Number | Name | Date | Kind |
---|---|---|---|
4280186 | Hidai et al. | Jul 1981 | |
4387433 | Cardenia et al. | Jun 1983 | |
4435779 | Mayer et al. | Mar 1984 | |
4546451 | Bruce | Oct 1985 | |
4698509 | Wells et al. | Oct 1987 | |
4718019 | Fillion et al. | Jan 1988 | |
5005138 | Tobuse et al. | Apr 1991 | |
5175435 | Sakamoto et al. | Dec 1992 | |
5251140 | Chung et al. | Oct 1993 | |
5386211 | Goveas | Jan 1995 | |
5404019 | Ohno et al. | Apr 1995 | |
5428552 | Rudert, Jr. et al. | Jun 1995 | |
5448075 | Fueki et al. | Sep 1995 | |
5481472 | Chung et al. | Jan 1996 | |
5537567 | Galbraith et al. | Jul 1996 | |
5691541 | Ceglio et al. | Nov 1997 | |
5745734 | Craft et al. | Apr 1998 | |
5768372 | Sung et al. | Jun 1998 |
Entry |
---|
Rockrohr et al., Performance of IBM's EL-4 e-beam lithography system, Reprinted from Electron-Beam,X-ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, Feb. 20-21, 1995, vol. 2437, pp. 160-167. |