Jie Yuan

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coated article and semiconductor chamber apparatus formed from yttr...
- Patent number 11,373,882
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a bulk article and semiconductor chamber apparatu...
- Patent number 10,847,386
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Coated article and semiconductor chamber apparatus formed from yttr...
- Patent number 10,840,112
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of forming a coated article and semiconductor chamber appara...
- Patent number 10,840,113
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Bulk sintered solid solution ceramic which exhibits fracture toughn...
- Patent number 10,622,194
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus with a ceramic-comprising surfac...
- Patent number 10,242,888
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Semiconductor processing apparatus comprising a solid solution cera...
- Patent number 9,051,219
- Issue date Jun 9, 2015
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of reducing plasma arcing on surfaces of semiconductor proce...
- Patent number 8,871,312
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Semiconductor processing apparatus comprising a coating formed from...
- Patent number 8,623,527
- Issue date Jan 7, 2014
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Plasma-resistant ceramics with controlled electrical resistivity
- Patent number 8,367,227
- Issue date Feb 5, 2013
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Semiconductor processing apparatus which is formed from yttrium oxi...
- Patent number 8,034,734
- Issue date Oct 11, 2011
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of fabricating plasma reactor parts
- Patent number 7,942,965
- Issue date May 17, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for fabricating plasma reactor parts
- Patent number 7,919,722
- Issue date Apr 5, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Erosion resistance enhanced quartz used in plasma etch chamber
- Patent number 7,718,559
- Issue date May 18, 2010
- Applied Materials, Inc.
- Jie Yuan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and apparatus which reduce the erosion rate of surfaces expo...
- Patent number 7,696,117
- Issue date Apr 13, 2010
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
BARC shaping for improved fabrication of dual damascene integrated...
- Patent number 7,071,112
- Issue date Jul 4, 2006
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Undoped and fluorinated amorphous carbon film as pattern mask for m...
- Patent number 6,939,808
- Issue date Sep 6, 2005
- Applied Materials, Inc.
- Eugene Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for selectively etching dielectric layers
- Patent number 6,905,968
- Issue date Jun 14, 2005
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing using a member comprising an oxide of a group...
- Patent number 6,641,697
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching carbon-containing silicon oxide films
- Patent number 6,607,675
- Issue date Aug 19, 2003
- Applied Materials Inc.
- Chang Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion-resistant protective coating for an apparatus and method...
- Patent number 6,592,707
- Issue date Jul 15, 2003
- Applied Materials Inc.
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monitoring substrate processing with optical emission and polarized...
- Patent number 6,559,942
- Issue date May 6, 2003
- Applied Materials Inc.
- Zhifeng Sui
- G01 - MEASURING TESTING
Information Patent Grant
Method of etching dielectric layers using a removable hardmask
- Patent number 6,458,516
- Issue date Oct 1, 2002
- Applied Materials Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NH3 plasma descumming and resist stripping in semiconductor applica...
- Patent number 6,455,431
- Issue date Sep 24, 2002
- Applied Materials Inc.
- Chang Lin Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ceramic composition for an apparatus and method for processing a su...
- Patent number 6,352,611
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of pattern etching a low K dielectric layer
- Patent number 6,331,380
- Issue date Dec 18, 2001
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic composition for an apparatus and method for processing a su...
- Patent number 6,123,791
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching patterned layers useful as masking during subsequ...
- Patent number 6,080,529
- Issue date Jun 27, 2000
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...
- Publication number 20200395226
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
METHOD OF FORMING A BULK ARTICLE AND SEMICONDUCTOR CHAMBER APPARATU...
- Publication number 20190157114
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...
- Publication number 20190157113
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARA...
- Publication number 20190157115
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS WITH A CERAMIC-COMPRISING SURFAC...
- Publication number 20180174866
- Publication date Jun 21, 2018
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bulk sintered solid solution ceramic which exhibits fracture toughn...
- Publication number 20170372874
- Publication date Dec 28, 2017
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bulk sintered solid solution ceramic which exhibits fracture toughn...
- Publication number 20170110293
- Publication date Apr 20, 2017
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS WITH A CERAMIC-COMPRISING SURFAC...
- Publication number 20150143677
- Publication date May 28, 2015
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing apparatus comprising a solid solution cera...
- Publication number 20130224498
- Publication date Aug 29, 2013
- Jennifer Y. Sun
- B32 - LAYERED PRODUCTS
Information Patent Application
Method of reducing plasma arcing on surfaces of semiconductor proce...
- Publication number 20130022838
- Publication date Jan 24, 2013
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Semiconductor processing apparatus comprising a coating formed from...
- Publication number 20120034469
- Publication date Feb 9, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- B32 - LAYERED PRODUCTS
Information Patent Application
Semiconductor processing apparatus comprising a solid solution cera...
- Publication number 20100160143
- Publication date Jun 24, 2010
- Applied Materials, Inc.
- Jennifer Y. Sun
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE
- Publication number 20090302002
- Publication date Dec 10, 2009
- Applied Materials, Inc.
- Kenneth Collins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ceramic coating comprising yttrium which is resistant to a reducing...
- Publication number 20090214825
- Publication date Aug 27, 2009
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING LOW K DIELECTRIC DUAL DAMASCENE STRUCTURES
- Publication number 20090156012
- Publication date Jun 18, 2009
- Applied Materials, Inc.
- CHANG-LIN HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-resistant ceramics with controlled electrical resistivity
- Publication number 20090036292
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Method of reducing the erosion rate of semiconductor processing app...
- Publication number 20080264564
- Publication date Oct 30, 2008
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- B32 - LAYERED PRODUCTS
Information Patent Application
Method and apparatus which reduce the erosion rate of surfaces expo...
- Publication number 20080264565
- Publication date Oct 30, 2008
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EROSION RESISTANCE ENHANCED QUARTZ USED IN PLASMA ETCH CHAMBER
- Publication number 20080261800
- Publication date Oct 23, 2008
- Jie Yuan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD OF FABRICATING PLASMA REACTOR PARTS
- Publication number 20080233022
- Publication date Sep 25, 2008
- Elmira Ryabova
- C30 - CRYSTAL GROWTH
Information Patent Application
Method of coating semiconductor processing apparatus with protectiv...
- Publication number 20080213496
- Publication date Sep 4, 2008
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING PLASMA REACTOR PARTS
- Publication number 20080099148
- Publication date May 1, 2008
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Barc shaping for improved fabrication of dual damascene integrated...
- Publication number 20040077175
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Undoped and fluorinated amorphous carbon film as pattern mask for m...
- Publication number 20040023502
- Publication date Feb 5, 2004
- Applied Materials Inc.
- Eugene Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for selectively etching dielectric layers
- Publication number 20030109143
- Publication date Jun 12, 2003
- APPLIED MATERIALS, INC.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing using a member comprising an oxide of a group...
- Publication number 20020100554
- Publication date Aug 1, 2002
- APPLIED MATERIALS, INC.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corrosion-resistant protective coating for an apparatus and method...
- Publication number 20020066532
- Publication date Jun 6, 2002
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Monitoring substrate processing with optical emission and polarized...
- Publication number 20020048019
- Publication date Apr 25, 2002
- Zhifeng Sui
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Coated article and semiconductor chamber apparatus formed from yttr...

