Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Improving Accuracy of Critical Dimension Metr...
- Publication number 20080204730
- Publication date Aug 28, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G01 - MEASURING TESTING
Information Patent Application
Method and System For Optimizing Sub-Nanometer Critical Dimension U...
- Publication number 20080174778
- Publication date Jul 24, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ming Ke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTRACTING ORDINARY AND EXTRAORDINARY OPTICAL CHARACTERISTICS FOR C...
- Publication number 20070242263
- Publication date Oct 18, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jacky Huang
- G01 - MEASURING TESTING
Information Patent Application
Systems and methods for optical measurement
- Publication number 20070153272
- Publication date Jul 5, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joung-Wei Liou
- G01 - MEASURING TESTING
Information Patent Application
Integrated optical metrology and lithographic process track for dyn...
- Publication number 20060222975
- Publication date Oct 5, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Ming Ke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jacky Huang

Person

Patents Grantslast 30 patents

System for improving critical dimension uniformity

Extracting ordinary and extraordinary optical characteristics for c...

Method and system for optimizing sub-nanometer critical dimension u...

Method and system for improving critical dimension uniformity

Method and system for improving accuracy of critical dimension metr...

Systems and methods for optical measurement

Patents Applicationslast 30 patents

System For Improving Critical Dimension Uniformity

METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY

Method and System for Optimizing Lithography Focus and/or Energy Us...

Method and System for Improving Accuracy of Critical Dimension Metr...

Method and System For Optimizing Sub-Nanometer Critical Dimension U...

EXTRACTING ORDINARY AND EXTRAORDINARY OPTICAL CHARACTERISTICS FOR C...

Systems and methods for optical measurement

Integrated optical metrology and lithographic process track for dyn...