James J. Bucchignano

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fused aromatic structures and methods for photolithographic applica...
- Patent number 8,029,975
- Issue date Oct 4, 2011
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microelectronic structure including dual damascene structure and hi...
- Patent number 7,994,639
- Issue date Aug 9, 2011
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microelectronic lithographic alignment using high contrast alignmen...
- Patent number 7,893,549
- Issue date Feb 22, 2011
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structures and methods for low-k or ultra low-k interlayer dielectr...
- Patent number 7,695,897
- Issue date Apr 13, 2010
- International Business Machines Corporation
- James J. Bucchignano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution silicon-containing resist
- Patent number 7,659,050
- Issue date Feb 9, 2010
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fused aromatic structures and methods for photolithographic applica...
- Patent number 7,566,527
- Issue date Jul 28, 2009
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using negative tone silicon-containing resist for e-beam...
- Patent number 7,399,573
- Issue date Jul 15, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,617,086
- Issue date Sep 9, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,251,569
- Issue date Jun 26, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,043,003
- Issue date Mar 28, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,037,097
- Issue date Mar 14, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURES AND METHODS FOR LOW-K OR ULTRA LOW-K INTERLAYER DIELECTR...
- Publication number 20100196806
- Publication date Aug 5, 2010
- International Business Machines Corporation
- James J. Bucchignano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUSED AROMATIC STRUCTURES AND METHODS FOR PHOTOLITHOGRAPHIC APPLICA...
- Publication number 20090286180
- Publication date Nov 19, 2009
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROELECTRONIC LITHOGRAPHIC ALIGNMENT USING HIGH CONTRAST ALIGNMEN...
- Publication number 20090045530
- Publication date Feb 19, 2009
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROELECTRONIC STRUCTURE INCLUDING DUAL DAMASCENE STRUCTURE AND HI...
- Publication number 20090032978
- Publication date Feb 5, 2009
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FUSED AROMATIC STRUCTURES AND METHODS FOR PHOTOLITHOGRAPHIC APPLICA...
- Publication number 20090004596
- Publication date Jan 1, 2009
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TONE SILICON-CONTAINING RESIST FOR E-BEAM LITHOGRAPHY
- Publication number 20080102400
- Publication date May 1, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM
- Publication number 20070269736
- Publication date Nov 22, 2007
- International Business Machines Corporation
- James P. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structures and methods for low-k or ultra low-k interlayer dielectr...
- Publication number 20070259291
- Publication date Nov 8, 2007
- James J. Bucchignano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High resolution silicon-containing resist
- Publication number 20060275694
- Publication date Dec 7, 2006
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Forming a pattern of a negative photoresist
- Publication number 20020123010
- Publication date Sep 5, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

James J. Bucchignano

Person

Patents Grantslast 30 patents

Fused aromatic structures and methods for photolithographic applica...

Microelectronic structure including dual damascene structure and hi...

Microelectronic lithographic alignment using high contrast alignmen...

Structures and methods for low-k or ultra low-k interlayer dielectr...

High resolution silicon-containing resist

Fused aromatic structures and methods for photolithographic applica...

Method for using negative tone silicon-containing resist for e-beam...

Forming a pattern of a negative photoresist

Forming a pattern of a negative photoresist

E-beam application to mask making using new improved KRS resist system

E-beam application to mask making using new improved KRS resist system

Patents Applicationslast 30 patents

STRUCTURES AND METHODS FOR LOW-K OR ULTRA LOW-K INTERLAYER DIELECTR...

FUSED AROMATIC STRUCTURES AND METHODS FOR PHOTOLITHOGRAPHIC APPLICA...

MICROELECTRONIC LITHOGRAPHIC ALIGNMENT USING HIGH CONTRAST ALIGNMEN...

MICROELECTRONIC STRUCTURE INCLUDING DUAL DAMASCENE STRUCTURE AND HI...

FUSED AROMATIC STRUCTURES AND METHODS FOR PHOTOLITHOGRAPHIC APPLICA...

NEGATIVE TONE SILICON-CONTAINING RESIST FOR E-BEAM LITHOGRAPHY

NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM

Structures and methods for low-k or ultra low-k interlayer dielectr...

High resolution silicon-containing resist

Forming a pattern of a negative photoresist