Joachim Wietzorrek

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system for microlithography
- Patent number 7,911,584
- Issue date Mar 22, 2011
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G02 - OPTICS
Information Patent Grant
Lithography lens system and projection exposure system provided wit...
- Patent number 7,551,361
- Issue date Jun 23, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,443,948
- Issue date Oct 28, 2008
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical system having an optical element that can be brought into a...
- Patent number 7,362,414
- Issue date Apr 22, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Grant
Collector with fastening devices for fastening mirror shells
- Patent number 7,321,126
- Issue date Jan 22, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system with field mirrors for producing uniform scanni...
- Patent number 7,126,137
- Issue date Oct 24, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Collector with fastening devices for fastening mirror shells
- Patent number 7,091,505
- Issue date Aug 15, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,006,595
- Issue date Feb 28, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090015812
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20080042079
- Publication date Feb 21, 2008
- Carl Zeiss SMT
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Microlithographic Projection Exposure Apparatus
- Publication number 20070285644
- Publication date Dec 13, 2007
- Carl Zeiss SMT AG
- Markus Brotsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV-lithography apparatus having a chamber for cleaning an optical...
- Publication number 20070283591
- Publication date Dec 13, 2007
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Lithography Lens System And Projection Exposure System Provided Wit...
- Publication number 20070258134
- Publication date Nov 8, 2007
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system for microlithography
- Publication number 20070058274
- Publication date Mar 15, 2007
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system with field mirrors for producing uniform scanni...
- Publication number 20070030948
- Publication date Feb 8, 2007
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20060291062
- Publication date Dec 28, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20060245540
- Publication date Nov 2, 2006
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Optical system having an optical element that can be brought into a...
- Publication number 20060001854
- Publication date Jan 5, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system with field mirrors for producing uniform scanni...
- Publication number 20040232354
- Publication date Nov 25, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20040227103
- Publication date Nov 18, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030086524
- Publication date May 8, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS

Joachim Wietzorrek

Person

Patents Grantslast 30 patents

Illumination system for microlithography

Lithography lens system and projection exposure system provided wit...

Illumination system particularly for microlithography

Optical system having an optical element that can be brought into a...

Collector with fastening devices for fastening mirror shells

Illumination system with field mirrors for producing uniform scanni...

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

Collector with fastening devices for fastening mirror shells

Microlithographic Projection Exposure Apparatus

EUV-lithography apparatus having a chamber for cleaning an optical...

Lithography Lens System And Projection Exposure System Provided Wit...

Illumination system for microlithography

Illumination system with field mirrors for producing uniform scanni...

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

Optical system having an optical element that can be brought into a...

Illumination system with field mirrors for producing uniform scanni...

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography