Jeffrey W. Anthis

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gap-fill with aluminum-containing films
- Patent number 12,018,363
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,946,135
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electronic device having an oxygen free platinum group metal film
- Patent number 11,894,233
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium film deposition using low valent metal precursors
- Patent number 11,821,070
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Nasrin Kazem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing sacrificial coatings on aerospace components
- Patent number 11,697,879
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Sukti Chatterjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,643,721
- Issue date May 9, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing gate induced drain leakage in DRAM wordline
- Patent number 11,552,082
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen free deposition of platinum group metal films
- Patent number 11,488,830
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD process for NiO film with tunable carbon content
- Patent number 11,396,698
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal precursors with modified diazabutadiene ligands for CVD and A...
- Patent number 11,332,488
- Issue date May 17, 2022
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Water assisted highly pure ruthenium thin film deposition
- Patent number 11,293,093
- Issue date Apr 5, 2022
- Applied Materials Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 11,094,544
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors for the atomic layer deposition of transition metals and...
- Patent number 11,078,224
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium precursors for ALD and CVD thin film deposition and uses...
- Patent number 10,906,925
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Benjamin Schmiege
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Seamless ruthenium gap fill
- Patent number 10,790,188
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Nasrin Kazem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing gate induced drain leakage in DRAM wordline
- Patent number 10,790,287
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal precursors with modified diazabutadiene ligands for CVD and A...
- Patent number 10,752,649
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitrogen-containing ligands and their use in atomic layer depositio...
- Patent number 10,738,008
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Acetylide-based silicon precursors and their use as ALD/CVD precursors
- Patent number 10,699,897
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ formation of non-volatile lanthanide thin film precursors a...
- Patent number 10,643,838
- Issue date May 5, 2020
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition defects removal by chemical etch
- Patent number 10,643,840
- Issue date May 5, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controllable non-volatile metal removal
- Patent number 10,633,743
- Issue date Apr 28, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Tsung-Liang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium precursors for ALD and CVD thin film deposition and uses...
- Patent number 10,577,386
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Benjamin Schmiege
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Methods of depositing metal films using metal oxyhalide precursors
- Patent number 10,483,116
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide and metal removal
- Patent number 10,465,294
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 10,410,865
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition using precursors containing amidoimine ligands
- Patent number 10,364,492
- Issue date Jul 30, 2019
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors for deposition of metal, metal nitride and metal oxide b...
- Patent number 10,323,054
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Benjamin Schmiege
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nitrogen-containing ligands and their use in atomic layer depositio...
- Patent number 10,315,995
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of etching films comprising transition metals
- Patent number 10,297,462
- Issue date May 21, 2019
- Applied Materials Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COPPER REFLOW BY SURFACE MODIFICATION
- Publication number 20240420966
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Zhiyuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING M...
- Publication number 20240332001
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ETCH SELECTIVITY USING HALIDES
- Publication number 20240266180
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS
- Publication number 20240247370
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING
- Publication number 20240248391
- Publication date Jul 25, 2024
- Applied Mateials, Inc.
- Thomas Joseph Knisley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
- Publication number 20240200188
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to Deposit Metal Cap for Interconnect
- Publication number 20240186181
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Ge QU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING
- Publication number 20240128091
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH OF A SUBSTRATE
- Publication number 20230420259
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY TREATMENT FOR SURFACE LOSS REMOVAL IN MICRO-LED STRUCTURES
- Publication number 20230361242
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Michel Khoury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING SACRIFICIAL COATINGS ON AEROSPACE COMPONENTS
- Publication number 20230313380
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Sukti CHATTERJEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
- Publication number 20230227968
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxygen Free Deposition Of Platinum Group Metal Films
- Publication number 20230025937
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM ETCHING PROCESS
- Publication number 20220301887
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Nasrin Kazem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION
- Publication number 20220197146
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Lauren Bagby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ruthenium Film Deposition Using Low Valent Metal Precursors
- Publication number 20210140041
- Publication date May 13, 2021
- Applied Materials, Inc.
- Nasrin Kazem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods To Grow Low Resistivity Metal Containing Films
- Publication number 20210123136
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Of Metal-Organic Oxide Films
- Publication number 20210066592
- Publication date Mar 4, 2021
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING SACRIFICIAL COATINGS ON AEROSPACE COMPONENTS
- Publication number 20200392626
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Sukti CHATTERJEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE
- Publication number 20200388621
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Precursors With Modified Diazabutadiene Ligands For CVD And...
- Publication number 20200377538
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C07 - ORGANIC CHEMISTRY
Information Patent Application
REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE
- Publication number 20200176451
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses...
- Publication number 20200148712
- Publication date May 14, 2020
- Applied Materials, Inc.
- Benjamin Schmiege
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gap-Fill With Aluminum-Containing Films
- Publication number 20200095674
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SELECTIVE DEPOSITION USING MOLYBDENUM HEXACARBONYL
- Publication number 20200071816
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Wei LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Depositing Metal Carbide Films
- Publication number 20200071825
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxygen Free Deposition Of Platinum Group Metal Films
- Publication number 20200063263
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20190385849
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nitrogen-Containing Ligands And Their Use In Atomic Layer Depositio...
- Publication number 20190256467
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
- Publication number 20190148131
- Publication date May 16, 2019
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jeffrey W. Anthis

Person

Patents Grantslast 30 patents

Gap-fill with aluminum-containing films

Low temperature deposition of iridium containing films

Electronic device having an oxygen free platinum group metal film

Ruthenium film deposition using low valent metal precursors

Methods for depositing sacrificial coatings on aerospace components

Low temperature deposition of iridium containing films

Reducing gate induced drain leakage in DRAM wordline

Oxygen free deposition of platinum group metal films

ALD process for NiO film with tunable carbon content

Metal precursors with modified diazabutadiene ligands for CVD and A...

Water assisted highly pure ruthenium thin film deposition

Methods of forming self-aligned vias

Precursors for the atomic layer deposition of transition metals and...

Ruthenium precursors for ALD and CVD thin film deposition and uses...

Seamless ruthenium gap fill

Reducing gate induced drain leakage in DRAM wordline

Metal precursors with modified diazabutadiene ligands for CVD and A...

Nitrogen-containing ligands and their use in atomic layer depositio...

Acetylide-based silicon precursors and their use as ALD/CVD precursors

In-situ formation of non-volatile lanthanide thin film precursors a...

Selective deposition defects removal by chemical etch

System and method for controllable non-volatile metal removal

Ruthenium precursors for ALD and CVD thin film deposition and uses...

Methods of depositing metal films using metal oxyhalide precursors

Oxide and metal removal

Methods of forming self-aligned vias

Film deposition using precursors containing amidoimine ligands

Precursors for deposition of metal, metal nitride and metal oxide b...

Nitrogen-containing ligands and their use in atomic layer depositio...

Methods of etching films comprising transition metals

Patents Applicationslast 30 patents

COPPER REFLOW BY SURFACE MODIFICATION

ATOMIC LAYER DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING M...

ENHANCED ETCH SELECTIVITY USING HALIDES

ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS

EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING

LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS

Method to Deposit Metal Cap for Interconnect

DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING

SELECTIVE ETCH OF A SUBSTRATE

DRY TREATMENT FOR SURFACE LOSS REMOVAL IN MICRO-LED STRUCTURES

METHODS FOR DEPOSITING SACRIFICIAL COATINGS ON AEROSPACE COMPONENTS

LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS

Oxygen Free Deposition Of Platinum Group Metal Films

RUTHENIUM ETCHING PROCESS

PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION

Ruthenium Film Deposition Using Low Valent Metal Precursors

Methods To Grow Low Resistivity Metal Containing Films

Deposition Of Metal-Organic Oxide Films

METHODS FOR DEPOSITING SACRIFICIAL COATINGS ON AEROSPACE COMPONENTS

REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE

Metal Precursors With Modified Diazabutadiene Ligands For CVD And...

REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE

Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses...

Gap-Fill With Aluminum-Containing Films

METHODS FOR SELECTIVE DEPOSITION USING MOLYBDENUM HEXACARBONYL

Methods Of Depositing Metal Carbide Films

Oxygen Free Deposition Of Platinum Group Metal Films

Methods Of Forming Self-Aligned Vias

Nitrogen-Containing Ligands And Their Use In Atomic Layer Depositio...

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION