Jeong Soo Byun

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 10,593,812
- Issue date Mar 17, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Oxide formation in a plasma process
- Patent number 10,319,733
- Issue date Jun 11, 2019
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 10,304,968
- Issue date May 28, 2019
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 10,269,985
- Issue date Apr 23, 2019
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Oxide formation in a plasma process
- Patent number 10,128,258
- Issue date Nov 13, 2018
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 10,090,416
- Issue date Oct 2, 2018
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Oxide formation in a plasma process
- Patent number 9,460,974
- Issue date Oct 4, 2016
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide formation in a plasma process
- Patent number 9,406,574
- Issue date Aug 2, 2016
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 9,031,685
- Issue date May 12, 2015
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,993,453
- Issue date Mar 31, 2015
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 8,940,645
- Issue date Jan 27, 2015
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Oxide formation in a plasma process
- Patent number 8,822,349
- Issue date Sep 2, 2014
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating semiconductor memory with process induced s...
- Patent number 8,691,648
- Issue date Apr 8, 2014
- Cypress Semiconductor Corporation
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 8,626,330
- Issue date Jan 7, 2014
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for fabricating semiconductor memory with process induced s...
- Patent number 8,592,891
- Issue date Nov 26, 2013
- Cypress Semiconductor Corp.
- Igor Polishchuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,318,608
- Issue date Nov 27, 2012
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming image sensor with shield structures
- Patent number 8,168,933
- Issue date May 1, 2012
- ON Semiconductor Trading, Ltd.
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide formation in a plasma process
- Patent number 8,119,538
- Issue date Feb 21, 2012
- Cypress Semiconductor Corporation
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image sensor with a reflective waveguide
- Patent number 8,110,787
- Issue date Feb 7, 2012
- ON Semiconductor Trading, Ltd.
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 8,027,746
- Issue date Sep 27, 2011
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 7,860,597
- Issue date Dec 28, 2010
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,846,840
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma oxidation of a memory layer to form a blocking layer in non-...
- Patent number 7,799,670
- Issue date Sep 21, 2010
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing tungsten after surface treatment
- Patent number 7,749,815
- Issue date Jul 6, 2010
- Applied Materials, Inc.
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing tungsten layers employing atomic layer depos...
- Patent number 7,745,333
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Ken Kaung Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,674,715
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 7,660,644
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of composite tungsten films
- Patent number 7,605,083
- Issue date Oct 20, 2009
- Applied Materials, Inc.
- Ken K. Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of boride barrier layers using chemisorption techniques
- Patent number 7,501,344
- Issue date Mar 10, 2009
- Applied Materials, Inc.
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of boride barrier layers using chemisorption techniques
- Patent number 7,501,343
- Issue date Mar 10, 2009
- Applied Materials, Inc.
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...
- Publication number 20200287056
- Publication date Sep 10, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswamy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Application
OXIDE FORMATION IN A PLASMA PROCESS
- Publication number 20200161324
- Publication date May 21, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Jeong Soo Byun
- B82 - NANO-TECHNOLOGY
Information Patent Application
RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...
- Publication number 20200161478
- Publication date May 21, 2020
- LONGITUDE FLASH MEMORY SOLUTIONS LTD.
- Krishnaswarmy Ramkumar
- B82 - NANO-TECHNOLOGY
Information Patent Application
OXIDE FORMATION IN A PLASMA PROCESS
- Publication number 20190088669
- Publication date Mar 21, 2019
- CYPRESS SEMICONDUCTOR CORPORATION
- Jeong Soo Byun
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radical Oxidation Process For Fabricating A Nonvolatile Charge Trap...
- Publication number 20180351004
- Publication date Dec 6, 2018
- CYPRESS SEMICONDUCTOR CORPORATION
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FORMATION IN A PLASMA PROCESS
- Publication number 20170005108
- Publication date Jan 5, 2017
- CYPRESS SEMICONDUCTOR CORPORATION
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radical Oxidation Process For Fabricating A Nonvolatile Charge Trap...
- Publication number 20150187960
- Publication date Jul 2, 2015
- CYPRESS SEMICONDUCTOR CORPORATION
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20140130739
- Publication date May 15, 2014
- Barry L. CHIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...
- Publication number 20130309826
- Publication date Nov 21, 2013
- CYPRESS SEMICONDUCTOR CORPORATION
- Krishnaswamy RAMKUMAR
- B82 - NANO-TECHNOLOGY
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20120006265
- Publication date Jan 12, 2012
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING IMAGE SENSOR WITH SHIELD STRUCTURES
- Publication number 20120003782
- Publication date Jan 5, 2012
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20110111603
- Publication date May 12, 2011
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20100099270
- Publication date Apr 22, 2010
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20100093170
- Publication date Apr 15, 2010
- APPLIED MATERIALS, INC.
- Moris Kori
- C30 - CRYSTAL GROWTH
Information Patent Application
Plasma oxidation of a memory layer to form a blocking layer in non-...
- Publication number 20090242962
- Publication date Oct 1, 2009
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20090156004
- Publication date Jun 18, 2009
- MORIS KORI
- C30 - CRYSTAL GROWTH
Information Patent Application
RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...
- Publication number 20090011609
- Publication date Jan 8, 2009
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING TUNGSTEN LAYERS EMPLOYING ATOMIC LAYER DEPOS...
- Publication number 20080280438
- Publication date Nov 13, 2008
- Ken Kaung Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMATION OF COMPOSITE TUNGSTEN FILMS
- Publication number 20080227291
- Publication date Sep 18, 2008
- KEN K. LAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE OXIDE FORMATION
- Publication number 20080166893
- Publication date Jul 10, 2008
- Jeong Soo Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING TUNGSTEN AFTER SURFACE TREATMENT
- Publication number 20080014724
- Publication date Jan 17, 2008
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20070254481
- Publication date Nov 1, 2007
- Moris Kori
- C30 - CRYSTAL GROWTH
Information Patent Application
FORMATION OF BORIDE BARRIER LAYERS USING CHEMISORPTION TECHNIQUES
- Publication number 20070197027
- Publication date Aug 23, 2007
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMATION OF BORIDE BARRIER LAYERS USING CHEMISORPTION TECHNIQUES
- Publication number 20070197028
- Publication date Aug 23, 2007
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20060292874
- Publication date Dec 28, 2006
- Moris Kori
- C30 - CRYSTAL GROWTH
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20060223286
- Publication date Oct 5, 2006
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming metal silicide on silicon-containing features of a substrate
- Publication number 20060211202
- Publication date Sep 21, 2006
- APPLIED MATERIALS, INC.
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-situ-etch-assisted HDP deposition
- Publication number 20060166515
- Publication date Jul 27, 2006
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for controlling the presence of fluorine in refra...
- Publication number 20060128132
- Publication date Jun 15, 2006
- APPLIED MATERIALS, INC.
- Ashok Sinha
- C30 - CRYSTAL GROWTH
Information Patent Application
Methods for depositing tungsten layers employing atomic layer depos...
- Publication number 20060009034
- Publication date Jan 12, 2006
- Ken Kaung Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jeong Soo Byun

