James R.B. Elmer

Person

Vancouver, WA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-aligned cell integration scheme
- Patent number 7,915,122
- Issue date Mar 29, 2011
- Nantero, Inc.
- Richard J. Carter
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Techniques for precision pattern transfer of carbon nanotubes from...
- Patent number 7,911,034
- Issue date Mar 22, 2011
- Nantero, Inc.
- Shiqun Gu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Techniques for precision pattern transfer of carbon nanotubes from...
- Patent number 7,538,040
- Issue date May 26, 2009
- Nantero, Inc.
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit process monitoring and metrology system
- Patent number 7,115,425
- Issue date Oct 3, 2006
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process independent alignment marks
- Patent number 7,095,483
- Issue date Aug 22, 2006
- LSI Logic Corporation
- David W. Daniel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle overlay correction
- Patent number 7,016,041
- Issue date Mar 21, 2006
- LSI Logic Corporation
- Colin D. Yates
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit process monitoring and metrology system
- Patent number 6,964,924
- Issue date Nov 15, 2005
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process independent alignment marks
- Patent number 6,856,029
- Issue date Feb 15, 2005
- LSI Logic Corporation
- David W. Daniel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective high k dielectrics removal
- Patent number 6,818,516
- Issue date Nov 16, 2004
- LSI Logic Corporation
- Wai Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing microtrenching for borderless via...
- Patent number 6,794,304
- Issue date Sep 21, 2004
- LSI Logic Corporation
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k dielectric bird's beak optimizations using in-situ O...
- Patent number 6,746,925
- Issue date Jun 8, 2004
- LSI Logic Corporation
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi pattern reticle
- Patent number 6,710,851
- Issue date Mar 23, 2004
- LSI Logic Corporation
- James R. B. Elmer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography overlay control
- Patent number 6,472,316
- Issue date Oct 29, 2002
- LSI Logic Corporation
- James R. B. Elmer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NOVEL TECHNIQUES FOR PRECISION PATTERN TRANSFER OF CARBON NANOTUBES...
- Publication number 20090294754
- Publication date Dec 3, 2009
- Nantero, Inc.
- Shiqun GU
- B82 - NANO-TECHNOLOGY
Information Patent Application
Novel techniques for precision pattern transfer of carbon nanotubes...
- Publication number 20070004191
- Publication date Jan 4, 2007
- LSI Logic Corporation
- Shiqun Gu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Use selective growth metallization to improve electrical connection...
- Publication number 20060292716
- Publication date Dec 28, 2006
- LSI Logic Corporation
- Shiqun Gu
- G11 - INFORMATION STORAGE
Information Patent Application
Self-aligned cell integration scheme
- Publication number 20060281256
- Publication date Dec 14, 2006
- Richard J. Carter
- B82 - NANO-TECHNOLOGY
Information Patent Application
Integrated circuit process monitoring and metrology system
- Publication number 20050181615
- Publication date Aug 18, 2005
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process independent alignment marks
- Publication number 20050078289
- Publication date Apr 14, 2005
- LSI Logic Corporation
- David W. Daniel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma removal of high k metal oxide
- Publication number 20050064716
- Publication date Mar 24, 2005
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle overlay correction
- Publication number 20040046961
- Publication date Mar 11, 2004
- Colin D. Yates
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

James R.B. Elmer

Person

Patents Grantslast 30 patents

Self-aligned cell integration scheme

Techniques for precision pattern transfer of carbon nanotubes from...

Techniques for precision pattern transfer of carbon nanotubes from...

Integrated circuit process monitoring and metrology system

Process independent alignment marks

Reticle overlay correction

Integrated circuit process monitoring and metrology system

Process independent alignment marks

Selective high k dielectrics removal

Method and apparatus for reducing microtrenching for borderless via...

High-k dielectric bird&#x00027;s beak optimizations using in-situ O...

Multi pattern reticle

Photolithography overlay control

Patents Applicationslast 30 patents

NOVEL TECHNIQUES FOR PRECISION PATTERN TRANSFER OF CARBON NANOTUBES...

Novel techniques for precision pattern transfer of carbon nanotubes...

Use selective growth metallization to improve electrical connection...

Self-aligned cell integration scheme

Integrated circuit process monitoring and metrology system

Process independent alignment marks

Plasma removal of high k metal oxide

Reticle overlay correction

High-k dielectric bird's beak optimizations using in-situ O...