Joern WEBER

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 8,937,709
- Issue date Jan 20, 2015
- Carl Zeiss SMT GmbH
- Joern Weber
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 8,928,972
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Joern Weber
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20190064405
- Publication date Feb 28, 2019
- Carl Zeiss SMT GMBH
- Christian GRASSE
- G02 - OPTICS
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20170160639
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20120019797
- Publication date Jan 26, 2012
- Carl Zeiss SMT GMBH
- Joern WEBER
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20120013976
- Publication date Jan 19, 2012
- Carl Zeiss SMT GMBH
- Joern WEBER
- G02 - OPTICS

Joern WEBER

Person

Patents Grantslast 30 patents

Method for treating a reflective optical element for the EUV wavele...

Reflective optical element

Reflective optical element, and optical system of a microlithograph...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Reflective optical element for EUV lithography

Reflective optical element for EUV lithography

Patents Applicationslast 30 patents

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

REFLECTIVE OPTICAL ELEMENT

REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY