Joern WEBER

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 8,937,709
- Issue date Jan 20, 2015
- Carl Zeiss SMT GmbH
- Joern Weber
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 8,928,972
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Joern Weber
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...
- Publication number 20250216801
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G01 - MEASURING TESTING
Information Patent Application
MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...
- Publication number 20250216794
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20250068084
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Joern WEBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...
- Publication number 20230257866
- Publication date Aug 17, 2023
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20190064405
- Publication date Feb 28, 2019
- Carl Zeiss SMT GMBH
- Christian GRASSE
- G02 - OPTICS
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20170160639
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20120019797
- Publication date Jan 26, 2012
- Carl Zeiss SMT GMBH
- Joern WEBER
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20120013976
- Publication date Jan 19, 2012
- Carl Zeiss SMT GMBH
- Joern WEBER
- G02 - OPTICS

Joern WEBER

Person

Patents Grantslast 30 patents

Method for treating a reflective optical element for the EUV wavele...

Reflective optical element

Reflective optical element, and optical system of a microlithograph...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Reflective optical element for EUV lithography

Reflective optical element for EUV lithography

Patents Applicationslast 30 patents

MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...

MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

REFLECTIVE OPTICAL ELEMENT

REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY