Patent Application
20090305163
The present invention relates to a negative resist composition.
Priority is claimed on Japanese Patent Application No. 2004-335076, filed Nov. 18, 2004, the contents of which are incorporated herein by reference.
In recent years, in the production of semiconductor elements and liquid crystal display elements, advances in lithography techniques have lead to rapid progress in the field of pattern miniaturization. Typically, these miniaturization techniques involve shortening the wavelength of the exposure light source. Conventionally, ultraviolet radiation typified by g-line and i-line radiation has been used, but nowadays, mass production of semiconductor elements using KrF excimer lasers and ArF excimer lasers has commenced. Furthermore, investigations are also being conducted into the use of radiation with even shorter wavelengths than these excimer lasers, including F2 excimer lasers, electron beams, extreme ultraviolet radiation, and X-rays.
One example of a known resist material that satisfies the high resolution properties necessary for reproducing patterns of minute dimensions is a chemically amplified resist composition, which includes a base resin that undergoes a change in alkali solubility under the action of acid, and an acid generator that generates acid on exposure. These chemically amplified resist compositions include negative compositions that contain an alkali-soluble resin, an acid generator and a cross-linking agent, and positive compositions that contain a resin that exhibits increased alkali solubility under the action of acid, and an acid generator.
For example, resins (acrylic resins) containing structural units derived from (meth)acrylic acid are widely used as the base resins for resists used within ArF excimer laser lithography and the like as they offer excellent transparency in the vicinity of 193 nm (see patent reference 1).
During formation of a resist pattern using this type of chemically amplified resist composition, steps are conducted for forming a resist layer on a substrate using the resist composition, selectively exposing the resist layer, conducting a post exposure baking treatment (PEB treatment), and developing the resist layer to form the resist pattern.
Furthermore, when patterns such as line patterns and hole patterns are formed on a single substrate, both dense patterns in which the spacing between adjacent patterns is narrow, and isolated patterns in which the spacing between adjacent patterns is large may be formed on the same substrate.
In recent years, as devices have become more complex and packing densities have increased, the ability to precisely form different patterns on a single substrate in this manner has become highly desirable.
However, a problem arises in that in conventional resist pattern formation, the depth of focus (DOF) during formation of an isolated pattern tends to be narrower than the DOF during formation of a dense pattern.
Accordingly, patent reference 2 discloses a technique in which, for example, a second resist layer (an upper layer) is laminated on top of a first resist layer (a lower layer) in which a dense pattern has been formed, thereby filling in the dense pattern, subsequently forming a different pattern from the dense pattern within the upper layer, thereby exposing a portion of the dense pattern of the lower layer while leaving the remainder of the dense pattern buried. In other words, the pattern of the upper layer is formed so that a portion of the pattern formed in the lower layer remains filled in. For example, the pattern of the upper layer may be formed with a larger size than the pattern formed in the lower layer. For example, in those cases where a hole pattern is formed in both the upper and lower layers, a pattern may be formed in the upper layer in which the hole diameter is larger than the hole diameter of a dense pattern formed in the lower layer, with the hole patterns of the upper and lower layers formed so as to interconnect. By employing such a configuration, the dense pattern of the lower layer can be exposed within those areas in which the hole pattern of the upper layer is not formed, and the upper layer is removed. Moreover, in those areas where the upper layer is not removed but rather undergoes a negative conversion, the dense pattern of the lower layer partially remains in a buried state.
As a result, in one portion on the substrate, an isolated pattern is formed from the pattern formed in the lower layer, and the pattern formed in the upper layer that interconnects with this lower layer pattern. In other words, in this pattern, because the dense pattern formed in the lower layer is used, the pattern of the lower layer that contacts the substrate can be formed at a desired size, and an isolated pattern that satisfies the required DOF characteristics can be obtained.
In this manner, a resist pattern that contains a mixture of a dense pattern and an isolated pattern can be formed on a single substrate.
As a result, the problems caused by variation in the DOF characteristics between dense patterns and isolated patterns can be suppressed.
