JINHAN CHOI

Person

FRISCO, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Amorphous carbon multilayer coating with directional protection
- Patent number 11,437,230
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Wei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halogen abatement for high aspect ratio channel device damage layer...
- Patent number 10,586,696
- Issue date Mar 10, 2020
- Applied Materials, Inc.
- Rohit Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming features in a silicon containing layer
- Patent number 9,627,216
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified litho-etch-litho-etch process
- Patent number 9,425,058
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local and global reduction of critical dimension (CD) asymmetry in...
- Patent number 9,281,190
- Issue date Mar 8, 2016
- Applied Materials, Inc.
- Kang-lie Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aspect ratio dependent etch (ARDE) lag reduction process by selecti...
- Patent number 9,064,812
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Jinsu Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-film stack etching with polymer passivation of an overlying e...
- Patent number 8,747,684
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing gate CD bias in CMOS processing
- Patent number 7,910,422
- Issue date Mar 22, 2011
- Texas Instruments Incorporated
- Freidoon Mehrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post metal gate VT adjust etch clean
- Patent number 7,785,957
- Issue date Aug 31, 2010
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching tungsten silicide overlying polysilicon particu...
- Patent number 7,754,610
- Issue date Jul 13, 2010
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post high-k dielectric/metal gate clean
- Patent number 7,732,284
- Issue date Jun 8, 2010
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate structure of a field effect transistor...
- Patent number 7,368,392
- Issue date May 6, 2008
- Applied Materials, Inc.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon nitride spacers with high selectivity rel...
- Patent number 6,756,313
- Issue date Jun 29, 2004
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION
- Publication number 20210313166
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN ABATEMENT FOR HIGH ASPECT RATIO CHANNEL DEVICE DAMAGE LAYER...
- Publication number 20180330943
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Rohit MISHRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...
- Publication number 20160056059
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Jennifer SUN
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
SIMPLIFIED LITHO-ETCH-LITHO-ETCH PROCESS
- Publication number 20160027654
- Publication date Jan 28, 2016
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SHALLOW TRENCH ISOLATION FORMATION IN A SILICON GERMANI...
- Publication number 20150371889
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- HUN SANG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER
- Publication number 20150099345
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- BYUNGKOOK KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASPECT RATIO DEPENDENT ETCH (ARDE) LAG REDUCTION PROCESS BY SELECTI...
- Publication number 20150064919
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jinsu KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL AND GLOBAL REDUCTION OF CRITICAL DIMENSION (CD) ASYMMETRY IN...
- Publication number 20140273466
- Publication date Sep 18, 2014
- Kang-lie Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...
- Publication number 20110045672
- Publication date Feb 24, 2011
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST HIGH-K DIELECTRIC/METAL GATE CLEAN
- Publication number 20100167519
- Publication date Jul 1, 2010
- TEXAS INSTRUMENTS INCORPORATED
- BRIAN K. KIRKPATRICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST METAL GATE VT ADJUST ETCH CLEAN
- Publication number 20100167514
- Publication date Jul 1, 2010
- TEXAS INSTRUMENTS INCORPORATED
- BRIAN K. KIRKPATRICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING GATE CD BIAS IN CMOS PROCESSING
- Publication number 20090166629
- Publication date Jul 2, 2009
- TEXAS INSTRUMENTS INCORPORATED
- Freidoon Mehrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION METHOD FOR DUAL DOPED POLYSILICON GATE PROFILE AND CD C...
- Publication number 20090104745
- Publication date Apr 23, 2009
- Hyesook Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DRY ETCH PROCESS FOR METAL-CONTAINING GATES
- Publication number 20080242072
- Publication date Oct 2, 2008
- TEXAS INSTRUMENTS INCORPORATED
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufactured Using an Improved Plasma Etch Pro...
- Publication number 20080233747
- Publication date Sep 25, 2008
- TEXAS INSTRUMENTS INCORPORATED
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching tungsten silicide overlying polysilicon particu...
- Publication number 20070281477
- Publication date Dec 6, 2007
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process including silo-chloro passivation for etching tungsten sili...
- Publication number 20070281479
- Publication date Dec 6, 2007
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching oxide with high selectivity
- Publication number 20050098536
- Publication date May 12, 2005
- APPLIED MATERIALS, INC.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a gate structure of a field effect transistor...
- Publication number 20050009358
- Publication date Jan 13, 2005
- APPLIED MATERIALS, INC.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching silicon nitride spacers with high selectivity rel...
- Publication number 20030207585
- Publication date Nov 6, 2003
- APPLIED MATERIALS, INC.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS

JINHAN CHOI

Person

Patents Grantslast 30 patents

Amorphous carbon multilayer coating with directional protection

Halogen abatement for high aspect ratio channel device damage layer...

Method for forming features in a silicon containing layer

Simplified litho-etch-litho-etch process

Local and global reduction of critical dimension (CD) asymmetry in...

Aspect ratio dependent etch (ARDE) lag reduction process by selecti...

Multi-film stack etching with polymer passivation of an overlying e...

Reducing gate CD bias in CMOS processing

Post metal gate VT adjust etch clean

Process for etching tungsten silicide overlying polysilicon particu...

Post high-k dielectric/metal gate clean

Method of fabricating a gate structure of a field effect transistor...

Method of etching silicon nitride spacers with high selectivity rel...

Patents Applicationslast 30 patents

AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION

HALOGEN ABATEMENT FOR HIGH ASPECT RATIO CHANNEL DEVICE DAMAGE LAYER...

COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...

SIMPLIFIED LITHO-ETCH-LITHO-ETCH PROCESS

METHODS FOR SHALLOW TRENCH ISOLATION FORMATION IN A SILICON GERMANI...

METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER

ASPECT RATIO DEPENDENT ETCH (ARDE) LAG REDUCTION PROCESS BY SELECTI...

LOCAL AND GLOBAL REDUCTION OF CRITICAL DIMENSION (CD) ASYMMETRY IN...

MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...

POST HIGH-K DIELECTRIC/METAL GATE CLEAN

POST METAL GATE VT ADJUST ETCH CLEAN

REDUCING GATE CD BIAS IN CMOS PROCESSING

INTEGRATION METHOD FOR DUAL DOPED POLYSILICON GATE PROFILE AND CD C...

PLASMA DRY ETCH PROCESS FOR METAL-CONTAINING GATES

Semiconductor Device Manufactured Using an Improved Plasma Etch Pro...

Process for etching tungsten silicide overlying polysilicon particu...

Process including silo-chloro passivation for etching tungsten sili...

Method of etching oxide with high selectivity

Method of fabricating a gate structure of a field effect transistor...

Method of etching silicon nitride spacers with high selectivity rel...