John Jcobs Yurkas

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Architecture for an electrochemical artificial neural network
- Patent number 10,748,059
- Issue date Aug 18, 2020
- International Business Machines Corporation
- Matthew Warren Copel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Chemical vapor deposition method for the incorporation of nitrogen...
- Patent number 8,258,495
- Issue date Sep 4, 2012
- International Business Machines Corporation
- Jennifer L. Gardner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Activation of graphene buffer layers on silicon carbide by ultra lo...
- Patent number 8,242,030
- Issue date Aug 14, 2012
- International Business Machines Corporation
- James B. Hannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature processing compatible metal gate electrode for pFE...
- Patent number 7,863,083
- Issue date Jan 4, 2011
- International Business Machines Corporation
- Ricky Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal catalyzed selective deposition of materials including germani...
- Patent number 7,820,474
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Supratik Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition method for the incorporation of nitrogen...
- Patent number 7,772,120
- Issue date Aug 10, 2010
- International Business Machines Corporation
- Jennifer L. Gardner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for chemical vapor deposition of materials with via filling...
- Patent number 7,749,802
- Issue date Jul 6, 2010
- International Business Machines Corporation
- Fenton R. McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dispenser system for atomic beam assisted metal organic chemical va...
- Patent number 7,439,180
- Issue date Oct 21, 2008
- International Business Machines Corporation
- Supratik Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra thin, single phase, diffusion barrier for metal conductors
- Patent number 7,172,968
- Issue date Feb 6, 2007
- International Business Machines Corporation
- Stephan Alan Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a tantalum-containing gate electrode structure
- Patent number 7,067,422
- Issue date Jun 27, 2006
- Tokyo Electron Limited
- Kazuhito Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Constant emissivity deposition member
- Patent number 7,037,834
- Issue date May 2, 2006
- International Business Machines Corporation
- Fenton Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Delivery systems for gases for gases via the sublimation of solid p...
- Patent number 6,984,415
- Issue date Jan 10, 2006
- International Business Machines Corporation
- F. Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a metal layer using an intermittent precursor gas...
- Patent number 6,924,223
- Issue date Aug 2, 2005
- Tokyo Electron Limited
- Hideaki Yamasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of passivating a metal-gated complementary metal oxide semi...
- Patent number 6,770,500
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Alessandro Cesare Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS-compatible metal-semiconductor-metal photodetector
- Patent number 6,756,651
- Issue date Jun 29, 2004
- International Business Machines Corporation
- Ferenc M. Bozso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing metal films onto substrate surfaces utilizing...
- Patent number 6,660,330
- Issue date Dec 9, 2003
- International Business Machines Corporation
- Peter S. Locke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure having refractory metal film on a substrate
- Patent number 6,579,614
- Issue date Jun 17, 2003
- International Business Machines Corporation
- Kevin K. Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra thin, single phase, diffusion barrier for metal conductors
- Patent number 6,452,276
- Issue date Sep 17, 2002
- International Business Machines Corporation
- Stephan A. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for protecting refractory metal thin film requiring high tem...
- Patent number 6,238,737
- Issue date May 29, 2001
- International Business Machines Corporation
- Kevin K. Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Growth of epitaxial semiconductor films in presence of reactive metal
- Patent number 6,211,042
- Issue date Apr 3, 2001
- International Business Machines Corporation
- Fenton Read McFeely
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for improving the morphology of refractory metal thin films
- Patent number 6,107,199
- Issue date Aug 22, 2000
- International Business Machines Corporation
- Russell D. Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication of mid-cap metal gates compatible with ultra-thin diele...
- Patent number 6,091,122
- Issue date Jul 18, 2000
- International Business Machines Corporation
- Douglas Andrew Buchanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conductivity improvement in thin films of refractory metal
- Patent number 6,017,401
- Issue date Jan 25, 2000
- International Business Machines Corporation
- Fenton Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating mid-gap metal gates compatible with ultra-thi...
- Patent number 5,789,312
- Issue date Aug 4, 1998
- International Business Machines Corporation
- Douglas Andrew Buchanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ARCHITECTURE FOR AN ELECTROCHEMICAL ARTIFICIAL NEURAL NETWORK
- Publication number 20180293487
- Publication date Oct 11, 2018
- IBM CORPORATION
- Matthew Warren COPEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ACTIVATION OF GRAPHENE BUFFER LAYERS ON SILICON CARBIDE BY ULTRA LO...
- Publication number 20110073834
- Publication date Mar 31, 2011
- International Business Machines Corporation
- James B. Hannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Temperature Plasma-Free Method for the Nitridation of Copper
