John F. Magana

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for fabrication of very large scale integratio...
- Patent number 11,604,406
- Issue date Mar 14, 2023
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithically framed pellicle membrane suitable for lithography in...
- Patent number 11,561,466
- Issue date Jan 24, 2023
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV phase-shift SRAF masks by means of embedded phase shift layers
- Patent number 11,300,885
- Issue date Apr 12, 2022
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithically framed pellicle membrane suitable for lithography in...
- Patent number 11,194,246
- Issue date Dec 7, 2021
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EPI substrate with low doped EPI layer and high doped Si substrate...
- Patent number 8,072,016
- Issue date Dec 6, 2011
- Intel Corporation
- Ajay Jain
- G11 - INFORMATION STORAGE
Information Patent Grant
Wafer scale fabrication of liquid crystal on silicon light modulati...
- Patent number 7,692,757
- Issue date Apr 6, 2010
- Intel Corporation
- John F. Magana
- G02 - OPTICS
Information Patent Grant
Wafer level electro-optical sort testing and wafer level assembly o...
- Patent number 6,891,592
- Issue date May 10, 2005
- Intel Corporation
- John F. Magana
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Real-Time Detection of Deflections and Ruptures of EUV Pellicle Mem...
- Publication number 20240053281
- Publication date Feb 15, 2024
- Intel Corporation
- John Ferdinand MAGANA
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR REDUCING PELLICLE RUPTURE
- Publication number 20230367204
- Publication date Nov 16, 2023
- Intel Corporation
- Lance C. HIBBELER
- G01 - MEASURING TESTING
Information Patent Application
MONOLITHICALLY FRAMED PELLICLE MEMBRANE SUITABLE FOR LITHOGRAPHY IN...
- Publication number 20220075259
- Publication date Mar 10, 2022
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...
- Publication number 20210026234
- Publication date Jan 28, 2021
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL METHOD FOR FABRICATION OF EUV PHOTOMASK FIDUCIALS
- Publication number 20200050097
- Publication date Feb 13, 2020
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS
- Publication number 20200033736
- Publication date Jan 30, 2020
- Intel Corporation
- Robert BRISTOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EPI SUBSTRATE WITH LOW DOPED EPI LAYER AND HIGH DOPED SI SUBSTRATE...
- Publication number 20100264391
- Publication date Oct 21, 2010
- Ajay Jain
- G11 - INFORMATION STORAGE
Information Patent Application
Cantilever with integral probe tip
- Publication number 20090001488
- Publication date Jan 1, 2009
- John Magana
- G01 - MEASURING TESTING
Information Patent Application
Wafer scale fabrication of liquid crystal on silicon light modulati...
- Publication number 20060023155
- Publication date Feb 2, 2006
- John F. Magana
- G02 - OPTICS
Information Patent Application
Wafer level electro-optical sort testing and wafer level assembly o...
- Publication number 20040017537
- Publication date Jan 29, 2004
- John F. Magana
- G02 - OPTICS

John F. Magana

Person

Patents Grantslast 30 patents

Method and apparatus for fabrication of very large scale integratio...

Monolithically framed pellicle membrane suitable for lithography in...

EUV phase-shift SRAF masks by means of embedded phase shift layers

Monolithically framed pellicle membrane suitable for lithography in...

EPI substrate with low doped EPI layer and high doped Si substrate...

Wafer scale fabrication of liquid crystal on silicon light modulati...

Wafer level electro-optical sort testing and wafer level assembly o...

Patents Applicationslast 30 patents

Real-Time Detection of Deflections and Ruptures of EUV Pellicle Mem...

SYSTEM AND METHOD FOR REDUCING PELLICLE RUPTURE

MONOLITHICALLY FRAMED PELLICLE MEMBRANE SUITABLE FOR LITHOGRAPHY IN...

NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...

NOVEL METHOD FOR FABRICATION OF EUV PHOTOMASK FIDUCIALS

EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS

EPI SUBSTRATE WITH LOW DOPED EPI LAYER AND HIGH DOPED SI SUBSTRATE...

Cantilever with integral probe tip

Wafer scale fabrication of liquid crystal on silicon light modulati...

Wafer level electro-optical sort testing and wafer level assembly o...