Jeremy Martin

Person

Millbrook, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Resist trim process to define small openings in dielectric layers
- Patent number 7,737,021
- Issue date Jun 15, 2010
- Globalfoundries Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric barrier layer for a copper metallization layer having a...
- Patent number 7,381,660
- Issue date Jun 3, 2008
- Advanced Micro Devices, Inc.
- Larry Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper damascene with low-k capping layer and improved electromigra...
- Patent number 6,989,601
- Issue date Jan 24, 2006
- Advanced Micro Devices, Inc.
- Minh van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor component and method of manufacture
- Patent number 6,927,113
- Issue date Aug 9, 2005
- Advanced Micro Devices
- Kashmir S. Sahota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper damascene with low-k capping layer and improved electromigra...
- Patent number 6,797,652
- Issue date Sep 28, 2004
- Advanced Micro Devices, Inc.
- Minh van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for adhesion improvement at an interface between...
- Patent number 6,642,619
- Issue date Nov 4, 2003
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Locally increasing sidewall density by ion implantation
- Patent number 6,610,594
- Issue date Aug 26, 2003
- Advanced Micro Devices, Inc.
- Eric M. Apelgren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and test structure for characterizing sidewall damage in a s...
- Patent number 6,600,333
- Issue date Jul 29, 2003
- Advanced Micro Devices, Inc.
- Jeremy I. Martin
- G01 - MEASURING TESTING
Information Patent Grant
Sidewall treatment for low dielectric constant (low K) materials by...
- Patent number 6,514,844
- Issue date Feb 4, 2003
- Advanced Micro Devices, Inc.
- Jeremy I. Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist trim process to define small openings in dielectric layers
- Patent number 6,500,755
- Issue date Dec 31, 2002
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded oxide caps on low dielectric constant (low K) chemical vapor...
- Patent number 6,498,112
- Issue date Dec 24, 2002
- Advanced Micro Devices, Inc.
- Jeremy I. Martin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
NH3/N2-plasma treatment to prevent organic ILD degradation
- Patent number 6,436,808
- Issue date Aug 20, 2002
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair of film having an SI-O backbone
- Patent number 6,420,193
- Issue date Jul 16, 2002
- Advance Micro Devices, Inc.
- Jeremy Isaac Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of defining small openings in dielectric layers
- Patent number 6,406,993
- Issue date Jun 18, 2002
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual slurry particle sizes for reducing microscratching of wafers
- Patent number 6,294,472
- Issue date Sep 25, 2001
- Advanced Micro Devices, Inc.
- Jonathan B. Smith
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Dielectric barrier layer for a copper metallization layer having a...
- Publication number 20040152333
- Publication date Aug 5, 2004
- Larry Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Locally increasing sidewall density by ion implantation
- Publication number 20030013296
- Publication date Jan 16, 2003
- Eric M. Apelgren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist trim process to define small openings in dielectric layers
- Publication number 20020068436
- Publication date Jun 6, 2002
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPAIR OF FILM HAVING AN SI-O BACKBONE
- Publication number 20020022280
- Publication date Feb 21, 2002
- Advanced Micro Devices Inc
- Jeremy Isaac Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric formation to seal porosity of low dielectic constant (lo...
- Publication number 20010051420
- Publication date Dec 13, 2001
- Paul R. Besser
- H01 - BASIC ELECTRIC ELEMENTS

Jeremy Martin

Person

Patents Grantslast 30 patents

Resist trim process to define small openings in dielectric layers

Dielectric barrier layer for a copper metallization layer having a...

Copper damascene with low-k capping layer and improved electromigra...

Semiconductor component and method of manufacture

Copper damascene with low-k capping layer and improved electromigra...

System and method for adhesion improvement at an interface between...

Locally increasing sidewall density by ion implantation

Method and test structure for characterizing sidewall damage in a s...

Sidewall treatment for low dielectric constant (low K) materials by...

Resist trim process to define small openings in dielectric layers

Graded oxide caps on low dielectric constant (low K) chemical vapor...

NH3/N2-plasma treatment to prevent organic ILD degradation

Repair of film having an SI-O backbone

Method of defining small openings in dielectric layers

Dual slurry particle sizes for reducing microscratching of wafers

Patents Applicationslast 30 patents

Dielectric barrier layer for a copper metallization layer having a...

Locally increasing sidewall density by ion implantation

Resist trim process to define small openings in dielectric layers

REPAIR OF FILM HAVING AN SI-O BACKBONE

Dielectric formation to seal porosity of low dielectic constant (lo...