- Publication number 20110052797
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Fenton Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-Step Method to Selectively Deposit Ruthenium Layers of Arbitr...
- Publication number 20110045171
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Fenton Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION METHOD FOR THE INCORPORATION OF NITROGEN...
- Publication number 20100264398
- Publication date Oct 21, 2010
- International Business Machines Corporation
- Jennifer L. Gardner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR CHEMICAL VAPOR DEPOSITION OF MATERIALS WITH VIA FILLING...
- Publication number 20100009164
- Publication date Jan 14, 2010
- International Business Machines Corporation
- Fenton R. McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITION OF AN ULTRA-THIN ELECTROPOSITIVE METAL-CONTAI...
- Publication number 20090294876
- Publication date Dec 3, 2009
- International Business Machines Corporation
- Supratik Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITION OF AN ULTRA-THIN ELECTROPOSITIVE METAL-CONTAI...
- Publication number 20090008725
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Supratik Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Processing Compatible Metal Gate Electrode For pFE...
- Publication number 20080311745
- Publication date Dec 18, 2008
- International Business Machines Corporation
- Ricky Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CATALYZED SELECTIVE DEPOSITION OF MATERIALS INCLUDING GERMANI...
- Publication number 20080166586
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Supratik Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR CHEMICAL VAPOR DEPOSITION OF MATERIALS WITH VIA FILLING...
- Publication number 20080164579
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Fenton R. McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION METHOD FOR THE INCORPORATION OF NITROGEN...
- Publication number 20080164580
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Jennifer L. Gardner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dispenser system for atomic beam assisted metal organic chemical va...
- Publication number 20080026575
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Supratik Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Constant emissivity deposition member
- Publication number 20050260833
- Publication date Nov 24, 2005
- Fenton Read McFeely
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD tantalum compounds for FET gate electrodes
- Publication number 20050250318
- Publication date Nov 10, 2005
- Vijay Narayanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a tantalum-containing gate electrode structure
- Publication number 20050227441
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Kazuhito Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a metal layer
- Publication number 20050221000
- Publication date Oct 6, 2005
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Diffusion barriers formed by low temperature deposition
- Publication number 20050110142
- Publication date May 26, 2005
- Michael Wayne Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD tantalum compounds for FET get electrodes
- Publication number 20050104142
- Publication date May 19, 2005
- Vijav Narayanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a metal layer using an intermittent precursor gas...
- Publication number 20050069632
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Hideaki Yamasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing metal layers using sequential flow deposition
- Publication number 20050069641
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Tsukasa Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process of passivating a metal-gated complementary metal oxide semi...
- Publication number 20030186518
- Publication date Oct 2, 2003
- International Business Machines Corporation
- Alessandro Cesare Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High temperature processing compatible metal gate electrode for pFE...
- Publication number 20030098489
- Publication date May 29, 2003
- International Business Machines Corporation
- Ricky Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS-compatible metal-semiconductor-metal photodetector
- Publication number 20030057507
- Publication date Mar 27, 2003
- International Business Machines Corporation
- Ferenc M. Bozso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultra thin, single phase, diffusion barrier for metal conductors
- Publication number 20020175418
- Publication date Nov 28, 2002
- International Business Machines Corporation
- Stephan Alan Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deformation-susceptible substrate holder for low-pressure MOCVD and...
- Publication number 20020146903
- Publication date Oct 10, 2002
- International Business Machines Corporation
- Peter S. Locke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Actively cooled dispenser system for improved resistivity and phase...
- Publication number 20020086529
- Publication date Jul 4, 2002
- Fenton Read McFeely
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DELIVERY SYSTEMS FOR GASES FOR GASES VIA THE SUBLIMATION OF SOLID P...
- Publication number 20020009544
- Publication date Jan 24, 2002
- F. READ MCFEELY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for protecting refractory metal thin film requiring high tem...
- Publication number 20010019737
- Publication date Sep 6, 2001
- Kevin K. Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

John Jcobs Yurkas

Person

Patents Grantslast 30 patents

Architecture for an electrochemical artificial neural network

Chemical vapor deposition method for the incorporation of nitrogen...

