Joshua Jon THORNES

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 12,001,144
- Issue date Jun 4, 2024
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,768,438
- Issue date Sep 26, 2023
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine detection in a gas discharge light source
- Patent number 11,754,541
- Issue date Sep 12, 2023
- Cymer, LLC
- Joshua Jon Thornes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for imaging using narrowed bandwidth
- Patent number 11,747,739
- Issue date Sep 5, 2023
- ASML Netherlands
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,686,951
- Issue date Jun 27, 2023
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 11,526,082
- Issue date Dec 13, 2022
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,526,083
- Issue date Dec 13, 2022
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,054,665
- Issue date Jul 6, 2021
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 11,050,213
- Issue date Jun 29, 2021
- Cymer, LLC
- Joshua Jon Thornes
- G01 - MEASURING TESTING
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 10,727,642
- Issue date Jul 28, 2020
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,627,724
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Frank Everts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 10,451,890
- Issue date Oct 22, 2019
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G01 - MEASURING TESTING
Information Patent Grant
Adjusting an amount of coherence of a light beam
- Patent number 10,267,687
- Issue date Apr 23, 2019
- Cymer, LLC
- Thomas Frederick Allen Bibby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring system for an optical lithography system
- Patent number 10,234,769
- Issue date Mar 19, 2019
- Cymer, LLC
- Andrei Dorobantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography optics adjustment and monitoring
- Patent number 10,095,118
- Issue date Oct 9, 2018
- Cymer, LLC
- Thomas Frederick Allen Bibby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of a spectral feature of a pulsed light beam
- Patent number 9,997,888
- Issue date Jun 12, 2018
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjusting an amount of coherence of a light beam
- Patent number 9,945,730
- Issue date Apr 17, 2018
- Cymer, LLC
- Thomas Frederick Allen Bibby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for automatic gas optimization in a two-chamber g...
- Patent number 9,831,628
- Issue date Nov 28, 2017
- Cymer, LLC
- Kevin O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology system and method having a plurality of sensors for estim...
- Patent number 9,778,108
- Issue date Oct 3, 2017
- Cymer, LLC
- Joshua Thornes
- G01 - MEASURING TESTING
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 9,762,023
- Issue date Sep 12, 2017
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for automatic gas optimization in a two-chamber g...
- Patent number 9,130,337
- Issue date Sep 8, 2015
- Cymer, LLC
- Kevin O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for high accuracy gas refill in a two chamber gas...
- Patent number 8,873,600
- Issue date Oct 28, 2014
- Cymer, LLC
- Rui Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for automatic gas optimization in a two-chamber g...
- Patent number 8,411,720
- Issue date Apr 2, 2013
- Cymer, Inc.
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20240310736
- Publication date Sep 19, 2024
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20230152707
- Publication date May 18, 2023
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...
- Publication number 20230040812
- Publication date Feb 9, 2023
- CYMER, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF GENERATING MULTIPLE LASER BEAMS
- Publication number 20220255288
- Publication date Aug 11, 2022
- CYMER, LLC
- Walter Dale Gillespie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS
- Publication number 20220255286
- Publication date Aug 11, 2022
- CYMER, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH
- Publication number 20220163899
- Publication date May 26, 2022
- ASML Nethlands B. V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...
- Publication number 20210349404
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20210239998
- Publication date Aug 5, 2021
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G01 - MEASURING TESTING
Information Patent Application
SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...
- Publication number 20210018846
- Publication date Jan 21, 2021
- CYMER, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20200340965
- Publication date Oct 29, 2020
- CYMER, LLC
- Joshua Jon Thornes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20200321746
- Publication date Oct 8, 2020
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20200301286
- Publication date Sep 24, 2020
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20190324286
- Publication date Oct 24, 2019
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM
- Publication number 20180335701
- Publication date Nov 22, 2018
- CYMER, LLC
- Andrei Dorobantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180253014
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Frank EVERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20180203248
- Publication date Jul 19, 2018
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G02 - OPTICS
Information Patent Application
ADJUSTING AN AMOUNT OF COHERENCE OF A LIGHT BEAM
- Publication number 20180180487
- Publication date Jun 28, 2018
- CYMER, LLC
- Thomas Frederick Allen Bibby
- G02 - OPTICS
Information Patent Application
CONTROL OF A SPECTRAL FEATURE OF A PULSED LIGHT BEAM
- Publication number 20180109068
- Publication date Apr 19, 2018
- CYMER, LLC
- Willard Earl Conley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING AN AMOUNT OF COHERENCE OF A LIGHT BEAM
- Publication number 20180066995
- Publication date Mar 8, 2018
- CYMER, LLC
- Thomas Frederick Allen Bibby
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY OPTICS ADJUSTMENT AND MONITORING
- Publication number 20180017875
- Publication date Jan 18, 2018
- CYMER, LLC
- Thomas Frederick Allen BIBBY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20180006425
- Publication date Jan 4, 2018
- CYMER, LLC
- Joshua Jon Thornes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER G...
- Publication number 20170279240
- Publication date Sep 28, 2017
- CYMER, LLC
- Kevin O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20170179677
- Publication date Jun 22, 2017
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spectral Feature Metrology of a Pulsed Light Beam
- Publication number 20160341602
- Publication date Nov 24, 2016
- CYMER, LLC
- Joshua Thornes
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Automatic Gas Optimization in a Two-Chamber G...
- Publication number 20130003773
- Publication date Jan 3, 2013
- Cymer, Inc.
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for High Accuracy Gas Refill in a Two Chamber Gas...
- Publication number 20130000773
- Publication date Jan 3, 2013
- Cymer, Inc.
- Rui Jiang
- H01 - BASIC ELECTRIC ELEMENTS

