Jean-Louis Stehle

Person

Colorbes, FR

People

Patents Grantslast 30 patents

Information Patent Grant
Protected pattern mask for reflection lithography in the extreme UV...
- Patent number 7,763,394
- Issue date Jul 27, 2010
- Societe de Production et de Recherches Appliquees Sopra
- Jean-Louis Stehle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Equipment and method for monitoring an immersion lithography device
- Patent number 7,714,992
- Issue date May 11, 2010
- Societe de Production et de Recherches Appliquees (S.O.P.R.A.)
- Jean-Philippe Piel
- G01 - MEASURING TESTING
Information Patent Grant
Compact spectroscopic ellipsometer
- Patent number 7,230,701
- Issue date Jun 12, 2007
- Societe de Production et de Recherches Appliquees
- Jean-Louis Stehle
- G01 - MEASURING TESTING
Information Patent Grant
High spatial resolution infrared ellipsometer
- Patent number 6,819,423
- Issue date Nov 16, 2004
- Societe de Production et de Recherches Appliquees
- Jean-Louise Stehle
- G01 - MEASURING TESTING
Information Patent Grant
Focused beam spectroscopic ellipsometry method and system
- Patent number 6,734,967
- Issue date May 11, 2004
- KLA-Tencor Technologies Corporation
- Timothy R. Piwonka-Corle
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for ellipsometric metrology for a sample conta...
- Patent number 6,687,002
- Issue date Feb 3, 2004
- Societe de Production et de Recherches Appliquees
- Jean-Louis Stehle
- G01 - MEASURING TESTING
Information Patent Grant
High spatial resolution ellipsometry device
- Patent number 5,991,037
- Issue date Nov 23, 1999
- Societe de Production et de Recherches Appliquees
- Jean-Philippe Piel
- G01 - MEASURING TESTING
Information Patent Grant
Focused beam spectroscopic ellipsometry method and system
- Patent number 5,910,842
- Issue date Jun 8, 1999
- KLA-Tencor Corporation
- Timothy R. Piwonka-Corle
- G01 - MEASURING TESTING
Information Patent Grant
Focused beam spectroscopic ellipsometry method and system
- Patent number 5,608,526
- Issue date Mar 4, 1997
- Tencor Instruments
- Timothy R. Piwonka-Corle
- G01 - MEASURING TESTING
Information Patent Grant
Spectroscopic ellipsometry apparatus including an optical fiber
- Patent number 5,329,357
- Issue date Jul 12, 1994
- Sopra-Societe De Production Et De Recherches Appliquees
- Franck Bernoux
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Equipment and Method for Monitoring an Immersion Lithography Device
- Publication number 20090116001
- Publication date May 7, 2009
- Jean-Philippe Piel
- G01 - MEASURING TESTING
Information Patent Application
Protected pattern mask for reflection lithography in the extreme uv...
- Publication number 20070160913
- Publication date Jul 12, 2007
- Jean-Louis Stehle
- B82 - NANO-TECHNOLOGY
Information Patent Application
Focused beam spectroscopic ellipsometry method and system
- Publication number 20050105090
- Publication date May 19, 2005
- Timothy R. Piwonka-Corle
- G01 - MEASURING TESTING
Information Patent Application
Focused beam spectroscopic ellipsometry method and system
- Publication number 20040100632
- Publication date May 27, 2004
- Timothy R. Piwonka-Corle
- G01 - MEASURING TESTING
Information Patent Application
Compact spectroscopic ellipsometer
- Publication number 20040070760
- Publication date Apr 15, 2004
- Jean-Louis Stehle
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for ellipsometric metrology for a sample conta...
- Publication number 20020024668
- Publication date Feb 28, 2002
- Jean-Louis Stehle
- G01 - MEASURING TESTING

Jean-Louis Stehle

Person

Patents Grantslast 30 patents

Protected pattern mask for reflection lithography in the extreme UV...

Equipment and method for monitoring an immersion lithography device

Compact spectroscopic ellipsometer

High spatial resolution infrared ellipsometer

Focused beam spectroscopic ellipsometry method and system

Method and apparatus for ellipsometric metrology for a sample conta...

High spatial resolution ellipsometry device

Focused beam spectroscopic ellipsometry method and system

Focused beam spectroscopic ellipsometry method and system

Spectroscopic ellipsometry apparatus including an optical fiber

Patents Applicationslast 30 patents

Equipment and Method for Monitoring an Immersion Lithography Device

Protected pattern mask for reflection lithography in the extreme uv...

Focused beam spectroscopic ellipsometry method and system

Focused beam spectroscopic ellipsometry method and system

Compact spectroscopic ellipsometer

Method and apparatus for ellipsometric metrology for a sample conta...