Jacobus Burghoorn

Person

Haelen, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,675,175
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,395,755
- Issue date Mar 12, 2013
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a marker on a substrate, lithographic apparatu...
- Patent number 8,264,664
- Issue date Sep 11, 2012
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 8,139,217
- Issue date Mar 20, 2012
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker structure and method for controlling alignment of layers of...
- Patent number 7,879,682
- Issue date Feb 1, 2011
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,880,880
- Issue date Feb 1, 2011
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and exposure apparatus for performing a tilted focus and a d...
- Patent number 7,834,975
- Issue date Nov 16, 2010
- ASML Netherlands B.V.
- Jacobus Burghoorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker structure and method for controlling alignment of layers of...
- Patent number 7,629,697
- Issue date Dec 8, 2009
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,576,834
- Issue date Aug 18, 2009
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, a tilting device method for performing a tilted...
- Patent number 7,518,706
- Issue date Apr 14, 2009
- ASML Netherlands B.V.
- Jan Hauschild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a marker on a substrate, lithographic apparatu...
- Patent number 7,476,490
- Issue date Jan 13, 2009
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,439,531
- Issue date Oct 21, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,332,732
- Issue date Feb 19, 2008
- ASML Netherlands, B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,329,888
- Issue date Feb 12, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,297,971
- Issue date Nov 20, 2007
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric alignment system for use in vacuum-based lithograph...
- Patent number 6,876,436
- Issue date Apr 5, 2005
- ASML Netherlands, B.V.
- Jacobus Burghoorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric alignment system for use in vacuum-based lithograph...
- Patent number 6,507,388
- Issue date Jan 14, 2003
- ASML Netherlands B.V.
- Jacobus Burghoorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20130201466
- Publication date Aug 8, 2013
- ASML NETHERLANDS B.V.
- Richard Alexander GEORGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS
- Publication number 20110128520
- Publication date Jun 2, 2011
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARKER STRUCTURE AND METHOD FOR CONTROLLING ALIGNMENT OF LAYERS OF...
- Publication number 20100068830
- Publication date Mar 18, 2010
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20090284720
- Publication date Nov 19, 2009
- ASML NETHERLANDS B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATU...
- Publication number 20090066921
- Publication date Mar 12, 2009
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080218718
- Publication date Sep 11, 2008
- ASML NETHERLANDS B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20070176128
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and exposure apparatus for performing a tilted focus and a d...
- Publication number 20060279718
- Publication date Dec 14, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Latent overlay metrology
- Publication number 20060139592
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Latent overlay metrology
- Publication number 20060109463
- Publication date May 25, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker structure and method for controlling alignment of layers of...
- Publication number 20060103033
- Publication date May 18, 2006
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060091330
- Publication date May 4, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060086910
- Publication date Apr 27, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081791
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081792
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081790
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a marker on a substrate, lithographic apparatu...
- Publication number 20060008714
- Publication date Jan 12, 2006
- ASML NETHERLANDS, B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20050189502
- Publication date Sep 1, 2005
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Abbe arm calibration system for use in lithographic apparatus
- Publication number 20040184018
- Publication date Sep 23, 2004
- ASML NETHERLANDS B.V.
- Rogier H.M. Groeneveld
- F41 - WEAPONS
Information Patent Application
Interferometric alignment system for use in vacuum-based lithograph...
- Publication number 20030095241
- Publication date May 22, 2003
- ASML NETHERLANDS B.V.
- Jacobus Burghoorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometric alignment system for use in vacuum-based lithograph...
- Publication number 20010006413
- Publication date Jul 5, 2001
- Jacobus Burghoorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jacobus Burghoorn

Person

Patents Grantslast 30 patents

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Method for producing a marker on a substrate, lithographic apparatu...

Alignment systems and methods for lithographic systems

Marker structure and method for controlling alignment of layers of...

Alignment systems and methods for lithographic systems

Method and exposure apparatus for performing a tilted focus and a d...

Marker structure and method for controlling alignment of layers of...

Lithographic apparatus and device manufacturing method

Exposure apparatus, a tilting device method for performing a tilted...

Method for producing a marker on a substrate, lithographic apparatu...

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Interferometric alignment system for use in vacuum-based lithograph...

Interferometric alignment system for use in vacuum-based lithograph...

Patents Applicationslast 30 patents

Lithographic Apparatus and Device Manufacturing Method

ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS

MARKER STRUCTURE AND METHOD FOR CONTROLLING ALIGNMENT OF LAYERS OF...

Lithographic Apparatus and Device Manufacturing Method

METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATU...

Lithographic apparatus and device manufacturing method

Alignment systems and methods for lithographic systems

Method and exposure apparatus for performing a tilted focus and a d...

Latent overlay metrology

Latent overlay metrology

Marker structure and method for controlling alignment of layers of...

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Method for producing a marker on a substrate, lithographic apparatu...

Alignment systems and methods for lithographic systems

Abbe arm calibration system for use in lithographic apparatus

Interferometric alignment system for use in vacuum-based lithograph...

Interferometric alignment system for use in vacuum-based lithograph...