Activation of graphene buffer layers on silicon carbide by ultra lo...

High temperature processing compatible metal gate electrode for pFE...

Metal catalyzed selective deposition of materials including germani...

Chemical vapor deposition method for the incorporation of nitrogen...

Process for chemical vapor deposition of materials with via filling...

Dispenser system for atomic beam assisted metal organic chemical va...

Ultra thin, single phase, diffusion barrier for metal conductors

Method of forming a tantalum-containing gate electrode structure

Constant emissivity deposition member

Delivery systems for gases for gases via the sublimation of solid p...

Method of forming a metal layer using an intermittent precursor gas...

Process of passivating a metal-gated complementary metal oxide semi...

CMOS-compatible metal-semiconductor-metal photodetector

Method for depositing metal films onto substrate surfaces utilizing...

Structure having refractory metal film on a substrate

Ultra thin, single phase, diffusion barrier for metal conductors

Method for protecting refractory metal thin film requiring high tem...

Growth of epitaxial semiconductor films in presence of reactive metal

Method for improving the morphology of refractory metal thin films

Fabrication of mid-cap metal gates compatible with ultra-thin diele...

Conductivity improvement in thin films of refractory metal

Method of fabricating mid-gap metal gates compatible with ultra-thi...

Patents Applicationslast 30 patents

ARCHITECTURE FOR AN ELECTROCHEMICAL ARTIFICIAL NEURAL NETWORK

ACTIVATION OF GRAPHENE BUFFER LAYERS ON SILICON CARBIDE BY ULTRA LO...

Low Temperature Plasma-Free Method for the Nitridation of Copper

Multi-Step Method to Selectively Deposit Ruthenium Layers of Arbitr...

CHEMICAL VAPOR DEPOSITION METHOD FOR THE INCORPORATION OF NITROGEN...

PROCESS FOR CHEMICAL VAPOR DEPOSITION OF MATERIALS WITH VIA FILLING...

METHOD FOR DEPOSITION OF AN ULTRA-THIN ELECTROPOSITIVE METAL-CONTAI...

METHOD FOR DEPOSITION OF AN ULTRA-THIN ELECTROPOSITIVE METAL-CONTAI...

High Temperature Processing Compatible Metal Gate Electrode For pFE...

METAL CATALYZED SELECTIVE DEPOSITION OF MATERIALS INCLUDING GERMANI...

PROCESS FOR CHEMICAL VAPOR DEPOSITION OF MATERIALS WITH VIA FILLING...

CHEMICAL VAPOR DEPOSITION METHOD FOR THE INCORPORATION OF NITROGEN...

Dispenser system for atomic beam assisted metal organic chemical va...

Constant emissivity deposition member

CVD tantalum compounds for FET gate electrodes

Method of forming a tantalum-containing gate electrode structure

Method of forming a metal layer

Diffusion barriers formed by low temperature deposition

CVD tantalum compounds for FET get electrodes

Method of forming a metal layer using an intermittent precursor gas...

Method for depositing metal layers using sequential flow deposition

Process of passivating a metal-gated complementary metal oxide semi...

High temperature processing compatible metal gate electrode for pFE...

CMOS-compatible metal-semiconductor-metal photodetector

Ultra thin, single phase, diffusion barrier for metal conductors

Deformation-susceptible substrate holder for low-pressure MOCVD and...

Actively cooled dispenser system for improved resistivity and phase...

DELIVERY SYSTEMS FOR GASES FOR GASES VIA THE SUBLIMATION OF SOLID P...

Method for protecting refractory metal thin film requiring high tem...