Jay S. BROWN

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma doping of gap fill materials
- Patent number 12,040,182
- Issue date Jul 16, 2024
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping of gap fill materials
- Patent number 11,508,573
- Issue date Nov 22, 2022
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric barrier at non-volatile memory tile edge
- Patent number 11,069,855
- Issue date Jul 20, 2021
- Intel Corporation
- Kevin L. Baker
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS COMPRISING CRYSTALLINE SEMICONDUCTOR MATERIALS AND METAL...
- Publication number 20240334676
- Publication date Oct 3, 2024
- Micron Technology, Inc.
- Jay S. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING APPARATUS COMPRISING CRYSTALLINE SEMICONDUCTOR M...
- Publication number 20240332015
- Publication date Oct 3, 2024
- Micron Technology, Inc.
- Protyush Sahu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIT LINES HAVING HIGH ELECTRICAL CONDUCTIVITY AND LOW MUTUAL CAPACI...
- Publication number 20230207458
- Publication date Jun 29, 2023
- Micron Technology, Inc.
- Alyssa N. Scarbrough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING OF GAP FILL MATERIALS
- Publication number 20230044518
- Publication date Feb 9, 2023
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC BARRIER AT NON-VOLATILE MEMORY TILE EDGE
- Publication number 20210296582
- Publication date Sep 23, 2021
- Intel Corporation
- Kevin L. BAKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING OF GAP FILL MATERIALS
- Publication number 20210202243
- Publication date Jul 1, 2021
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC BARRIER AT NON-VOLATILE MEMORY TILE EDGE
- Publication number 20210005810
- Publication date Jan 7, 2021
- Intel Corporation
- Kevin L. BAKER
- H01 - BASIC ELECTRIC ELEMENTS

Jay S. BROWN

Person

Patents Grantslast 30 patents

Plasma doping of gap fill materials

Plasma doping of gap fill materials

Dielectric barrier at non-volatile memory tile edge

Patents Applicationslast 30 patents

APPARATUS COMPRISING CRYSTALLINE SEMICONDUCTOR MATERIALS AND METAL...

METHODS OF FORMING APPARATUS COMPRISING CRYSTALLINE SEMICONDUCTOR M...

BIT LINES HAVING HIGH ELECTRICAL CONDUCTIVITY AND LOW MUTUAL CAPACI...

PLASMA DOPING OF GAP FILL MATERIALS

DIELECTRIC BARRIER AT NON-VOLATILE MEMORY TILE EDGE

PLASMA DOPING OF GAP FILL MATERIALS

DIELECTRIC BARRIER AT NON-VOLATILE MEMORY TILE EDGE