John L. Mauer IV

Person

South Kent, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Resist development endpoint detection for X-ray lithography
- Patent number 5,264,328
- Issue date Nov 23, 1993
- International Business Machines Corporation
- Ronald A. DellaGuardia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Schottky diode having limited area self-aligned guard ring and meth...
- Patent number 4,796,069
- Issue date Jan 3, 1989
- International Business Machines Corporation
- Narasipur G. Anantha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making Schottky diode having limited area self-aligned g...
- Patent number 4,691,435
- Issue date Sep 8, 1987
- International Business Machines Corporation
- Narasipur G. Anantha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation for high density integrated circuits
- Patent number 4,688,069
- Issue date Aug 18, 1987
- International Business Machines Corporation
- Richard C. Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam system
- Patent number 4,494,004
- Issue date Jan 15, 1985
- International Business Machines Corporation
- John L. Mauer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Isolation for high density integrated circuits
- Patent number 4,454,646
- Issue date Jun 19, 1984
- International Business Machines Corporation
- Richard C. Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation for high density integrated circuits
- Patent number 4,454,647
- Issue date Jun 19, 1984
- International Business Machines Corporation
- Richard C. Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar multi-level metal process with built-in etch stop
- Patent number 4,447,824
- Issue date May 8, 1984
- International Business Machines Corporation
- Joseph S. Logan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for avoiding residue on a vertical walled mesa
- Patent number 4,389,294
- Issue date Jun 21, 1983
- International Business Machines Corporation
- Narasipur G. Anantha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar multi-level metal process with built-in etch stop
- Patent number 4,367,119
- Issue date Jan 4, 1983
- International Business Machines Corporation
- Joseph S. Logan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar deep oxide isolation process utilizing resin glass and E-bea...
- Patent number 4,222,792
- Issue date Sep 16, 1980
- International Business Machines Corporation
- Reginald F. Lever
- H01 - BASIC ELECTRIC ELEMENTS

John L. Mauer IV

Person

Patents Grantslast 30 patents

Resist development endpoint detection for X-ray lithography

Schottky diode having limited area self-aligned guard ring and meth...

Method for making Schottky diode having limited area self-aligned g...

Isolation for high density integrated circuits

Electron beam system

Isolation for high density integrated circuits

Isolation for high density integrated circuits

Planar multi-level metal process with built-in etch stop

Method for avoiding residue on a vertical walled mesa

Planar multi-level metal process with built-in etch stop

Planar deep oxide isolation process utilizing resin glass and E-bea...