Jianmin Qiao

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual damascene structure and method of making
- Patent number 7,183,222
- Issue date Feb 27, 2007
- Cypress Semiconductor Corporation
- Jianmin Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber substrate holder method and structure
- Patent number 6,865,065
- Issue date Mar 8, 2005
- Advanced Ion Beam Technology, Inc.
- Jiong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming self aligned contacts
- Patent number 6,803,318
- Issue date Oct 12, 2004
- Cypress Semiconductor Corp.
- Jianmin Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method of making contacts in a semicond...
- Patent number 6,734,108
- Issue date May 11, 2004
- Cypress Semiconductor Corporation
- Bo Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching a dielectric layer formed upon a barrier layer
- Patent number 6,693,042
- Issue date Feb 17, 2004
- Cypress Semiconductor Corp.
- Mehran G. Sedigh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making metallization and contact structures in an integra...
- Patent number 6,635,566
- Issue date Oct 21, 2003
- Cypress Semiconductor Corporation
- Alain Blosse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for uniformly depositing thin films over subst...
- Patent number 6,579,420
- Issue date Jun 17, 2003
- Advanced Optical Solutions, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making metallization and contact structures in an integra...
- Patent number 6,399,512
- Issue date Jun 4, 2002
- Cypress Semiconductor Corporation
- Alain Blosse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential in-situ heating and deposition of halogen-doped silicon...
- Patent number 6,375,744
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMP...
- Patent number 6,373,679
- Issue date Apr 16, 2002
- Cypress Semiconductor Corp.
- Jianmin Qiao
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma etch chemistry and method of improving etch control
- Patent number 6,372,634
- Issue date Apr 16, 2002
- Cypress Semiconductor Corp.
- Jianmin Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method of making contacts and source an...
- Patent number 6,350,665
- Issue date Feb 26, 2002
- Cypress Semiconductor Corporation
- Bo Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conditioning a plasma etch chamber
- Patent number 6,322,716
- Issue date Nov 27, 2001
- Cypress Semiconductor Corp.
- Jianmin Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential in-situ heating and deposition of halogen-doped silicon...
- Patent number 6,228,781
- Issue date May 8, 2001
- Applied Materials, Inc.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High deposition rate recipe for low dielectric constant films
- Patent number 6,136,685
- Issue date Oct 24, 2000
- Applied Materials, Inc.
- Pravin Narwankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing impurity contamination in semiconductor process...
- Patent number 5,976,900
- Issue date Nov 2, 1999
- Cypress Semiconductor Corp.
- Jianmin Qiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing residue accumulation in CVD chamber using cerami...
- Patent number 5,885,356
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- Jun Zhao
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
Dual damascene structure and method of making
- Publication number 20040183199
- Publication date Sep 23, 2004
- CYPRESS SEMICONDUCTOR CORPORATION
- Jianmin Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of making metallization and contact structures in an integra...
- Publication number 20040082182
- Publication date Apr 29, 2004
- CYPRESS SEMICONDUCTOR CORPORATION
- Alain Blosse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for uniformly depositing thin films over subst...
- Publication number 20020134668
- Publication date Sep 26, 2002
- Advanced Optics Solutions, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sequential in-situ heating and deposition of halogen-doped silicon...
- Publication number 20010020447
- Publication date Sep 13, 2001
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jianmin Qiao

Person

Patents Grantslast 30 patents

Dual damascene structure and method of making

Semiconductor processing chamber substrate holder method and structure

Method of forming self aligned contacts

Semiconductor structure and method of making contacts in a semicond...

Method for etching a dielectric layer formed upon a barrier layer

Method of making metallization and contact structures in an integra...

Apparatus and method for uniformly depositing thin films over subst...

Method of making metallization and contact structures in an integra...

Sequential in-situ heating and deposition of halogen-doped silicon...

ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMP...

Plasma etch chemistry and method of improving etch control

Semiconductor structure and method of making contacts and source an...

Method for conditioning a plasma etch chamber

Sequential in-situ heating and deposition of halogen-doped silicon...

High deposition rate recipe for low dielectric constant films

Method of reducing impurity contamination in semiconductor process...

Method of reducing residue accumulation in CVD chamber using cerami...

Patents Applicationslast 30 patents

Dual damascene structure and method of making

Method of making metallization and contact structures in an integra...

Apparatus and method for uniformly depositing thin films over subst...

Sequential in-situ heating and deposition of halogen-doped silicon...