John R. Trow

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Patent number 6,736,931
- Issue date May 18, 2004
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-frequency electrostatically shielded toroidal plasma and radic...
- Patent number 6,634,313
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having an inductive antenna coupling power through a...
- Patent number 6,623,596
- Issue date Sep 23, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- A21 - BAKING EDIBLE DOUGHS
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,545,420
- Issue date Apr 8, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Parallel-plate electrode plasma reactor having an inductive antenna...
- Patent number 6,524,432
- Issue date Feb 25, 2003
- Applied Materials Inc.
- Kenneth Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,518,195
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic confinement in a plasma reactor having an RF bias electrode
- Patent number 6,488,807
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF Plasma reactor having an overhead solenoidal...
- Patent number 6,454,898
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor having an antenna adjacent a...
- Patent number 6,444,085
- Issue date Sep 3, 2002
- Applied Materials Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etch processes
- Patent number 6,251,792
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF tuning method for an RF plasma reactor using frequency servoing...
- Patent number 6,252,354
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Inductively coupled RF plasma reactor having an overhead solenoidal...
- Patent number 6,165,311
- Issue date Dec 26, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor having an inductive antenna coupling power through a...
- Patent number 6,077,384
- Issue date Jun 20, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- A21 - BAKING EDIBLE DOUGHS
Information Patent Grant
Inductively coupled RF plasma reactor having an overhead solenoidal...
- Patent number 6,074,512
- Issue date Jun 13, 2000
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process used in an RF coupled plasma reactor
- Patent number 6,068,784
- Issue date May 30, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Parallel plate electrode plasma reactor having an inductive antenna...
- Patent number 6,054,013
- Issue date Apr 25, 2000
- Applied Materials, Inc.
- Kenneth Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement for an inductively coupled plasma reactor
- Patent number 5,824,607
- Issue date Oct 20, 1998
- Applied Materials, Inc.
- John Trow
- B08 - CLEANING
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,583,737
- Issue date Dec 10, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,574,410
- Issue date Nov 12, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,572,170
- Issue date Nov 5, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Silicon scavenger in an inductively coupled RF plasma reactor
- Patent number 5,556,501
- Issue date Sep 17, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,539,609
- Issue date Jul 23, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,392,018
- Issue date Feb 21, 1995
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Electrostatic chuck for high power plasma processing
- Patent number 5,350,479
- Issue date Sep 27, 1994
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic field enhanced plasma processing chamber
- Patent number 5,346,579
- Issue date Sep 13, 1994
- Applied Materials, Inc.
- Joel M. Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically tuned matching network using predictor-corrector con...
- Patent number 5,187,454
- Issue date Feb 16, 1993
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
High-Frequency electrostatically shielded toroidal plasma and radic...
- Publication number 20040237897
- Publication date Dec 2, 2004
- Hiroji Hanawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Publication number 20040163764
- Publication date Aug 26, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dielectric etch plasma chamber utilizing a magnetic filter to optim...
- Publication number 20030029837
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- John R. Trow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-frequency electrostatically shielded toroidal plasma and radic...
- Publication number 20020108713
- Publication date Aug 15, 2002
- APPLIED MATERIALS, INC.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Publication number 20020020499
- Publication date Feb 21, 2002
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR
- Publication number 20020004309
- Publication date Jan 10, 2002
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

John R. Trow

Person

Patents Grantslast 30 patents

Inductively coupled RF plasma reactor and plasma chamber enclosure...

High-frequency electrostatically shielded toroidal plasma and radic...

Plasma reactor having an inductive antenna coupling power through a...

Plasma reactor using inductive RF coupling, and processes

Parallel-plate electrode plasma reactor having an inductive antenna...

Plasma reactor using inductive RF coupling, and processes

Magnetic confinement in a plasma reactor having an RF bias electrode

Inductively coupled RF Plasma reactor having an overhead solenoidal...

Inductively coupled RF plasma reactor having an antenna adjacent a...

Plasma etch processes

RF tuning method for an RF plasma reactor using frequency servoing...

Inductively coupled RF plasma reactor having an overhead solenoidal...

Plasma reactor having an inductive antenna coupling power through a...

Inductively coupled RF plasma reactor having an overhead solenoidal...

Process used in an RF coupled plasma reactor

Parallel plate electrode plasma reactor having an inductive antenna...

Plasma confinement for an inductively coupled plasma reactor

Electrostatic chuck usable in high density plasma

Electronically tuned matching networks using adjustable inductance...

Electronically tuned matching networks using adjustable inductance...

Silicon scavenger in an inductively coupled RF plasma reactor

Electrostatic chuck usable in high density plasma

Electronically tuned matching networks using adjustable inductance...

Electrostatic chuck for high power plasma processing

Magnetic field enhanced plasma processing chamber

Electronically tuned matching network using predictor-corrector con...

Patents Applicationslast 30 patents

High-Frequency electrostatically shielded toroidal plasma and radic...

Inductively coupled RF plasma reactor and plasma chamber enclosure...

Dielectric etch plasma chamber utilizing a magnetic filter to optim...

High-frequency electrostatically shielded toroidal plasma and radic...

Inductively coupled RF plasma reactor and plasma chamber enclosure...

PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR