JONGJU PARK

Person

HWASEONG-SI, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method of annealing reflective photomask by using laser
- Patent number 11,934,092
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Hakseung Han
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,852,583
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
- Patent number 11,635,371
- Issue date Apr 25, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Grant
Method of annealing reflective photomask by using laser
- Patent number 11,506,968
- Issue date Nov 22, 2022
- Samsung Electronics Co., Ltd.
- Hakseung Han
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mask including pellicle, pellicle repairing apparatus, and substrat...
- Patent number 9,703,186
- Issue date Jul 11, 2017
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam shapers, annealing systems employing the same, methods of heat...
- Patent number 9,466,490
- Issue date Oct 11, 2016
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Beam shapers, annealing systems employing the same, methods of heat...
- Patent number 9,087,698
- Issue date Jul 21, 2015
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming photomasks and photomasks formed by the same
- Patent number 8,697,318
- Issue date Apr 15, 2014
- Samsung Electronics Co., Ltd.
- Jongju Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER
- Publication number 20240184192
- Publication date Jun 6, 2024
- Samsung Electronics Co., Ltd.
- Hakseung Han
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20230408912
- Publication date Dec 21, 2023
- Samsung Electronics Co., Ltd.
- Jongkeun OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
- Publication number 20230236124
- Publication date Jul 27, 2023
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER
- Publication number 20230073206
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Hakseung Han
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CORRECTING APPARATUS OF EXTREME ULTRAVIOLET (EUV) PHOTOMASK AND COR...
- Publication number 20220283512
- Publication date Sep 8, 2022
- Samsung Electronics Co., Ltd.
- Sanguk PARK
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) PHOTOMASK AND MET...
- Publication number 20220113619
- Publication date Apr 14, 2022
- Samsung Electronics Co., Ltd.
- Jongkeun OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...
- Publication number 20210293701
- Publication date Sep 23, 2021
- Samsung Electronics Co., Ltd.
- Jongju Park
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER
- Publication number 20210223680
- Publication date Jul 22, 2021
- Samsung Electronics Co., Ltd.
- Hakseung Han
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTO...
- Publication number 20210033959
- Publication date Feb 4, 2021
- Samsung Electronics Co., Ltd.
- Hakseung Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM...
- Publication number 20170031142
- Publication date Feb 2, 2017
- Samsung Electronics Co., Ltd.
- Eokbong KIM
- G02 - OPTICS
Information Patent Application
Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrat...
- Publication number 20160139501
- Publication date May 19, 2016
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...
- Publication number 20150311078
- Publication date Oct 29, 2015
- Sanghyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...
- Publication number 20140076867
- Publication date Mar 20, 2014
- Sanghyun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD OF FORMING PHOTOMASKS AND PHOTOMASKS FORMED BY THE SAME
- Publication number 20130122404
- Publication date May 16, 2013
- Samsung Electronics Co., Ltd.
- JONGJU PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

JONGJU PARK

Person

Patents Grantslast 30 patents

Method of annealing reflective photomask by using laser

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Apparatus and method for measuring phase of extreme ultraviolet (EU...

Method of annealing reflective photomask by using laser

Mask including pellicle, pellicle repairing apparatus, and substrat...

Beam shapers, annealing systems employing the same, methods of heat...

Beam shapers, annealing systems employing the same, methods of heat...

Method of forming photomasks and photomasks formed by the same

Patents Applicationslast 30 patents

METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER

METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMI...

APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...

METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER

CORRECTING APPARATUS OF EXTREME ULTRAVIOLET (EUV) PHOTOMASK AND COR...

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) PHOTOMASK AND MET...

APPARATUS AND METHOD FOR MEASURING PHASE OF EXTREME ULTRAVIOLET (EU...

METHOD OF ANNEALING REFLECTIVE PHOTOMASK BY USING LASER

EXTREME ULTRAVIOLET PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTO...

APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM...

Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrat...

BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...

BEAM SHAPERS, ANNEALING SYSTEMS EMPLOYING THE SAME, METHODS OF HEAT...

METHOD OF FORMING PHOTOMASKS AND PHOTOMASKS FORMED BY THE SAME