Joshua Jon THORNES

Person

Patents Grantslast 30 patents

Forming multiple aerial images in a single lithography exposure pass

Spectral feature selection and pulse timing control of a pulsed lig...

Fluorine detection in a gas discharge light source

Method and apparatus for imaging using narrowed bandwidth

Reducing speckle in an excimer light source

Forming multiple aerial images in a single lithography exposure pass

Spectral feature selection and pulse timing control of a pulsed lig...

Reducing speckle in an excimer light source

Online calibration for repetition rate dependent performance variables

Online calibration for repetition rate dependent performance variables

Lithographic apparatus and method

Reducing speckle in an excimer light source

Adjusting an amount of coherence of a light beam

Monitoring system for an optical lithography system

Lithography optics adjustment and monitoring

Control of a spectral feature of a pulsed light beam

Adjusting an amount of coherence of a light beam

System and method for automatic gas optimization in a two-chamber g...

Metrology system and method having a plurality of sensors for estim...

Online calibration for repetition rate dependent performance variables

System and method for automatic gas optimization in a two-chamber g...

System and method for high accuracy gas refill in a two chamber gas...

System and method for automatic gas optimization in a two-chamber g...

Patents Applicationslast 30 patents

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...

APPARATUS FOR AND METHOD OF GENERATING MULTIPLE LASER BEAMS

CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS

METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH

METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...

FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

MONITORING SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM

LITHOGRAPHIC APPARATUS AND METHOD

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

ADJUSTING AN AMOUNT OF COHERENCE OF A LIGHT BEAM

CONTROL OF A SPECTRAL FEATURE OF A PULSED LIGHT BEAM

ADJUSTING AN AMOUNT OF COHERENCE OF A LIGHT BEAM

LITHOGRAPHY OPTICS ADJUSTMENT AND MONITORING

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER G...

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

Spectral Feature Metrology of a Pulsed Light Beam

System and Method for Automatic Gas Optimization in a Two-Chamber G...

System and Method for High Accuracy Gas Refill in a Two Chamber Gas...