Johannes Lippert

Person

Buch a W., DE

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror for a microlithographic projection exposure apparatus, and m...
- Patent number 11,187,990
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,908,509
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with near-field manipulator
- Patent number 10,108,094
- Issue date Oct 23, 2018
- Carl Zeiss SMT GmbH
- Peter Deufel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimum arrangement of actuator and sensor points on an optical ele...
- Patent number 10,025,200
- Issue date Jul 17, 2018
- Carl Zeiss SMT GmbH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element unit
- Patent number 9,841,577
- Issue date Dec 12, 2017
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element unit
- Patent number 9,435,980
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Optical element unit
- Patent number 9,195,025
- Issue date Nov 24, 2015
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Substrate for mirrors for EUV lithography
- Patent number 8,976,927
- Issue date Mar 10, 2015
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- G02 - OPTICS
Information Patent Grant
Optical element unit
- Patent number 8,854,743
- Issue date Oct 7, 2014
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Optical element for UV or EUV lithography with coatings having opti...
- Patent number 8,848,167
- Issue date Sep 30, 2014
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Optical element unit
- Patent number 8,599,502
- Issue date Dec 3, 2013
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 8,514,371
- Issue date Aug 20, 2013
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system having heat dissipation arrangement
- Patent number 8,456,615
- Issue date Jun 4, 2013
- Carl Zeiss Laser Optics GmbH
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Apparatus for manipulation of an optical element
- Patent number 8,179,621
- Issue date May 15, 2012
- Carl Zeiss SMT GmbH
- Michael Muehlbeyer
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Device consisting of at least one optical element
- Patent number 7,995,884
- Issue date Aug 9, 2011
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,961,294
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element unit
- Patent number 7,944,628
- Issue date May 17, 2011
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Reflecting optical element with eccentric optical passageway
- Patent number 7,760,327
- Issue date Jul 20, 2010
- Carl Zeiss SMT AG
- Hans-Jürgen Scherle
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,710,542
- Issue date May 4, 2010
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device consisting of at least one optical element
- Patent number 7,603,010
- Issue date Oct 13, 2009
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,486,382
- Issue date Feb 3, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,304,717
- Issue date Dec 4, 2007
- Carl Zelss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...
- Publication number 20230176486
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
DEVICE AND METHOD FOR CONTROLLING THE TEMPERATURE OF ELEMENTS IN MI...
- Publication number 20230082054
- Publication date Mar 16, 2023
- Carl Zeiss SMT GMBH
- Thomas Monz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD
- Publication number 20220382165
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...
- Publication number 20210149310
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20200026195
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20180188470
- Publication date Jul 5, 2018
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20170082824
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
OPTIMUM ARRANGEMENT OF ACTUATOR AND SENSOR POINTS ON AN OPTICAL ELE...
- Publication number 20170068165
- Publication date Mar 9, 2017
- Carl Zeiss SMT GMBH
- Pascal Marsollek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH NEAR-FIELD MANIPULATOR
- Publication number 20170052453
- Publication date Feb 23, 2017
- Carl Zeiss SMT GMBH
- Peter Deufel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20160161700
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20150098140
- Publication date Apr 9, 2015
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20140064791
- Publication date Mar 6, 2014
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY
- Publication number 20130170056
- Publication date Jul 4, 2013
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY
- Publication number 20120044473
- Publication date Feb 23, 2012
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT
- Publication number 20110279914
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20110199597
- Publication date Aug 18, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT
- Publication number 20110025992
- Publication date Feb 3, 2011
- CARL ZEISS LASER OPTICS GmbH
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
COMPOSITE BODY
- Publication number 20100284652
- Publication date Nov 11, 2010
- Carl Zeiss SMT AG
- Fraser Morrison
- G02 - OPTICS
Information Patent Application
APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT
- Publication number 20100157270
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Michael Muehlbeyer
- G02 - OPTICS
Information Patent Application
DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT
- Publication number 20090324174
- Publication date Dec 31, 2009
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
Imaging Device in a Projection Exposure Machine
- Publication number 20090141258
- Publication date Jun 4, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT
- Publication number 20090050776
- Publication date Feb 26, 2009
- Carl Zeiss SMT AG
- Michael Muehlbeyer
- G02 - OPTICS
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20090040487
- Publication date Feb 12, 2009
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE
- Publication number 20080174757
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for manipulation of an optical element
- Publication number 20070052301
- Publication date Mar 8, 2007
- Michael Muehlbeyer
- G02 - OPTICS
Information Patent Application
Device consisting of at least one optical element
- Publication number 20070047876
- Publication date Mar 1, 2007
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Application
Reflecting optical element with eccentric optical passageway
- Publication number 20060262704
- Publication date Nov 23, 2006
- Carl Zeiss SMT AG
- Hans-Jurgen Scherle
- G02 - OPTICS
Information Patent Application
Optical element unit
- Publication number 20060238892
- Publication date Oct 26, 2006
- CARL ZEISS SMT, AG
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
Composite body
- Publication number 20060192328
- Publication date Aug 31, 2006
- Carl Zeiss SMT AG
- Fraser Morrison
- G02 - OPTICS

Johannes Lippert

Person

Patents Grantslast 30 patents

Mirror for a microlithographic projection exposure apparatus, and m...

Mirror, in particular for a microlithographic projection exposure a...

Projection exposure apparatus with near-field manipulator

Optimum arrangement of actuator and sensor points on an optical ele...

Optical element unit

Optical element unit

Optical element unit

Substrate for mirrors for EUV lithography

Optical element unit

Optical element for UV or EUV lithography with coatings having opti...

Optical element unit

Imaging device in a projection exposure facility

Optical system having heat dissipation arrangement

Apparatus for manipulation of an optical element

Device consisting of at least one optical element

Imaging device in a projection exposure facility

Optical element unit

Reflecting optical element with eccentric optical passageway

Imaging device in a projection exposure machine

Device consisting of at least one optical element

Imaging device in a projection exposure machine

Imaging device in a projection exposure facility

Patents Applicationslast 30 patents

OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

DEVICE AND METHOD FOR CONTROLLING THE TEMPERATURE OF ELEMENTS IN MI...

OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

OPTICAL ELEMENT UNIT

OPTICAL ELEMENT UNIT

OPTIMUM ARRANGEMENT OF ACTUATOR AND SENSOR POINTS ON AN OPTICAL ELE...

PROJECTION EXPOSURE APPARATUS WITH NEAR-FIELD MANIPULATOR

OPTICAL ELEMENT UNIT

OPTICAL ELEMENT UNIT

OPTICAL ELEMENT UNIT

SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY

OPTICAL ELEMENT UNIT

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT

COMPOSITE BODY

APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT

DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT

Imaging Device in a Projection Exposure Machine

APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE

Apparatus for manipulation of an optical element

Device consisting of at least one optical element

Reflecting optical element with eccentric optical passageway

Optical element unit

Composite body