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Jon E. Lieberman
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Montgomery, NY, US
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last 30 patents
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Patent Grant
High speed electron beam lithography pattern processing system
Patent number
5,909,658
Issue date
Jun 1, 1999
International Business Machines Corporation
Eileen Veronica Clarke
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Tri-deflection electron beam system
Patent number
4,945,246
Issue date
Jul 31, 1990
International Business Machines Corporation
Donald E. Davis
H01 - BASIC ELECTRIC ELEMENTS