Jaeyong CHO

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High power electrostatic chuck design with radio frequency coupling
- Patent number 11,948,826
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Jaeyong Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sheath and temperature control of process kit
- Patent number 11,894,255
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature control for wafer carrier in plasma processing...
- Patent number 11,837,479
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Fernando M. Silveira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sheath and temperature control of a process kit in a substrate proc...
- Patent number 11,551,916
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power electrostatic chuck design with radio frequency coupling
- Patent number 11,532,497
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Jaeyong Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece carrier for high power with enhanced edge sealing
- Patent number 11,127,619
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate supports with embedded RF shield
- Patent number 11,049,755
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- David Benjaminson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with multiple embedded electrodes
- Patent number 10,937,678
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,930,540
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with dual embedded electrodes
- Patent number 10,811,296
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power electrostatic chuck with aperture-reducing plug in a gas...
- Patent number 10,770,270
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for coupling a voltage to portions of a substrate
- Patent number 10,714,372
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with multiple embedded electrodes
- Patent number 10,510,575
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,504,765
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADVANCED METHOD FOR CREATING ELECTROSTATIC CHUCK (ESC) MESA PATTERNS
- Publication number 20240339349
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Joseph Sommers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20240145220
- Publication date May 2, 2024
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING...
- Publication number 20240047246
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Fernando M. Silveira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK PEDESTAL HEATER FOR HIGH BOW WAFERS
- Publication number 20230352332
- Publication date Nov 2, 2023
- ASM IP HOLDING B.V.
- Shubham Garg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEABLE ELECTROSTATIC CHUCK OUTER RING FOR EDGE ARCING MITIGATION
- Publication number 20230118651
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Timothy Joseph FRANKLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING
- Publication number 20230072594
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Jaeyong Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES
- Publication number 20210313213
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...
- Publication number 20210296098
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20210296144
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Xing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES
- Publication number 20210183681
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHEATH AND TEMPERATURE CONTROL OF PROCESS KIT
- Publication number 20210035844
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLIC...
- Publication number 20200286717
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- JAEYONG CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES
- Publication number 20200118861
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORTS WITH EMBEDDED RF SHIELD
- Publication number 20200090972
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- David Benjaminson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER
- Publication number 20200066566
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES
- Publication number 20190088520
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH DUAL EMBEDDED ELECTRODES
- Publication number 20190088519
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR COUPLING A VOLTAGE TO PORTIONS OF A SUBSTRATE
- Publication number 20190088521
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Thai Cheng CHUA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic Chuck Assembly Having A Dielectric Filler
- Publication number 20180308736
- Publication date Oct 25, 2018
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE CARRIER FOR HIGH POWER WITH ENHANCED EDGE SEALING
- Publication number 20170352566
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING
- Publication number 20170352567
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Jaeyong Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WORKPIECE CARRIER WITH GAS PRESSURE IN INNER CAVITIES
- Publication number 20170352565
- Publication date Dec 7, 2017
- Chunlei Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK WITH APERTURE-REDUCING PLUG IN A GAS...
- Publication number 20170352568
- Publication date Dec 7, 2017
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING...
- Publication number 20170323813
- Publication date Nov 9, 2017
- Fernando M. Silveira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES
- Publication number 20170306494
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Xing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jaeyong CHO

Person

Patents Grantslast 30 patents

High power electrostatic chuck design with radio frequency coupling

Sheath and temperature control of process kit

Advanced temperature control for wafer carrier in plasma processing...

Sheath and temperature control of a process kit in a substrate proc...

High power electrostatic chuck design with radio frequency coupling

Workpiece carrier for high power with enhanced edge sealing

Semiconductor substrate supports with embedded RF shield

Substrate support with multiple embedded electrodes

Electrostatic chuck assembly having a dielectric filler

Substrate support with dual embedded electrodes

High power electrostatic chuck with aperture-reducing plug in a gas...

System for coupling a voltage to portions of a substrate

Substrate support with multiple embedded electrodes

Electrostatic chuck assembly having a dielectric filler

Patents Applicationslast 30 patents

ADVANCED METHOD FOR CREATING ELECTROSTATIC CHUCK (ESC) MESA PATTERNS

ELECTROSTATIC CHUCK ASSEMBLY

ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING...

ELECTROSTATIC CHUCK PEDESTAL HEATER FOR HIGH BOW WAFERS

REPLACEABLE ELECTROSTATIC CHUCK OUTER RING FOR EDGE ARCING MITIGATION

HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING

SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES

SHEATH AND TEMPERATURE CONTROL OF A PROCESS KIT IN A SUBSTRATE PROC...

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES

SHEATH AND TEMPERATURE CONTROL OF PROCESS KIT

ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLIC...

SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES

SEMICONDUCTOR SUBSTRATE SUPPORTS WITH EMBEDDED RF SHIELD

ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER

SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES

SUBSTRATE SUPPORT WITH DUAL EMBEDDED ELECTRODES

SYSTEM FOR COUPLING A VOLTAGE TO PORTIONS OF A SUBSTRATE

Electrostatic Chuck Assembly Having A Dielectric Filler

WORKPIECE CARRIER FOR HIGH POWER WITH ENHANCED EDGE SEALING

HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING

WORKPIECE CARRIER WITH GAS PRESSURE IN INNER CAVITIES

HIGH POWER ELECTROSTATIC CHUCK WITH APERTURE-REDUCING PLUG IN A GAS...

ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING...

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES