Jacques Faguet

Person

Gilbert, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etching with fluorine, oxygen and noble gas containing pl...
- Patent number 12,131,914
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and platforms for roughness reduction of materia...
- Patent number 12,112,959
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamically adjusted purge timing in wet atomic layer etching
- Patent number 11,915,941
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Jacques Faguet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for wet atomic layer etching of copper
- Patent number 11,866,831
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Christopher Netzband
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for area-selective deposition of polymer films using sequen...
- Patent number 11,691,175
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Omid Zandi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Implementing the post-porosity plasma protection (P4) process using...
- Patent number 11,371,143
- Issue date Jun 28, 2022
- International Business Machines Corporation
- Krystelle Lionti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 11,120,999
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Roughness reduction methods for materials using illuminated etch so...
- Patent number 10,896,824
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Omid Zandi
- B24 - GRINDING POLISHING
Information Patent Grant
Photo-assisted chemical vapor etch for selective removal of ruthenium
- Patent number 10,818,512
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a planarization layer using polymerization ch...
- Patent number 10,115,586
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition method
- Patent number 9,212,420
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Eric M. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition system
- Patent number 9,157,152
- Issue date Oct 13, 2015
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for chemical vapor deposition control
- Patent number 9,139,910
- Issue date Sep 22, 2015
- Tokyo Electron Limited
- Eric M. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for controlling pattern and structure formation b...
- Patent number 8,916,055
- Issue date Dec 23, 2014
- Tokyo Electron Limited
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Dielectric treatment module using scanning IR radiation source
- Patent number 8,895,942
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Junjun Liu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for chemical vapor deposition control
- Patent number 8,852,347
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Eric M. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for performing different deposition processes wit...
- Patent number 8,815,014
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas heating device for a vapor deposition system
- Patent number 8,291,856
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature gas heating device for a vapor deposition system
- Patent number 8,272,347
- Issue date Sep 25, 2012
- Tokyo Electron Limited
- Ronald Nasman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultraviolet treatment apparatus
- Patent number 8,242,460
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Hongyu Yue
- B08 - CLEANING
Information Patent Grant
Plasma enhanced atomic layer deposition system and method
- Patent number 8,163,087
- Issue date Apr 24, 2012
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of integrating PEALD Ta-containing films into Cu metallization
- Patent number 7,959,985
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionized physical vapor deposition (iPVD) process
- Patent number 7,901,545
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Frank M. Cerio, Jr.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for performing plasma enhanced atomic layer depos...
- Patent number 7,897,217
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for fabricating a nano-structure
- Patent number 7,771,790
- Issue date Aug 10, 2010
- Tokyo Electron Limited
- Jacques Faguet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Ionized PVD with sequential deposition and etching
- Patent number 7,744,735
- Issue date Jun 29, 2010
- Tokyo Electron Limited
- Rodney Lee Robison
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of light enhanced atomic layer deposition
- Patent number 7,727,912
- Issue date Jun 1, 2010
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for enlarging a nano-structure
- Patent number 7,569,491
- Issue date Aug 4, 2009
- Tokyo Electron Limited
- Jacques Faguet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for precursor delivery
- Patent number 7,485,338
- Issue date Feb 3, 2009
- Tokyo Electron Limited
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particulate reduction using temperature-controlled chamber shield
- Patent number 7,182,816
- Issue date Feb 27, 2007
- Tokyo Electron Limited
- Mark Kleshock
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods For Stabilization Of Self-Assembled Monolayers (SAMs) Using...
- Publication number 20240017290
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Omid Zandi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods For Wet Atomic Layer Etching Of Copper
- Publication number 20230140900
- Publication date May 11, 2023
- TOKYO ELECTRON LIMITED
- Christopher Netzband
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVAL OF STRAY RUTHENIUM METAL NUCLEI FOR SELECTIVE RUTHENIUM MET...
- Publication number 20220254683
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Omid Zandi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dynamically Adjusted Purge Timing In Wet Atomic Layer Etching
- Publication number 20220254646
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Jacques Faguet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Etching with Fluorine, Oxygen and Noble Gas Containing Pl...
- Publication number 20220199418
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems For Etching A Substrate Using A Hybrid Wet Atomic Layer Etc...
- Publication number 20220148885
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Etching A Substrate Using A Hybrid Wet Atomic Layer Etc...
- Publication number 20220148882
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220102160
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Shigeru TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR USING ULTRA-THIN ETCH STOP LAYERS IN SELECTIVE ATOMIC LA...
- Publication number 20210242031
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLEMENTING THE POST-POROSITY PLASMA PROTECTION (P4) PROCESS USING...
- Publication number 20200378001
- Publication date Dec 3, 2020
- International Business Machines Corporation
- Krystelle Lionti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20200381264
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-ASSISTED CHEMICAL VAPOR ETCH FOR SELECTIVE REMOVAL OF RUTHENIUM
- Publication number 20200243346
- Publication date Jul 30, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...
- Publication number 20200194278
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND PLATFORMS FOR ROUGHNESS REDUCTION OF MATERIA...
- Publication number 20200075351
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING SYSTEMS AND METHODS
- Publication number 20170345665
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Jacques FAGUET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A PLANARIZATION LAYER USING POLYMERIZATION CH...
- Publication number 20170323784
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR COATING OR FILLING A POROUS MATERIAL
- Publication number 20170037509
- Publication date Feb 9, 2017
- TOKYO ELECTRON LIMITED
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION SYSTEM AND METHOD OF OPERATING
- Publication number 20160024651
- Publication date Jan 28, 2016
- TOKYO ELECTRON LIMITED
- Jacques Faguet
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...
- Publication number 20150152556
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...
- Publication number 20130217210
- Publication date Aug 22, 2013
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METH...
- Publication number 20120315404
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Yicheng Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OPERATING FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION SYSTEM
- Publication number 20120213929
- Publication date Aug 23, 2012
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for chemical vapor deposition control
- Publication number 20110303145
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for chemical vapor deposition control
- Publication number 20110305831
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW PLATE UTILIZATION IN FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION
- Publication number 20110244128
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultraviolet treatment apparatus
- Publication number 20110233430
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Hongyu YUE
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR PERFORMING DIFFERENT DEPOSITION PROCESSES WIT...
- Publication number 20110135842
- Publication date Jun 9, 2011
- TOKYO ELECTRON LIMITED
- Jacques FAGUET
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION SYSTEM
- Publication number 20110126762
- Publication date Jun 2, 2011
- TOKYO ELECTRON LIMITED
- Jacques Faguet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High temperature gas heating device for a vapor deposition system
- Publication number 20110061595
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Ronald NASMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition method
- Publication number 20100247803
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jacques Faguet

Person

Patents Grantslast 30 patents

Selective etching with fluorine, oxygen and noble gas containing pl...

Processing systems and platforms for roughness reduction of materia...

Dynamically adjusted purge timing in wet atomic layer etching

Methods for wet atomic layer etching of copper

Methods for area-selective deposition of polymer films using sequen...

Implementing the post-porosity plasma protection (P4) process using...

Plasma etching method

Roughness reduction methods for materials using illuminated etch so...

Photo-assisted chemical vapor etch for selective removal of ruthenium

Method for depositing a planarization layer using polymerization ch...

Chemical vapor deposition method

Vapor deposition system

Method for chemical vapor deposition control

Method and device for controlling pattern and structure formation b...

Dielectric treatment module using scanning IR radiation source

Apparatus for chemical vapor deposition control

Method and system for performing different deposition processes wit...

Gas heating device for a vapor deposition system

High temperature gas heating device for a vapor deposition system

Ultraviolet treatment apparatus

Plasma enhanced atomic layer deposition system and method

Method of integrating PEALD Ta-containing films into Cu metallization

Ionized physical vapor deposition (iPVD) process

Method and system for performing plasma enhanced atomic layer depos...

Method and system for fabricating a nano-structure

Ionized PVD with sequential deposition and etching

Method of light enhanced atomic layer deposition

Method for enlarging a nano-structure

Method for precursor delivery

Particulate reduction using temperature-controlled chamber shield

Patents Applicationslast 30 patents

Methods For Stabilization Of Self-Assembled Monolayers (SAMs) Using...

Methods For Wet Atomic Layer Etching Of Copper

REMOVAL OF STRAY RUTHENIUM METAL NUCLEI FOR SELECTIVE RUTHENIUM MET...

Dynamically Adjusted Purge Timing In Wet Atomic Layer Etching

Selective Etching with Fluorine, Oxygen and Noble Gas Containing Pl...

Systems For Etching A Substrate Using A Hybrid Wet Atomic Layer Etc...

Methods For Etching A Substrate Using A Hybrid Wet Atomic Layer Etc...

ETCHING METHOD AND ETCHING APPARATUS

METHOD FOR USING ULTRA-THIN ETCH STOP LAYERS IN SELECTIVE ATOMIC LA...

IMPLEMENTING THE POST-POROSITY PLASMA PROTECTION (P4) PROCESS USING...

PLASMA ETCHING METHOD

PHOTO-ASSISTED CHEMICAL VAPOR ETCH FOR SELECTIVE REMOVAL OF RUTHENIUM

ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...

PROCESSING SYSTEMS AND PLATFORMS FOR ROUGHNESS REDUCTION OF MATERIA...

ATOMIC LAYER ETCHING SYSTEMS AND METHODS

METHOD FOR DEPOSITING A PLANARIZATION LAYER USING POLYMERIZATION CH...

METHOD FOR COATING OR FILLING A POROUS MATERIAL

VAPOR DEPOSITION SYSTEM AND METHOD OF OPERATING

METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...

METHOD AND DEVICE FOR CONTROLLING PATTERN AND STRUCTURE FORMATION B...

APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METH...

METHOD OF OPERATING FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION SYSTEM

Apparatus for chemical vapor deposition control

Method for chemical vapor deposition control

FLOW PLATE UTILIZATION IN FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION

Ultraviolet treatment apparatus

METHOD AND SYSTEM FOR PERFORMING DIFFERENT DEPOSITION PROCESSES WIT...

VAPOR DEPOSITION SYSTEM

High temperature gas heating device for a vapor deposition system

Chemical vapor deposition method