Jun Iwashita

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,618,843
- Issue date Apr 11, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 9,104,101
- Issue date Aug 11, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Kensuke Matsuzawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, radical polymerization initiator, method for producing co...
- Patent number 9,097,971
- Issue date Aug 4, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for EUV or EB, and method of forming resist pattern
- Patent number 9,057,948
- Issue date Jun 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,986,919
- Issue date Mar 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,883,396
- Issue date Nov 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,795,948
- Issue date Aug 5, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, and polymeric...
- Patent number 8,778,595
- Issue date Jul 15, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,586,281
- Issue date Nov 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,574,809
- Issue date Nov 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, method of forming resist pattern, poly...
- Patent number 8,268,530
- Issue date Sep 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,232,040
- Issue date Jul 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming resist pattern
- Patent number 8,043,795
- Issue date Oct 25, 2011
- Tokyo Ohika Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,034,536
- Issue date Oct 11, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer compound, resist composition and method of forming resist p...
- Patent number 8,021,824
- Issue date Sep 20, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method of forming resist pattern
- Patent number 7,939,243
- Issue date May 10, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, negative resist composition, and method of formin...
- Patent number 7,820,360
- Issue date Oct 26, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition and method for forming resist pattern
- Patent number 7,709,179
- Issue date May 4, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and method of forming resist pattern
- Patent number 7,598,017
- Issue date Oct 6, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition and method of forming resist pattern
- Patent number 7,582,409
- Issue date Sep 1, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 6,982,140
- Issue date Jan 3, 2006
- Tokyo Ohka Kogyo., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,936,400
- Issue date Aug 30, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...
- Publication number 20140186769
- Publication date Jul 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takaaki Kaiho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION...
- Publication number 20140162193
- Publication date Jun 12, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...
- Publication number 20140141373
- Publication date May 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140093824
- Publication date Apr 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130337387
- Publication date Dec 19, 2013
- Tokyo Ohta Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20130252180
- Publication date Sep 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20130157201
- Publication date Jun 20, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130143159
- Publication date Jun 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130137048
- Publication date May 30, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130095427
- Publication date Apr 18, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130071789
- Publication date Mar 21, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120282551
- Publication date Nov 8, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kensuke MATSUZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120251951
- Publication date Oct 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV, METHOD FOR PRODUCING RESIST COMPOSITION...
- Publication number 20120208124
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120208128
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20120100487
- Publication date Apr 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110311912
- Publication date Dec 22, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IWASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLY...
- Publication number 20100273106
- Publication date Oct 28, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN
- Publication number 20100248144
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi IWAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100159389
- Publication date Jun 24, 2010
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100143845
- Publication date Jun 10, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST P...
- Publication number 20100081080
- Publication date Apr 1, 2010
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100062379
- Publication date Mar 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20100055606
- Publication date Mar 4, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeyoshi Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION
- Publication number 20090305163
- Publication date Dec 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and method of forming resist pattern
- Publication number 20090297980
- Publication date Dec 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMIN...
- Publication number 20090162785
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090142698
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090142693
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Jun Iwashita

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Compound, radical polymerization initiator, method for producing co...

Resist composition for EUV or EB, and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern and polymeric...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Resist composition, method of forming resist pattern, and polymeric...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern, poly...

Positive resist composition and method of forming resist pattern

Resist composition

Method of forming resist pattern

Resist composition and method of forming resist pattern

Polymer compound, resist composition and method of forming resist p...

Resin, resist composition and method of forming resist pattern

Polymer compound, negative resist composition, and method of formin...

Negative resist composition and method for forming resist pattern

Negative resist composition and method of forming resist pattern

Negative resist composition and method of forming resist pattern

Resist composition

Resist composition

Resist composition

Positive resist composition and method of forming resist pattern

Negative resist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...

RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION...

COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV, METHOD FOR PRODUCING RESIST COMPOSITION...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLY...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST P...

METHOD OF FORMING RESIST PATTERN

Positive resist composition and method of forming resist pattern

NEGATIVE RESIST COMPOSITION

Resist composition and method of forming resist pattern

POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMIN...

NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN