James Baugh

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Boise, ID, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for removal of contaminates from phaseshift photo...
- Patent number 8,627,836
- Issue date Jan 14, 2014
- Micron Technology, Inc.
- Shad Hedges
- B08 - CLEANING
Information Patent Grant
Methods for forming and cleaning photolithography reticles
- Patent number 7,767,365
- Issue date Aug 3, 2010
- Micron Technology, Inc.
- Craig M. Carpenter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting dimensions of photomask features
- Patent number 7,749,663
- Issue date Jul 6, 2010
- Micron Technology, Inc.
- Robert T. Rasmussen
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and system for removal of contaminates from phaseshift photo...
- Patent number 7,300,526
- Issue date Nov 27, 2007
- Micron Technology, Inc.
- Shad Hedges
- B08 - CLEANING
Information Patent Grant
Method for adjusting dimensions of photomask features
- Patent number 7,186,480
- Issue date Mar 6, 2007
- Micron Technology, Inc.
- Robert T. Rasmussen
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and system for removal of contaminates from phaseshift photo...
- Patent number 7,008,487
- Issue date Mar 7, 2006
- Micron Technology, Inc.
- Shad Hedges
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR REMOVAL OF CONTAMINATES FROM PHASESHIFT PHOTO...
- Publication number 20120237703
- Publication date Sep 20, 2012
- Micron Technology, Inc.
- Shad Hedges
- B08 - CLEANING
Information Patent Application
Methods for forming and cleaning photolithography reticles
- Publication number 20080057411
- Publication date Mar 6, 2008
- Craig M. Carpenter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for adjusting dimensions of photomask features
- Publication number 20070003844
- Publication date Jan 4, 2007
- Robert T. Rasmussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for removal of contaminates from phaseshift photo...
- Publication number 20060144425
- Publication date Jul 6, 2006
- Micron Technology, Inc.
- Shad Hedges
- B08 - CLEANING
Information Patent Application
Method for adjusting dimensions of photomask features
- Publication number 20050130046
- Publication date Jun 16, 2005
- Robert T. Rasmussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY