James J. QUINLIVAN

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating a nitrided silicon-oxide gate dielectric
- Patent number 8,709,887
- Issue date Apr 29, 2014
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective nitridation of gate oxides
- Patent number 7,759,260
- Issue date Jul 20, 2010
- International Business Machines Corporation
- Jay S Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS transistor with a polysilicon gate electrode having varying gr...
- Patent number 7,714,366
- Issue date May 11, 2010
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a nitrided silicon-oxide gate dielectric
- Patent number 7,291,568
- Issue date Nov 6, 2007
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective nitridation of gate oxides
- Patent number 7,138,691
- Issue date Nov 21, 2006
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrided ultra thin gate dielectrics
- Patent number 7,109,559
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Mukesh V. Khare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dioxide removing method
- Patent number 6,967,167
- Issue date Nov 22, 2005
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal nitrogen distribution method to improve uniformity of highl...
- Patent number 6,909,157
- Issue date Jun 21, 2005
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved plasma nitridation of ultra thin gate dielectrics
- Patent number 6,893,979
- Issue date May 17, 2005
- International Business Machines Corporation
- Mukesh V. Khare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing polysilicon depletion in a polysilicon gate elec...
- Patent number 6,893,948
- Issue date May 17, 2005
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal nitrogen distribution method to improve uniformity of highl...
- Patent number 6,706,644
- Issue date Mar 16, 2004
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing polysilicon depletion in a polysilicon gate elec...
- Patent number 6,670,263
- Issue date Dec 30, 2003
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a liner in a trench
- Patent number 6,417,070
- Issue date Jul 9, 2002
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE NITRIDATION OF GATE OXIDES
- Publication number 20100187614
- Publication date Jul 29, 2010
- International Business Machines Corporation
- Jay S. BURNHAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A NITRIDED SILICON-OXIDE GATE DIELECTRIC
- Publication number 20080014692
- Publication date Jan 17, 2008
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NITRIDATION OF GATE OXIDES
- Publication number 20060281265
- Publication date Dec 14, 2006
- International Business Machines Corporation
- Jay S. BURNHAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NITRIDATION OF GATE OXIDES
- Publication number 20050164444
- Publication date Jul 28, 2005
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS TRANSISTOR WITH A POLYSILICON GATE ELECTRODE HAVING VARYING GR...
- Publication number 20050110096
- Publication date May 26, 2005
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitrided ultrathin gate dielectrics
- Publication number 20050087822
- Publication date Apr 28, 2005
- Mukesh V. Khare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON DIOXIDE REMOVING METHOD
- Publication number 20050070101
- Publication date Mar 31, 2005
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A NITRIDED SILICON-OXIDE GATE DIELECTRIC
- Publication number 20050048705
- Publication date Mar 3, 2005
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal nitrogen distribution method to improve uniformity of highl...
- Publication number 20050040480
- Publication date Feb 24, 2005
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing polysilicon depletion in a polysilicon gate elec...
- Publication number 20040023476
- Publication date Feb 5, 2004
- International Business Machines
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL NITROGEN DISTRIBUTION METHOD TO IMPROVE UNIFORMITY OF HIGHL...
- Publication number 20040018688
- Publication date Jan 29, 2004
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing polysilicon depletion in a polysilicon gate elec...
- Publication number 20020149064
- Publication date Oct 17, 2002
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A LINER IN A TRENCH
- Publication number 20020106906
- Publication date Aug 8, 2002
- International Business Machines Corporation
- Arne W. Ballantine
- H01 - BASIC ELECTRIC ELEMENTS

James J. QUINLIVAN

Person

Patents Grantslast 30 patents

Method for fabricating a nitrided silicon-oxide gate dielectric

Selective nitridation of gate oxides

CMOS transistor with a polysilicon gate electrode having varying gr...

Method for fabricating a nitrided silicon-oxide gate dielectric

Selective nitridation of gate oxides

Nitrided ultra thin gate dielectrics

Silicon dioxide removing method

Thermal nitrogen distribution method to improve uniformity of highl...

Method for improved plasma nitridation of ultra thin gate dielectrics

Method of reducing polysilicon depletion in a polysilicon gate elec...

Thermal nitrogen distribution method to improve uniformity of highl...

Method of reducing polysilicon depletion in a polysilicon gate elec...

Method for forming a liner in a trench

Patents Applicationslast 30 patents

SELECTIVE NITRIDATION OF GATE OXIDES

METHOD FOR FABRICATING A NITRIDED SILICON-OXIDE GATE DIELECTRIC

SELECTIVE NITRIDATION OF GATE OXIDES

SELECTIVE NITRIDATION OF GATE OXIDES

CMOS TRANSISTOR WITH A POLYSILICON GATE ELECTRODE HAVING VARYING GR...

Nitrided ultrathin gate dielectrics

SILICON DIOXIDE REMOVING METHOD

METHOD FOR FABRICATING A NITRIDED SILICON-OXIDE GATE DIELECTRIC

Thermal nitrogen distribution method to improve uniformity of highl...

Method of reducing polysilicon depletion in a polysilicon gate elec...

THERMAL NITROGEN DISTRIBUTION METHOD TO IMPROVE UNIFORMITY OF HIGHL...

Method of reducing polysilicon depletion in a polysilicon gate elec...

METHOD FOR FORMING A LINER IN A TRENCH