[Patent Reference 1]
Japanese Unexamined Patent Application, First Publication No. 2003-167347
[Patent Reference 2]
U.S. Patent Application, No. 2003-0104319A1
However, in the above method of forming a resist pattern, in which a dense pattern is formed in the lower layer, and a pattern that is different from the lower layer is formed in the upper layer, a problem arises in that mixing occurs at the interface between the upper and lower layers. Mixing refers to a phenomenon in which the two resist layers dissolve within each other.
The present invention takes the above circumstances into consideration, with an object of providing a negative resist composition that enables mixing to be suppressed in the above method of forming a resist pattern in which a dense pattern is formed in a lower layer and a pattern that is different from the lower layer is formed in an upper layer.
In order to achieve the above object, the present invention adopts the aspects described below.
In other words, a first aspect of the present invention is a negative resist composition that is used for either a first or second resist layer within a method of forming a resist pattern that includes the following steps (i) and (ii): (i) a step of forming the first resist layer on a substrate using a first resist composition, and then conducting selective exposure that forms a dense pattern in the first resist layer, and (ii) a step of forming the second resist layer on top of the first resist layer using a second resist composition, and then conducting selective exposure that forms a pattern in the second resist layer, wherein
the negative resist composition is dissolved in an alcohol-based organic solvent, which functions as an organic solvent (D) that does not dissolve the first or second resist layer that contacts the resist layer formed from the negative resist composition.
A second aspect of the present invention is a negative resist composition that includes an alkali-soluble resin component (A″), an acid generator component (B) that generates acid on exposure, and a cross-linking agent component (C) dissolved in a monohydric alcohol-based organic solvent.
The term “exposure” is not limited to irradiation with light, but describes a general concept that includes irradiation with any form of radiation, such as an electron beam or the like.
The present invention is able to provide a negative resist composition that suppresses mixing within a method of forming a resist pattern in which a dense pattern is formed in a lower layer and a pattern is formed in an upper layer.
The reference numerals shown in these figures are defined as follows:
A first aspect of the present invention is a negative resist composition that is used for either a first or second resist layer within a method of forming a resist pattern that includes the following steps (i) and (ii): (i) a step of forming the first resist layer on a substrate using a first resist composition, and then conducting selective exposure that forms a dense pattern in the first resist layer, and (ii) a step of forming the second resist layer on top of the first resist layer using a second resist composition, and then conducting selective exposure that forms a pattern in the second resist layer, wherein
the negative resist composition is dissolved in an alcohol-based organic solvent, which functions as an organic solvent (D) that does not dissolve the first or second resist layer that contacts the resist layer formed from the negative resist composition.
In the above steps (i) and (ii), a negative resist composition dissolved in an alcohol-based organic solvent must be used for either the first or second resist composition. By using an alcohol-based organic solvent, mixing between the resist layer formed from the negative resist composition, and the first or second resist layer that contacts the resist layer formed from the negative resist composition can be prevented.
Specific examples of the method of forming a resist pattern including the aforementioned steps (i) and (ii) include the first example and the second example described below.
In the following specific examples, a positive resist composition is used as the first resist composition that forms the first resist layer, and the negative resist composition of the present invention is used as the second resist composition that forms the second resist layer, although provided the negative resist composition of the present invention is used, the present invention is not restricted to the above configuration.
In other words, possible combinations include—combinations in which the first resist layer is positive, and the second resist layer is negative; —combinations in which the first resist layer is negative, and the second resist layer is positive; and—combinations in which the first resist layer is negative, and the second resist layer is also negative.
From the viewpoint of suppressing mixing, combinations of a negative resist composition according to the first aspect or second aspect, and a positive resist composition are preferred. In other words, the resist composition used for forming the other resist layer that contacts the resist layer formed from the above negative resist composition is preferably a positive resist composition.
For example, in those cases where a hole pattern is to be formed, in terms of the resolution and DOF characteristics achieved, the first resist layer is preferably formed from a positive resist composition.
In the case of a line & space pattern, in terms of the resolution and DOF characteristics achieved, the first resist layer may be either a positive layer or a negative layer.
Furthermore, if the first resist layer is formed using the negative resist composition, then exposure causes an increase in molecular weight as a result of the reaction between the base resin component and the cross-linking agent, thereby forming a solid first resist layer that is resistant to dissolution in resist solvents, and consequently mixing tends to become less likely, which offers the advantage that the materials for the resist composition for forming the second resist layer can be selected from a broader range of possibilities.
