Jozef Petrus Henricus Benschop

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 11,194,256
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 10,852,640
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,698,312
- Issue date Jun 30, 2020
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual stage lithographic apparatus and device manufacturing method
- Patent number RE47943
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Marinus Aart Van Den Brink
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,228,615
- Issue date Mar 12, 2019
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G02 - OPTICS
Information Patent Grant
Dual stage lithographic apparatus and device manufacturing method
- Patent number RE46933
- Issue date Jul 3, 2018
- ASML Netherlands B.V.
- Marinus Aart Van Den Brink
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,335,638
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of the position of a radiation beam spot in lithography
- Patent number 9,304,401
- Issue date Apr 5, 2016
- ASML Netherlands B.V.
- Felix Godfried Peter Peeters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual stage lithographic apparatus and device manufacturing method
- Patent number RE45576
- Issue date Jun 23, 2015
- ASML Netherlands B.V.
- Marinus Aart Van Den Brink
- 001 -
Information Patent Grant
Substrate table for a lithographic apparatus, lithographic apparatu...
- Patent number 8,941,815
- Issue date Jan 27, 2015
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,902,403
- Issue date Dec 2, 2014
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor arrangement for lithographic apparatus and device manu...
- Patent number 8,842,293
- Issue date Sep 23, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor, lithographic apparatus, and substrate surface positio...
- Patent number 8,675,210
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,654,311
- Issue date Feb 18, 2014
- ASML Netherlands B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 8,531,648
- Issue date Sep 10, 2013
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus and device manufacturing method
- Patent number 6,597,431
- Issue date Jul 22, 2003
- ASML Netherlands B.V.
- Jozef Petrus Henricus Benschop
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20210318622
- Publication date Oct 14, 2021
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20200225586
- Publication date Jul 16, 2020
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20190146332
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G02 - OPTICS
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20170205704
- Publication date Jul 20, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140055764
- Publication date Feb 27, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
- Publication number 20130335721
- Publication date Dec 19, 2013
- ASML NETHERLANDS B.V.
- Felix Godfried Peter Peeters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIO...
- Publication number 20130077079
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070216882
- Publication date Sep 20, 2007
- ASML NETHERLANDS B.V.
- Jozef Petrus Henricus Benschop
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20070132973
- Publication date Jun 14, 2007
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060285097
- Publication date Dec 21, 2006
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual stage lithographic apparatus and device manufacturing method
- Publication number 20060227308
- Publication date Oct 12, 2006
- ASML NETHERLANDS B.V.
- Marinus Aart Van Den Brink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20060061749
- Publication date Mar 23, 2006
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050030501
- Publication date Feb 10, 2005
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040141166
- Publication date Jul 22, 2004
- Technology Center
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus and device manufacturing method
- Publication number 20020018194
- Publication date Feb 14, 2002
- Jozef Petrus Henricus Benschop
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jozef Petrus Henricus Benschop

Person

Patents Grantslast 30 patents

Optical diffraction component for suppressing at least one target w...

Optical diffraction component for suppressing at least one target w...

Membranes for use within a lithographic apparatus and a lithographi...

Dual stage lithographic apparatus and device manufacturing method

Membranes for use within a lithographic apparatus and a lithographi...

Dual stage lithographic apparatus and device manufacturing method

Lithographic apparatus, programmable patterning device and lithogra...

Measurement of the position of a radiation beam spot in lithography

Dual stage lithographic apparatus and device manufacturing method

Substrate table for a lithographic apparatus, lithographic apparatu...

Lithographic apparatus and device manufacturing method

Level sensor arrangement for lithographic apparatus and device manu...

Level sensor, lithographic apparatus, and substrate surface positio...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, programmable patterning device and lithogra...

Lithographic projection apparatus and device manufacturing method

Patents Applicationslast 30 patents

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY

LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIO...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Dual stage lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic projection apparatus and device manufacturing method