Jon E. Lieberman

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Montgomery, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
High speed electron beam lithography pattern processing system
- Patent number 5,909,658
- Issue date Jun 1, 1999
- International Business Machines Corporation
- Eileen Veronica Clarke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tri-deflection electron beam system
- Patent number 4,945,246
- Issue date Jul 31, 1990
- International Business Machines Corporation
- Donald E. Davis
- H01 - BASIC ELECTRIC ELEMENTS