Jay T. Scheuer

Person

Rowley, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-slot tubular cathode
- Patent number D1051838
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Bon-Woong Koo
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mismatched optics for angular control of extracted ion beam
- Patent number 11,651,932
- Issue date May 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,631,567
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle yield via beam-line pressure control
- Patent number 11,562,885
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Electrostatic filter providing reduced particle generation
- Patent number 11,437,215
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,127,557
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Cylindrical shaped arc chamber for indirectly heated cathode ion so...
- Patent number 10,818,469
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 10,522,330
- Issue date Dec 31, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
RF clean system for electrostatic elements
- Patent number 10,410,844
- Issue date Sep 10, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid immersion doping
- Patent number 9,805,931
- Issue date Oct 31, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for in-situ cleaning in ion beam apparatus
- Patent number 9,761,410
- Issue date Sep 12, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for contamination control in ion beam apparatus
- Patent number 9,685,298
- Issue date Jun 20, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extended lifetime ion source
- Patent number 9,187,832
- Issue date Nov 17, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Small form factor plasma source for high density wide ribbon ion be...
- Patent number 8,590,485
- Issue date Nov 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Flexible ion source
- Patent number 8,330,127
- Issue date Dec 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density helicon plasma source for wide ribbon ion beam generation
- Patent number 8,142,607
- Issue date Mar 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Conjugated ICP and ECR plasma sources for wide ribbon ion beam gene...
- Patent number 7,999,479
- Issue date Aug 16, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Monitoring plasma ion implantation systems for fault detection and...
- Patent number 7,878,145
- Issue date Feb 1, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Ziwei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation device with a dual pumping mode and method thereof
- Patent number 7,622,722
- Issue date Nov 24, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic monitoring of a Faraday cup for an ion implanter
- Patent number 7,521,691
- Issue date Apr 21, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P. Dzengeleski
- G01 - MEASURING TESTING
Information Patent Grant
Faraday dose and uniformity monitor for plasma based ion implantation
- Patent number 7,132,672
- Issue date Nov 7, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer platen equipped with electrostatic clamp, wafer backside gas...
- Patent number 7,126,808
- Issue date Oct 24, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable conductance limiting aperture for ion implanters
- Patent number 6,791,097
- Issue date Sep 14, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
- Publication number 20240222072
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Stephen Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
- Publication number 20240222070
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Stephen Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mismatched Optics for Angular Control of Extracted Ion Beam
- Publication number 20230131410
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device To Control Uniformity Of Extraction Ion Beam
- Publication number 20230082224
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL
- Publication number 20220037114
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210383995
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210287872
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
- Publication number 20210183609
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...
- Publication number 20200194220
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20200126757
- Publication date Apr 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
RF CLEAN SYSTEM FOR ELECTROSTATIC ELEMENTS
- Publication number 20180166261
- Publication date Jun 14, 2018
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR IN-SITU CLEANING IN ION BEAM APPARATUS
- Publication number 20170221678
- Publication date Aug 3, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...
- Publication number 20170092473
- Publication date Mar 30, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Immersion Doping
- Publication number 20170062221
- Publication date Mar 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20160365225
- Publication date Dec 15, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
EXTENDED LIFETIME ION SOURCE
- Publication number 20140326594
- Publication date Nov 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SMALL FORM FACTOR PLASMA SOURCE FOR HIGH DENSITY WIDE RIBBON ION BE...
- Publication number 20110259269
- Publication date Oct 27, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION
- Publication number 20110034014
- Publication date Feb 10, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONJUGATED ICP AND ECR PLASMA SOURCES FOR WIDE RIBBON ION BEAM GENE...
- Publication number 20100264328
- Publication date Oct 21, 2010
- Costel Biloiu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT
- Publication number 20100155600
- Publication date Jun 24, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P Dzengeleski
- G01 - MEASURING TESTING
Information Patent Application
HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION
- Publication number 20100055345
- Publication date Mar 4, 2010
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Flexible ion source
- Publication number 20090242793
- Publication date Oct 1, 2009
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF electron source for ionizing gas clusters
- Publication number 20090166555
- Publication date Jul 2, 2009
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE
- Publication number 20080245957
- Publication date Oct 9, 2008
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...
- Publication number 20080160212
- Publication date Jul 3, 2008
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC MONITORING OF A FARADAY CUP FOR AN ION IMPLANTER
- Publication number 20080135776
- Publication date Jun 12, 2008
- Joseph P. Dzengeleski
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTATION DEVICE WITH A DUAL PUMPING MODE AND METHOD THEREOF
- Publication number 20080105833
- Publication date May 8, 2008
- Varian Semiconductor Equipment Associates,
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS

Jay T. Scheuer

Person

Patents Grantslast 30 patents

Device to control uniformity of extracted ion beam

Single-slot tubular cathode

Variable thickness ion source extraction plate

Mismatched optics for angular control of extracted ion beam

Ion source with single-slot tubular cathode

Particle yield via beam-line pressure control

In-situ plasma cleaning of process chamber components

Electrostatic filter providing reduced particle generation

Ion source with single-slot tubular cathode

In-situ plasma cleaning of process chamber components

Cylindrical shaped arc chamber for indirectly heated cathode ion so...

In-situ plasma cleaning of process chamber components

RF clean system for electrostatic elements

Liquid immersion doping

Apparatus and method for in-situ cleaning in ion beam apparatus

Apparatus and method for contamination control in ion beam apparatus

Extended lifetime ion source

Small form factor plasma source for high density wide ribbon ion be...

Flexible ion source

High density helicon plasma source for wide ribbon ion beam generation

Conjugated ICP and ECR plasma sources for wide ribbon ion beam gene...

Monitoring plasma ion implantation systems for fault detection and...

Ion implantation device with a dual pumping mode and method thereof

Magnetic monitoring of a Faraday cup for an ion implanter

Faraday dose and uniformity monitor for plasma based ion implantation

Wafer platen equipped with electrostatic clamp, wafer backside gas...

Adjustable conductance limiting aperture for ion implanters

Patents Applicationslast 30 patents

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

Mismatched Optics for Angular Control of Extracted Ion Beam

Device To Control Uniformity Of Extraction Ion Beam

Variable Thickness Ion Source Extraction Plate

PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion So...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

RF CLEAN SYSTEM FOR ELECTROSTATIC ELEMENTS

APPARATUS AND METHOD FOR IN-SITU CLEANING IN ION BEAM APPARATUS

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...

Liquid Immersion Doping

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

EXTENDED LIFETIME ION SOURCE

SMALL FORM FACTOR PLASMA SOURCE FOR HIGH DENSITY WIDE RIBBON ION BE...

COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION

CONJUGATED ICP AND ECR PLASMA SOURCES FOR WIDE RIBBON ION BEAM GENE...

METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT

HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION

Flexible ion source

RF electron source for ionizing gas clusters

TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE

METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...

MAGNETIC MONITORING OF A FARADAY CUP FOR AN ION IMPLANTER

ION IMPLANTATION DEVICE WITH A DUAL PUMPING MODE AND METHOD THEREOF