Jin-Yuan Chen

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Bountiful, UT, US

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Patents Grantslast 30 patents

Information Patent Grant
Pulsed RF power delivery for plasma processing
- Patent number 6,472,822
- Issue date Oct 29, 2002
- Applied Materials, Inc.
- Jin-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having a voltage distribution electrode
- Patent number 6,447,637
- Issue date Sep 10, 2002
- Applied Materials Inc.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Etch chamber with dual frequency biasing sources and a single frequ...
- Publication number 20070020937
- Publication date Jan 25, 2007
- Jin-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch chamber with dual frequency biasing sources and a single frequ...
- Publication number 20060175015
- Publication date Aug 10, 2006
- APPLIED MATERIALS, INC.
- Jin-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fixed matching network with increased match range capabilities
- Publication number 20040027209
- Publication date Feb 12, 2004
- APPLIED MATERIALS, INC.
- Jin-Yuan Chen
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Etch chamber with dual frequency biasing sources and a single frequ...
- Publication number 20040025791
- Publication date Feb 12, 2004
- APPLIED MATERIALS, INC.
- Jin-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process chamber having a voltage distribution electrode
- Publication number 20030006009
- Publication date Jan 9, 2003
- APPLIED MATERIALS, INC.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of eliminating notching when anisotropically etching small l...
- Publication number 20030003748
- Publication date Jan 2, 2003
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS