Johannes Kappeler

Person

Wohnsitz, DE

People

Patents Grantslast 30 patents

Information Patent Grant
CVD reactor having a substrate holder resting on a gas cushion comp...
- Patent number 9,447,500
- Issue date Sep 20, 2016
- Aixtron SE
- Francisco Ruda Y Witt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for coating substrates disposed on a susceptor
- Patent number 8,986,453
- Issue date Mar 24, 2015
- Aixtron Inc.
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for the temperature control of the surface temperatures of s...
- Patent number 8,308,867
- Issue date Nov 13, 2012
- Aixtron Inc.
- Walter Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor having a process-chamber ceiling which can be lowered
- Patent number 8,157,915
- Issue date Apr 17, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor comprising a gas inlet member
- Patent number 8,152,924
- Issue date Apr 10, 2012
- Aixtron Inc.
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor with RF-heated process chamber
- Patent number 8,062,426
- Issue date Nov 22, 2011
- Aixtron Inc.
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for depositing in particular crystalline layers on one or mo...
- Patent number 7,332,038
- Issue date Feb 19, 2008
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating method
- Patent number 7,201,942
- Issue date Apr 10, 2007
- Aixtron AG
- Holger Jurgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for the deposition of, in particular, crystalline...
- Patent number 7,147,718
- Issue date Dec 12, 2006
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD coating device
- Patent number 7,067,012
- Issue date Jun 27, 2006
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reaction chamber with at least one HF feedthrough
- Patent number 7,056,388
- Issue date Jun 6, 2006
- Aixtron AG
- Walter Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for the deposition of crystalline layers on crystalline subs...
- Patent number 6,905,548
- Issue date Jun 14, 2005
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor with substrate holder which is rotatably driven and mou...
- Patent number 6,811,614
- Issue date Nov 2, 2004
- Aixtron AG
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD reactor
- Patent number 6,309,465
- Issue date Oct 30, 2001
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and method for simultaneous deposition of a plurality of...
- Publication number 20130045548
- Publication date Feb 21, 2013
- Johannes Käppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A S...
- Publication number 20130040054
- Publication date Feb 14, 2013
- AIXTRON SE
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD reactor having a substrate holder resting on a gas cushion comp...
- Publication number 20120204796
- Publication date Aug 16, 2012
- Francisco Ruda Y Witt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND APPARATUS FOR DEPOSITION OF MULTICOMPONENT SEMICONDUCTO...
- Publication number 20110237051
- Publication date Sep 29, 2011
- Kenneth Lee Hess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR SELECTIVELY DEPOSITING CRYSTALLINE LAYERS USI...
- Publication number 20100273320
- Publication date Oct 28, 2010
- Johannes Käppeler
- C30 - CRYSTAL GROWTH
Information Patent Application
DEVICE FOR COATING SUBSTRATES DISPOSED ON A SUSCEPTOR
- Publication number 20100186666
- Publication date Jul 29, 2010
- Johannes Käppeler
- C30 - CRYSTAL GROWTH
Information Patent Application
DEVICE FOR THE TEMPERATURE CONTROL OF THE SURFACE TEMPERATURES OF S...
- Publication number 20100170435
- Publication date Jul 8, 2010
- Walter Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR COATING A PLURALITY OF CLOSEST PACKED SUBSTRATES ARRANGE...
- Publication number 20100162957
- Publication date Jul 1, 2010
- Adam Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT...
- Publication number 20100003405
- Publication date Jan 7, 2010
- Johannes Käppeler
- C30 - CRYSTAL GROWTH
Information Patent Application
SOURCE CONTAINER OF A VPE REACTOR
- Publication number 20090183682
- Publication date Jul 23, 2009
- Walter Franken
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD REACTOR HAVING A PROCESS-CHAMBER CEILING WHICH CAN BE LOWERED
- Publication number 20090064935
- Publication date Mar 12, 2009
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd Reactor Comprising a Gas Inlet Member
- Publication number 20080308040
- Publication date Dec 18, 2008
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd-Reactor with Slidingly Mounted Susceptor Holder
- Publication number 20080251020
- Publication date Oct 16, 2008
- Walter Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Device for the Depositing of Gallium Nitrite Layers on a...
- Publication number 20080206464
- Publication date Aug 28, 2008
- AIXTRON INC.
- Johannes Kappeler
- C30 - CRYSTAL GROWTH
Information Patent Application
Cvd Reactor with Rf-Heated Process Chamber
- Publication number 20080092817
- Publication date Apr 24, 2008
- Johannes Kappeler
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD reactor with stabilized process chamber height
- Publication number 20070074661
- Publication date Apr 5, 2007
- Aixtron AG
- Walter Franken
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD coating device
- Publication number 20060201427
- Publication date Sep 14, 2006
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD reactor with substrate holder which is rotatably driven and mou...
- Publication number 20040007187
- Publication date Jan 15, 2004
- Johannes Kappeler
- C30 - CRYSTAL GROWTH
Information Patent Application
Device and method for the depostion of, in particular, crystalline...
- Publication number 20040005731
- Publication date Jan 8, 2004
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Device for depositing in particular crystalline layers on one or mo...
- Publication number 20040003779
- Publication date Jan 8, 2004
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD coating device
- Publication number 20030221624
- Publication date Dec 4, 2003
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Device for the deposition of, in particular, crystalline layers on,...
- Publication number 20030217696
- Publication date Nov 27, 2003
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Reaction chamber with at least one HF feedthrough
- Publication number 20030111015
- Publication date Jun 19, 2003
- Walter Franken
- H01 - BASIC ELECTRIC ELEMENTS

