James F. Cameron

Person

Cambridge, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Underlayer compositions and patterning methods
- Patent number 12,287,576
- Issue date Apr 29, 2025
- DuPont Electronic Materials International, LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aromatic underlayer
- Patent number 12,099,300
- Issue date Sep 24, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,085,854
- Issue date Sep 10, 2024
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,947,258
- Issue date Apr 2, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,852,972
- Issue date Dec 26, 2023
- Rohm and Haas Electronic Materials LLC
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,817,316
- Issue date Nov 14, 2023
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing underlayers
- Patent number 11,733,609
- Issue date Aug 22, 2023
- Rohm and Haas Electronic Materials LLC
- Charlotte A. Cutler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,613,519
- Issue date Mar 28, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,550,217
- Issue date Jan 10, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Zwitterion compounds and photoresists comprising same
- Patent number 11,505,565
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method using silicon-containing underlayers
- Patent number 11,506,979
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Li Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,448,960
- Issue date Sep 20, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon-containing underlayers
- Patent number 11,360,387
- Issue date Jun 14, 2022
- Rohm and Haas Electronic Materials LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aromatic resins for underlayers
- Patent number 11,175,581
- Issue date Nov 16, 2021
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gap-filling method
- Patent number 11,042,093
- Issue date Jun 22, 2021
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive compositions and patterning and metallization p...
- Patent number 10,962,880
- Issue date Mar 30, 2021
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,901,316
- Issue date Jan 26, 2021
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polyarylene resins
- Patent number 10,894,848
- Issue date Jan 19, 2021
- Rohm and Haas Electronic Materials LLC
- Charles R. Kinzie
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aromatic underlayer
- Patent number 10,886,119
- Issue date Jan 5, 2021
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aromatic resins for underlayers
- Patent number 10,790,146
- Issue date Sep 29, 2020
- Rohm and Haas Electronic Materials LLC
- Shintaro Yamada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 10,703,917
- Issue date Jul 7, 2020
- Rohm and Haas Electronic Materials LLC
- John P. Amara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 10,539,873
- Issue date Jan 21, 2020
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Radiation-sensitive compositions and patterning and metallization p...
- Patent number 10,527,935
- Issue date Jan 7, 2020
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoacid generator
- Patent number 10,509,315
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials, LLC
- William Williams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,495,968
- Issue date Dec 3, 2019
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 10,317,795
- Issue date Jun 11, 2019
- Rohm and Haas Electronic Materials LLC
- William Williams
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
- Publication number 20240337946
- Publication date Oct 10, 2024
- DuPont Electronic Materials International, LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING ELECTRON...
- Publication number 20240264528
- Publication date Aug 8, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Sheng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240241440
- Publication date Jul 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240184201
- Publication date Jun 6, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Conner A. Hoelzel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METALLIZATION METHOD
- Publication number 20240055382
- Publication date Feb 15, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20240027904
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20240027905
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME
- Publication number 20240019779
- Publication date Jan 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Li Cui
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...
- Publication number 20230212112
- Publication date Jul 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230213862
- Publication date Jul 6, 2023
- ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Li Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230104130
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...
- Publication number 20230094313
- Publication date Mar 30, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ADHESION PROMOTING PHOTORESIST UNDERLAYER COMPOSITION
- Publication number 20220197143
- Publication date Jun 23, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220137506
- Publication date May 5, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220091506
- Publication date Mar 24, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Ke Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
- Publication number 20220066321
- Publication date Mar 3, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220019143
- Publication date Jan 20, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING UNDERLAYERS
- Publication number 20210397093
- Publication date Dec 23, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Charlotte A Cutler
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
- Publication number 20210343522
- Publication date Nov 4, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
- Publication number 20210341840
- Publication date Nov 4, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AROMATIC UNDERLAYER
- Publication number 20210247695
- Publication date Aug 12, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMATION METHODS
- Publication number 20210200081
- Publication date Jul 1, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Cheng-Bai XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITIONS AND PATTERN FORMATION METHODS USING...
- Publication number 20200379347
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Li Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...
- Publication number 20200356001
- Publication date Nov 12, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING PATTERNS WITH...
- Publication number 20200348592
- Publication date Nov 5, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...
- Publication number 20200218149
- Publication date Jul 9, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION P...
- Publication number 20200201175
- Publication date Jun 25, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Mitsuru Haga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AROMATIC UNDERLAYER
- Publication number 20200142309
- Publication date May 7, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Sheng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AROMATIC UNDERLAYER
- Publication number 20200058494
- Publication date Feb 20, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATOR
- Publication number 20190243239
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- William Williams
- C07 - ORGANIC CHEMISTRY

James F. Cameron

Person

Patents Grantslast 30 patents

Underlayer compositions and patterning methods

Aromatic underlayer

Photoresist compositions and pattern formation methods

Photoresist composition, coated substrate including the photoresist...

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Coating compositions and methods of forming electronic devices

Monomers, polymers and lithographic compositions comprising same

Salts and photoresists comprising same

Photoresist compositions and pattern formation methods

Coating compositions and methods of forming electronic devices

Silicon-containing underlayers

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Photoresist composition, coated substrate including the photoresist...

Zwitterion compounds and photoresists comprising same

Method using silicon-containing underlayers

Salts and photoresists comprising same

Silicon-containing underlayers

Aromatic resins for underlayers

Gap-filling method

Radiation-sensitive compositions and patterning and metallization p...

Iodine-containing polymers for chemically amplified resist composit...

Polyarylene resins

Aromatic underlayer

Aromatic resins for underlayers

Coating compositions suitable for use with an overcoated photoresist

Coating compositions suitable for use with an overcoated photoresist

Radiation-sensitive compositions and patterning and metallization p...

Photoacid generator

Iodine-containing polymers for chemically amplified resist composit...

Photoacid generator

Patents Applicationslast 30 patents

UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

PHOTORESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING ELECTRON...

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

METALLIZATION METHOD

PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...

ADHESION PROMOTING PHOTORESIST UNDERLAYER COMPOSITION

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

SILICON-CONTAINING UNDERLAYERS

COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES

COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES

AROMATIC UNDERLAYER

PATTERN FORMATION METHODS

RESIST UNDERLAYER COMPOSITIONS AND PATTERN FORMATION METHODS USING...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...

RESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING PATTERNS WITH...

IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...

RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION P...

AROMATIC UNDERLAYER

AROMATIC UNDERLAYER

PHOTOACID GENERATOR