Method of forming a bulk article and semiconductor chamber apparatu...

Coated article and semiconductor chamber apparatus formed from yttr...

Method of forming a coated article and semiconductor chamber appara...

Bulk sintered solid solution ceramic which exhibits fracture toughn...

Semiconductor processing apparatus with a ceramic-comprising surfac...

Semiconductor processing apparatus comprising a solid solution cera...

Method of reducing plasma arcing on surfaces of semiconductor proce...

Semiconductor processing apparatus comprising a coating formed from...

Plasma-resistant ceramics with controlled electrical resistivity

Semiconductor processing apparatus which is formed from yttrium oxi...

Method of fabricating plasma reactor parts

Method for fabricating plasma reactor parts

Erosion resistance enhanced quartz used in plasma etch chamber

Method and apparatus which reduce the erosion rate of surfaces expo...

BARC shaping for improved fabrication of dual damascene integrated...

Undoped and fluorinated amorphous carbon film as pattern mask for m...

Process for selectively etching dielectric layers

Substrate processing using a member comprising an oxide of a group...

Method of etching carbon-containing silicon oxide films

Corrosion-resistant protective coating for an apparatus and method...

Monitoring substrate processing with optical emission and polarized...

Method of etching dielectric layers using a removable hardmask

NH3 plasma descumming and resist stripping in semiconductor applica...

Ceramic composition for an apparatus and method for processing a su...

Method of pattern etching a low K dielectric layer

Ceramic composition for an apparatus and method for processing a su...

Method of etching patterned layers useful as masking during subsequ...

Patents Applicationslast 30 patents

COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...

METHOD OF FORMING A BULK ARTICLE AND SEMICONDUCTOR CHAMBER APPARATU...

COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...

METHOD OF FORMING A COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARA...

SEMICONDUCTOR PROCESSING APPARATUS WITH A CERAMIC-COMPRISING SURFAC...

Bulk sintered solid solution ceramic which exhibits fracture toughn...

Bulk sintered solid solution ceramic which exhibits fracture toughn...

SEMICONDUCTOR PROCESSING APPARATUS WITH A CERAMIC-COMPRISING SURFAC...

Semiconductor processing apparatus comprising a solid solution cera...

Method of reducing plasma arcing on surfaces of semiconductor proce...

Semiconductor processing apparatus comprising a coating formed from...

Semiconductor processing apparatus comprising a solid solution cera...

METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE

Ceramic coating comprising yttrium which is resistant to a reducing...

METHOD FOR FABRICATING LOW K DIELECTRIC DUAL DAMASCENE STRUCTURES

Plasma-resistant ceramics with controlled electrical resistivity

Method of reducing the erosion rate of semiconductor processing app...

Method and apparatus which reduce the erosion rate of surfaces expo...

EROSION RESISTANCE ENHANCED QUARTZ USED IN PLASMA ETCH CHAMBER

METHOD OF FABRICATING PLASMA REACTOR PARTS

Method of coating semiconductor processing apparatus with protectiv...

METHOD FOR FABRICATING PLASMA REACTOR PARTS

Barc shaping for improved fabrication of dual damascene integrated...

Undoped and fluorinated amorphous carbon film as pattern mask for m...

Process for selectively etching dielectric layers

Substrate processing using a member comprising an oxide of a group...

Corrosion-resistant protective coating for an apparatus and method...

Monitoring substrate processing with optical emission and polarized...