John E. Rauch

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Poway, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma focus light source with active and buffer gas control
- Patent number 6,586,757
- Issue date Jul 1, 2003
- Cymer, Inc.
- Stephan T. Melnychuk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma focus light source with tandem ellipsoidal mirror units
- Patent number 6,566,668
- Issue date May 20, 2003
- Cymer, Inc.
- John E. Rauch
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Plasma focus light source with tandem ellipsoidal mirror units
- Publication number 20020014599
- Publication date Feb 7, 2002
- John E. Rauch
- B82 - NANO-TECHNOLOGY
Information Patent Application
Plasma focus light source with active and buffer gas control
- Publication number 20020014598
- Publication date Feb 7, 2002
- Stephan T. Melnychuk
- B82 - NANO-TECHNOLOGY