The first example is a method of forming a resist pattern that includes the following steps (i-0) and (ii-0): (i-0) a step of forming a first resist layer on a substrate using a positive resist composition, and then conducting selective exposure, thereby forming a latent image of a dense pattern on the first resist layer, and (ii-0) a step of forming a second resist layer (an upper layer) on top of the first resist layer (a lower layer) using a negative resist composition, conducting selective exposure, and then developing the first resist layer and the second resist layer simultaneously, thereby exposing a portion of the latent image of the dense pattern.
Here, a dense pattern refers to a pattern in which the spacing between adjacent patterns is narrow when a line pattern or hole pattern is formed. Specifically, in a cross-section of the pattern, the ratio of the spacing between adjacent patterns relative to the pattern width is preferably no higher than 1, even more preferably no higher than 0.9, and is most preferably 0.8 or less. For practical reasons, the lower limit for this ratio is typically 0.5 or greater. In a hole pattern, the pattern width refers to the width of the removed portions of the resist layer, for example, the hole diameter of a hole pattern. The pattern width in a line pattern refers to the line width.
An isolated pattern describes a pattern in which the spacing between adjacent patterns is greater than that within a dense pattern. Specifically, in a cross-section of the pattern, the ratio of the spacing between adjacent patterns relative to the pattern width is preferably 2 or greater, even more preferably 3 or greater, and is most preferably 5 or greater. For practical reasons, the upper limit for this ratio is typically no greater than 10.
The pattern width and spacing values refer to values near the interface between the substrate and the resist layer.
In the process 1, the following steps are conducted in sequence.
(i-0-1) Positive Resist Composition Application Step
Using a coating apparatus, a chemically amplified positive resist composition containing an acid generator component (hereafter also referred to as an acid generator) that generates acid on exposure is applied to the surface of a substrate 1 (see
(i-0-2) PAB (Prebake) Step
The applied resist film is heat treated, thereby forming a first resist layer 2 (see
The heating conditions typically involve heating at 80 to 150° C. for a period of approximately 40 to 120 seconds (and preferably for 60 to 90 seconds).
The thickness of the first resist layer 2 is typically within a range from approximately 0.05 to 1.0 μm, and is preferably from 0.1 to 0.5 μm.
(i-0-3) Exposure Step
By selectively exposing the first resist layer 2, a latent image 2a′ of a dense pattern is formed on the first resist layer (see
In other words, the first resist layer 2 is selectively exposed using a dense pattern mask (reticle) 3.
In other words, as shown in
There are no particular restrictions on the wavelength used for the exposure, and an ArF excimer laser, KrF excimer laser, F2 excimer laser, or other radiation such as EUV (extreme ultraviolet), VUV (vacuum ultraviolet), EB (electron beam), X-ray or soft X-ray radiation can be used, although an ArF excimer laser is particularly ideal (this also applies in the exposure steps described below).
(i-0-4) PEB (Post Exposure Baking) Step
The selectively exposed first resist layer 2 is subjected to a heat treatment, thereby suitably dispersing the acid component generated from the acid generator within the first resist layer 2, and causing dissociation of the acid-dissociable, dissolution-inhibiting groups contained within the base component of the positive resist composition. Depending on the nature of the acid-dissociable, dissolution-inhibiting groups, dissociation of these acid-dissociable, dissolution-inhibiting groups may occur solely by exposure. Accordingly, the PEB step is not necessarily required.
The heating conditions typically involve heating at 80 to 150° C. for a period of 40 to 120 seconds (and preferably 60 to 90 seconds).
(ii-0-1) Negative Resist Composition Application Step
Using a coating apparatus, a chemically amplified negative resist composition containing an acid generator is applied to the surface of the first resist layer 2 (see
(ii-0-2) PAB (Prebake) Step
The applied resist film is heat treated, thereby forming a second resist layer 12 (see
The heating conditions typically involve heating at 80 to 150° C. for a period of approximately 40 to 120 seconds (and preferably for 60 to 90 seconds).
