JEN SHU

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Contact and interconnect metallization for solar cells
- Patent number 9,184,333
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Suketu Arun Parikh
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Double exposure patterning with carbonaceous hardmask
- Patent number 8,293,460
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hui W. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of cleaning and forming a negatively charged passivation lay...
- Patent number 8,268,728
- Issue date Sep 18, 2012
- Applied Materials, Inc.
- Michael P. Stewart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned multi-patterning for advanced critical dimension contacts
- Patent number 8,084,310
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning and forming a negatively charged passivation lay...
- Patent number 8,008,208
- Issue date Aug 30, 2011
- Applied Materials, Inc.
- Michael P. Stewart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming a low dielectric constant carbon-containing film
- Patent number 6,632,478
- Issue date Oct 14, 2003
- Applied Materials, Inc.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric gap fill process that effectively reduces capacitance be...
- Patent number 6,593,615
- Issue date Jul 15, 2003
- National Semiconductor Corporation
- Jen Shu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric films with low dielectric constants
- Patent number 6,576,345
- Issue date Jun 10, 2003
- Patrick A. Van Cleemput
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of using organic material to enhance STI planarization or ot...
- Patent number 6,383,933
- Issue date May 7, 2002
- National Semiconductor Corporation
- Jen Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gap fill process that effectively reduces capacitance be...
- Patent number 6,348,421
- Issue date Feb 19, 2002
- National Semiconductor Corporation
- Jen Shu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to deposit SiOCH films with dielectric constant below 3.0
- Patent number 6,340,628
- Issue date Jan 22, 2002
- Novellus Systems, Inc.
- Patrick A. Van Cleemput
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CONTACT AND INTERCONNECT METALLIZATION FOR SOLAR CELLS
- Publication number 20130288424
- Publication date Oct 31, 2013
- Suketu Arun PARIKH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAY...
- Publication number 20110287577
- Publication date Nov 24, 2011
- Applied Materials, Inc.
- Michael P. Stewart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAY...
- Publication number 20110136286
- Publication date Jun 9, 2011
- Applied Materials, Inc.
- Michael P. Stewart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-ALIGNED MULTI-PATTERNING FOR ADVANCED CRITICAL DIMENSION CONTACTS
- Publication number 20100136792
- Publication date Jun 3, 2010
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK
- Publication number 20090311635
- Publication date Dec 17, 2009
- HUI W. CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for forming a low dielectric constant carbon-containing fil...
- Publication number 20020164429
- Publication date Nov 7, 2002
- APPLIED MATERIALS, INC.
- Frederic Gaillard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Contact and interconnect metallization for solar cells

Double exposure patterning with carbonaceous hardmask

Method of cleaning and forming a negatively charged passivation lay...

Self-aligned multi-patterning for advanced critical dimension contacts

Method of cleaning and forming a negatively charged passivation lay...

Process for forming a low dielectric constant carbon-containing film

Dielectric gap fill process that effectively reduces capacitance be...

Dielectric films with low dielectric constants

Method of using organic material to enhance STI planarization or ot...

Dielectric gap fill process that effectively reduces capacitance be...

Method to deposit SiOCH films with dielectric constant below 3.0

Patents Applicationslast 30 patents

CONTACT AND INTERCONNECT METALLIZATION FOR SOLAR CELLS

METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAY...

METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAY...

SELF-ALIGNED MULTI-PATTERNING FOR ADVANCED CRITICAL DIMENSION CONTACTS

DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK

Methods for forming a low dielectric constant carbon-containing fil...