Thompson et al, Molecular parameters and lithographic performance of poly(glycidyl methacrylate-co-ethyl acrylate): A negative electron resist, J. Vac. Sci. Technol., 12 (6), Nov./Dec. 1975: 1280-1283. |
Hirai et al, Epoxide-Containing Polymers as Highly Sensitive Electron-Beam Resists, Electrical Conductivity Measurements 118 (4): 669-672. |
Choong et al, Molecular parameters and lithographic performance of poly(chloromethylstyrene)-a high-performance negative electron resist, J. Vac. Sci. Technol. 19(4), Nov./Dec. 1981: 1121-1126. |
Shaw et al, Performance Characteristics of Diazo-Type Photoresists Under e-Beam and Optical Exposure, IEEE Transactions on Electron Devices ED-25(4), Apr. 1978: 425-430. |
Tanenbaum et al, High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996: 3829-3833. |
Daly et al, Negative-working e-beam copolymers, SPIE 539 Advances in Resist Technology and Processing II, 1985: 138-144. |
Liutkus et al, Poly-4-Chlorostyrene, a New High Contrast Negative E-Beam Resist, SPE Reg. Tech. Conf., Ellenville, NY, 1982: 223-230. |
Feely et al, The Role of the Latent Image in a New Dual Image, Aqueous Developable, Thermally Stable Photoresist, Proceedings of the 7th International Conference on Photopolymers, SPE 49, 1985: 49-64. |
Reiser, Photoreactive Polymers, The Science and Technology of Resists, John Wiley & Sons, NY, 1989: 22, 258 and 311. |
Lee et al, Electron Beam Chemistry of Poly(4-Vinyl Pyridine) and its Quaternized Salts, Polymer Bulletin 10, 1983: 39-44. |
Taniguchi et al, PGMA as a High Resolution High Sensitivity Negative Electron Beam Resist, Japanese Journal of Applied Physics 18(6), Jun. 1979: 1143-1148. |
Tan et al, Novel, Negative-Working Electron-Beam Resist, Proc. SPIE 469135, 1984. |