The thickness of the second resist layer 12 is typically within a range from approximately 0.05 to 1.0 μm, and is preferably from 0.1 to 0.5 μm.
(ii-0-3) Exposure Step
The second resist layer 12 is then exposed.
In other words, the second resist layer 12 is selectively exposed using a desired mask (reticle) 13, thereby forming a latent image 12a′ (see
In other words, as shown in
As shown in
(ii-0-4) PEB (Post Exposure Baking) Step
The selectively exposed second resist layer 12 is subjected to a heat treatment, thereby suitably dispersing the acid component generated from the acid generator within the second resist layer 12, and effecting the negative conversion (see
The heating conditions typically involve heating at 80 to 150° C. for a period of 40 to 120 seconds (and preferably 60 to 90 seconds).
(ii-0-5) First Resist Layer and Second Resist Layer Developing Step
The laminate of the first resist layer 2 and the second resist layer 12 is subjected to a developing treatment. The developing treatment uses, for example, an aqueous solution of TMAH (an aqueous solution of tetramethylammonium hydroxide) with a concentration of 0.1 to 10% by weight (and preferably 2.38% by weight).
Upon conducting this developing treatment, within the region 22 shown in
Furthermore, in the regions 21, because no light is irradiated onto the region during the selective exposure, the second resist layer 12 is developed and removed by the developing solution, and the underlying latent image 2a′ of the dense pattern formed in the first resist layer 2 is developed, thus forming the holes 2a.
Accordingly, an isolated hole pattern is formed in which the holes 2a and the holes 12a are interconnected.
In other words, in the region 22, the holes 2a are formed in a dense pattern that enables broad DOF characteristics to be ensured, meaning the holes can be formed precisely at the desired size. The isolated holes 12a are formed over a portion of the holes 2a of the dense pattern formed in the first resist layer 2.
In other words, in this method, a portion of the dense pattern with a broad DOF formed in the lower first resist layer 2 is exposed and patterned by the developing treatment, and can then be used as an isolated pattern.
If an isolated pattern is formed from the outset in the lower first resist layer 2, then broad DOF characteristics cannot be achieved, but by employing the steps described above, an isolated pattern with broad DOF characteristics can be obtained.
The DOF characteristics of the upper second resist layer 12 need not be as favorable as those for the pattern formed in the lower layer (the first resist layer 2). This is because within the isolated hole pattern containing the interconnected holes 2a and 12a, the holes 2a within the lower layer 2 represent the more important portions. The reason for this importance is that when etching of the substrate is conducted, it is the pattern within the lower layer 2 that is transferred (namely, the pattern transferred to the substrate is dependent on the pattern of the lower layer 2).
In this manner, a so-called isolated-dense mixed pattern can be obtained, in which a dense pattern region 21 and an isolated pattern region 22 with the same DOF characteristics can be formed on a single substrate.
A negative resist composition of the present invention uses a specific organic solvent.
The materials for the negative resist composition are the same as those used for the second example described below, and are consequently described following the description of the steps of the second example.
The second example is a method of forming a resist pattern that includes the following steps (i′-0) and (ii′-0): (i′-0) a step of forming a first resist layer on a substrate using a positive resist composition, conducting selective exposure, and then performing developing to form a dense pattern in the first resist layer, and (ii′-0) a step of forming a second resist layer on top of the dense pattern of the first resist layer using a negative resist composition, conducting selective exposure, and then performing developing, thereby filling in a portion of the dense pattern.
In the process 2, the following steps are conducted in sequence.
(i′-0-1) Positive Resist Composition Application Step
The same as (i-0-1) of the first example (see
(i′-0-2) PAB (Prebake) Step
The same as (i-0-2) of the first example (see
(i′-0-3) Exposure Step
The same as (i-0-3) of the first example (see
(i′-0-4) PEB (Post Exposure Baking) Step
The same as (i-0-4) of the first example (see
(i′-0-5) First Resist Layer Developing Step
The first resist layer 2 is then subjected to a developing treatment. The developing treatment uses, for example, an aqueous solution of TMAH (an aqueous solution of tetramethylammonium hydroxide) with a concentration of 0.1 to 10% by weight (and preferably 2.38% by weight).
