Joydeep Guha

Person

Danville, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Adjustable side gas plenum for edge rate control in a downstream re...
- Patent number 10,622,189
- Issue date Apr 14, 2020
- Lam Research Corporation
- Andrew Stratton Bravo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High aspect ratio etch of oxide metal oxide metal stack
- Patent number 10,242,883
- Issue date Mar 26, 2019
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual chamber plasma etcher with ion accelerator
- Patent number 10,134,605
- Issue date Nov 20, 2018
- Lam Research Corporation
- Joydeep Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System, method and apparatus for ion milling in a plasma etch chamber
- Patent number 9,899,227
- Issue date Feb 20, 2018
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure purge etch method for etching complex 3-D structures
- Patent number 9,870,932
- Issue date Jan 16, 2018
- Lam Research Corporation
- Pilyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for selectively etching tungsten in a downstrea...
- Patent number 9,837,286
- Issue date Dec 5, 2017
- Lam Research Corporation
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with combination mask
- Patent number 9,659,783
- Issue date May 23, 2017
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for eliminating flourine residue in a substrate...
- Patent number 9,601,319
- Issue date Mar 21, 2017
- Lam Research Corporation
- Andrew Stratton Bravo
- B08 - CLEANING
Information Patent Grant
Patterning of a hard mask material
- Patent number 9,514,955
- Issue date Dec 6, 2016
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual chamber plasma etcher with ion accelerator
- Patent number 9,431,269
- Issue date Aug 30, 2016
- Lam Research Corporation
- Joydeep Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual chamber plasma etcher with ion accelerator
- Patent number 9,147,581
- Issue date Sep 29, 2015
- Lam Research Corporation
- Joydeep Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatuses for void-free tungsten fill in three-dimens...
- Patent number 9,082,826
- Issue date Jul 14, 2015
- Lam Research Corporation
- Anand Chandrashekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with combination mask
- Patent number 9,018,103
- Issue date Apr 28, 2015
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a magnetoresistive random-access memory device
- Patent number 8,895,323
- Issue date Nov 25, 2014
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waferless auto conditioning
- Patent number 8,784,676
- Issue date Jul 22, 2014
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer-layer etch of non volatile materials using plasma
- Patent number 8,608,973
- Issue date Dec 17, 2013
- Lam Research Corporation
- Joydeep Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK
- Publication number 20180374712
- Publication date Dec 27, 2018
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Process of Implementing Machine Learning in Complex Mult...
- Publication number 20180082826
- Publication date Mar 22, 2018
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESSURE PURGE ETCH METHOD FOR ETCHING COMPLEX 3-D STRUCTURES
- Publication number 20180033657
- Publication date Feb 1, 2018
- LAM RESEARCH CORPORATION
- Pilyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE SIDE GAS PLENUM FOR EDGE RATE CONTROL IN A DOWNSTREAM RE...
- Publication number 20170330728
- Publication date Nov 16, 2017
- LAM RESEARCH CORPORATION
- Andrew Stratton Bravo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVELY ETCHING TUNGSTEN IN A DOWNSTREA...
- Publication number 20170069511
- Publication date Mar 9, 2017
- LAM RESEARCH CORPORATION
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Separately Applying Charged Plasma Constitu...
- Publication number 20170040170
- Publication date Feb 9, 2017
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR
- Publication number 20150364339
- Publication date Dec 17, 2015
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING OF A HARD MASK MATERIAL
- Publication number 20150364337
- Publication date Dec 17, 2015
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR
- Publication number 20150364349
- Publication date Dec 17, 2015
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO ETCH WITH COMBINATION MASK
- Publication number 20150200106
- Publication date Jul 16, 2015
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO ETCH WITH COMBINATION MASK
- Publication number 20150087154
- Publication date Mar 26, 2015
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SOLUTION FOR CLEANING METAL RESIDUE
- Publication number 20150079786
- Publication date Mar 19, 2015
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR
- Publication number 20150017810
- Publication date Jan 15, 2015
- LAM RESEARCH CORPORATION
- Joydeep Guha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR VOID-FREE TUNGSTEN FILL IN THREE-DIMENS...
- Publication number 20140349477
- Publication date Nov 27, 2014
- Anand Chandrashekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR ION MILLING IN A PLASMA ETCH CHAMBER
- Publication number 20140235056
- Publication date Aug 21, 2014
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BAFFLE RING FOR A PLASMA PROCESSING APPARATUS AND METHOD OF USE
- Publication number 20140051253
- Publication date Feb 20, 2014
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER-LAYER ETCH OF NON VOLATILE MATERIALS USING PLASMA
- Publication number 20130323932
- Publication date Dec 5, 2013
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LAYER-LAYER ETCH OF NON VOLATILE MATERIALS
- Publication number 20130270227
- Publication date Oct 17, 2013
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFERLESS AUTO CONDITIONING
- Publication number 20130203255
- Publication date Aug 8, 2013
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING DEVICE
- Publication number 20130154037
- Publication date Jun 20, 2013
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID PULSING PLASMA PROCESSING SYSTEMS
- Publication number 20130119018
- Publication date May 16, 2013
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS

Joydeep Guha

Person

Patents Grantslast 30 patents

Adjustable side gas plenum for edge rate control in a downstream re...

High aspect ratio etch of oxide metal oxide metal stack

Dual chamber plasma etcher with ion accelerator

System, method and apparatus for ion milling in a plasma etch chamber

Pressure purge etch method for etching complex 3-D structures

Systems and methods for selectively etching tungsten in a downstrea...

High aspect ratio etch with combination mask

Systems and methods for eliminating flourine residue in a substrate...

Patterning of a hard mask material

Dual chamber plasma etcher with ion accelerator

Dual chamber plasma etcher with ion accelerator

Methods and apparatuses for void-free tungsten fill in three-dimens...

High aspect ratio etch with combination mask

Method of forming a magnetoresistive random-access memory device

Waferless auto conditioning

Layer-layer etch of non volatile materials using plasma

Patents Applicationslast 30 patents

HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK

Method and Process of Implementing Machine Learning in Complex Mult...

PRESSURE PURGE ETCH METHOD FOR ETCHING COMPLEX 3-D STRUCTURES

ADJUSTABLE SIDE GAS PLENUM FOR EDGE RATE CONTROL IN A DOWNSTREAM RE...

SYSTEMS AND METHODS FOR SELECTIVELY ETCHING TUNGSTEN IN A DOWNSTREA...

Systems and Methods for Separately Applying Charged Plasma Constitu...

DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR

PATTERNING OF A HARD MASK MATERIAL

DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR

HIGH ASPECT RATIO ETCH WITH COMBINATION MASK

HIGH ASPECT RATIO ETCH WITH COMBINATION MASK

METHOD AND SOLUTION FOR CLEANING METAL RESIDUE

DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR

METHODS AND APPARATUSES FOR VOID-FREE TUNGSTEN FILL IN THREE-DIMENS...

SYSTEM, METHOD AND APPARATUS FOR ION MILLING IN A PLASMA ETCH CHAMBER

PLASMA BAFFLE RING FOR A PLASMA PROCESSING APPARATUS AND METHOD OF USE

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS USING PLASMA

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS

WAFERLESS AUTO CONDITIONING

METHOD OF MAKING DEVICE

HYBRID PULSING PLASMA PROCESSING SYSTEMS