Johannes Kappeler

Person

Patents Grantslast 30 patents

CVD reactor having a substrate holder resting on a gas cushion comp...

Device for coating substrates disposed on a susceptor

Device for the temperature control of the surface temperatures of s...

CVD reactor having a process-chamber ceiling which can be lowered

CVD reactor comprising a gas inlet member

CVD reactor with RF-heated process chamber

Device for depositing in particular crystalline layers on one or mo...

Coating method

Device and method for the deposition of, in particular, crystalline...

CVD coating device

Reaction chamber with at least one HF feedthrough

Device for the deposition of crystalline layers on crystalline subs...

CVD reactor with substrate holder which is rotatably driven and mou...

CVD reactor

Patents Applicationslast 30 patents

Apparatus and method for simultaneous deposition of a plurality of...

COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A S...

CVD reactor having a substrate holder resting on a gas cushion comp...

PROCESS AND APPARATUS FOR DEPOSITION OF MULTICOMPONENT SEMICONDUCTO...

DEVICE AND METHOD FOR SELECTIVELY DEPOSITING CRYSTALLINE LAYERS USI...

DEVICE FOR COATING SUBSTRATES DISPOSED ON A SUSCEPTOR

DEVICE FOR THE TEMPERATURE CONTROL OF THE SURFACE TEMPERATURES OF S...

DEVICE FOR COATING A PLURALITY OF CLOSEST PACKED SUBSTRATES ARRANGE...

METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT...

SOURCE CONTAINER OF A VPE REACTOR

CVD REACTOR HAVING A PROCESS-CHAMBER CEILING WHICH CAN BE LOWERED

Cvd Reactor Comprising a Gas Inlet Member

Cvd-Reactor with Slidingly Mounted Susceptor Holder

Method and Device for the Depositing of Gallium Nitrite Layers on a...

Cvd Reactor with Rf-Heated Process Chamber

CVD reactor with stabilized process chamber height

CVD coating device

CVD reactor with substrate holder which is rotatably driven and mou...

Device and method for the depostion of, in particular, crystalline...

Device for depositing in particular crystalline layers on one or mo...

CVD coating device

Device for the deposition of, in particular, crystalline layers on,...

Reaction chamber with at least one HF feedthrough