Person

Patents Grantslast 30 patents

Radical oxidation process for fabricating a nonvolatile charge trap...

Oxide formation in a plasma process

Radical oxidation process for fabricating a nonvolatile charge trap...

Radical oxidation process for fabricating a nonvolatile charge trap...

Oxide formation in a plasma process

Radical oxidation process for fabricating a nonvolatile charge trap...

Oxide formation in a plasma process

Oxide formation in a plasma process

Atomic layer deposition apparatus

Method of fabricating a nonvolatile charge trap memory device

Radical oxidation process for fabricating a nonvolatile charge trap...

Oxide formation in a plasma process

Methods for fabricating semiconductor memory with process induced s...

Atomic layer deposition apparatus

Methods for fabricating semiconductor memory with process induced s...

Method of fabricating a nonvolatile charge trap memory device

Method for forming image sensor with shield structures

Oxide formation in a plasma process

Image sensor with a reflective waveguide

Atomic layer deposition apparatus

Atomic layer deposition apparatus

Method for forming tungsten materials during vapor deposition proce...

Plasma oxidation of a memory layer to form a blocking layer in non-...

Methods for depositing tungsten after surface treatment

Methods for depositing tungsten layers employing atomic layer depos...

Method for forming tungsten materials during vapor deposition proce...

Atomic layer deposition apparatus

Formation of composite tungsten films

Formation of boride barrier layers using chemisorption techniques

Formation of boride barrier layers using chemisorption techniques

Patents Applicationslast 30 patents

RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...

OXIDE FORMATION IN A PLASMA PROCESS

RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...

OXIDE FORMATION IN A PLASMA PROCESS

Radical Oxidation Process For Fabricating A Nonvolatile Charge Trap...

OXIDE FORMATION IN A PLASMA PROCESS

Radical Oxidation Process For Fabricating A Nonvolatile Charge Trap...

ATOMIC LAYER DEPOSITION APPARATUS

RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...

ATOMIC LAYER DEPOSITION APPARATUS

METHOD FOR FORMING IMAGE SENSOR WITH SHIELD STRUCTURES

ATOMIC LAYER DEPOSITION APPARATUS

ATOMIC LAYER DEPOSITION APPARATUS

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

Plasma oxidation of a memory layer to form a blocking layer in non-...

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP...

METHODS FOR DEPOSITING TUNGSTEN LAYERS EMPLOYING ATOMIC LAYER DEPOS...

FORMATION OF COMPOSITE TUNGSTEN FILMS

LOW TEMPERATURE OXIDE FORMATION

METHODS FOR DEPOSITING TUNGSTEN AFTER SURFACE TREATMENT

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

FORMATION OF BORIDE BARRIER LAYERS USING CHEMISORPTION TECHNIQUES

FORMATION OF BORIDE BARRIER LAYERS USING CHEMISORPTION TECHNIQUES

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

ATOMIC LAYER DEPOSITION APPARATUS

Forming metal silicide on silicon-containing features of a substrate

In-situ-etch-assisted HDP deposition

Method and system for controlling the presence of fluorine in refra...

Methods for depositing tungsten layers employing atomic layer depos...