Jon S. Owyang

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition of hafnium-based high-k dielectric
- Patent number 7,205,247
- Issue date Apr 17, 2007
- Aviza Technology, Inc.
- Sang-In Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming re-entrant geometry for gate electrode of integ...
- Patent number 6,060,375
- Issue date May 9, 2000
- LSI Logic Corporation
- Jon Owyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a layer and semiconductor substrate
- Patent number 5,897,381
- Issue date Apr 27, 1999
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for rapid thermal processing of a wafer
- Patent number 5,893,952
- Issue date Apr 13, 1999
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Diffusion barrier for polysilicon gate electrode of MOS device in i...
- Patent number 5,837,598
- Issue date Nov 17, 1998
- LSI Logic Corporation
- Sheldon Aronowitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Product resulting from selective deposition of polysilicon over sin...
- Patent number 5,818,100
- Issue date Oct 6, 1998
- LSI Logic Corporation
- Douglas T. Grider
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing using a narrowband infrared source and fee...
- Patent number 5,756,369
- Issue date May 26, 1998
- LSI Logic Corporation
- Sheldon Aronowitz
- B24 - GRINDING POLISHING
Information Patent Grant
Process for selective deposition of polysilicon over single crystal...
- Patent number 5,646,073
- Issue date Jul 8, 1997
- LSI Logic Corporation
- Douglas T. Grider
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for depositing silicon-containing films
- Publication number 20070031598
- Publication date Feb 8, 2007
- Yoshikazu Okuyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multilayer multicomponent high-k films and methods for depositing t...
- Publication number 20060264066
- Publication date Nov 23, 2006
- Aviza Technology, Inc.
- Larry D. Bartholomew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jon S. Owyang

Person

Patents Grantslast 30 patents

Atomic layer deposition of hafnium-based high-k dielectric

Process for forming re-entrant geometry for gate electrode of integ...

Method of forming a layer and semiconductor substrate

Apparatus for rapid thermal processing of a wafer

Diffusion barrier for polysilicon gate electrode of MOS device in i...

Product resulting from selective deposition of polysilicon over sin...

Rapid thermal processing using a narrowband infrared source and fee...

Process for selective deposition of polysilicon over single crystal...

Patents Applicationslast 30 patents

Method for depositing silicon-containing films

Multilayer multicomponent high-k films and methods for depositing t...