Upon conducting this developing treatment, the exposed portions are removed, as shown in
In other words, as shown in
(ii′-0-1) Negative Resist Composition Application Step
Using a coating apparatus, a chemically amplified negative resist composition containing an acid generator is applied to the surface of the first resist layer 2 that has a dense pattern formed therein, as shown in
As a result, the negative resist composition fills the holes 2a, thereby burying the holes 2a, and a resist film is formed on top, so that the first resist layer 2 is covered with the resist film.
(ii′-0-2) PAB (Prebake) Step
The applied resist film is heat treated, thereby forming a second resist layer 12 (see
The heating conditions typically involve heating at 80 to 150° C. for a period of approximately 40 to 120 seconds (and preferably for 60 to 90 seconds).
The thickness of the second resist layer 12 (the distance from the surface of the first resist layer 2 to the surface of the second resist layer 12) is typically within a range from approximately 0.05 to 1.0 μm, and is preferably from 0.1 to 0.5 μm.
(ii′-0-3) Exposure Step
The second resist layer 12 is then selectively exposed using a desired mask (reticle) 13.
In other words, in this example, the same mask as that used in the first example is used to expose the same regions, and as shown in
(ii′-0-4) PEB (Post Exposure Baking) Step
The selectively exposed second resist layer 12 is then subjected to a heat treatment, thereby suitably dispersing the acid component generated from the acid generator within the second resist layer 12, and effecting the negative conversion (see
The heating conditions typically involve heating at 80 to 150° C. for a period of 40 to 120 seconds (and preferably 60 to 90 seconds).
(ii′-0-5) Second Resist Layer Developing Step
Upon conducting developing of the laminate of the first resist layer 2 and the second resist layer 12, within the region 22 shown in
As a result, within the region 22, an isolated hole pattern is formed in which the holes 12a and the holes 2a directly therebeneath are interconnected. Furthermore, in the regions 21, because no light is irradiated onto the regions during the selective exposure, the second resist layer 12 is developed and removed by the developing solution, and the negative resist composition that had filled the dense pattern of the underlying first resist layer is removed at the same time, thereby forming the holes 2a.
In other words, in this method, a dense pattern with a broad DOF formed in the first resist layer 2 is filled and covered with the second resist layer 12, and the second resist layer is then selectively exposed and developed to remove a portion of the second resist layer 12 and expose a portion of the underlying dense pattern, thereby enabling the dense pattern to be used as an isolated pattern. Within the dense pattern, those portions corresponding with the areas in which the second resist layer 12 is not removed remain buried beneath the second resist layer 12.
If an isolated pattern is formed from the outset in the lower first resist layer 2, then broad DOF characteristics cannot be achieved, but by employing the steps described above, an isolated pattern with a broad DOF can be obtained.
The DOF characteristics of the upper second resist layer 12 need not be as favorable as those for the pattern formed in the first resist layer (the lower layer) 2. This is because within the isolated hole pattern containing the interconnected holes 2a and 12a, the holes 2a within the lower layer 2 represent the more important portions. The reason for this importance is that when etching of the substrate is conducted, it is the pattern within the lower layer 2 that is transferred (namely, the pattern transferred to the substrate is dependent on the pattern of the lower layer).
In this manner, a so-called isolated-dense mixed pattern can be obtained, in which a dense pattern region 21 and an isolated pattern region 22 can be formed on a single substrate, as shown in
The process 2 offers the advantage that the occurrence of post-developing scum is less likely.
Furthermore, another advantage is that because the first resist layer is subjected to developing treatment prior to formation of the second resist layer, the second resist layer is unaffected by the acid generator within the first resist layer, enabling a more precise pattern to be formed.
In the process 2, in a similar manner to the process 1, isolated pattern holes 12a that utilize the holes 2a of a dense pattern can be obtained, and as a result, the problems caused by variation in the DOF characteristics can be resolved.
A characteristic feature of the negative resist composition of the present invention is the use of a specific organic solvent. The materials for the negative resist composition are the same as those used for the first example, and are described below.
The negative resist composition is preferably a negative resist composition containing an alkali-soluble resin component (A0), an acid generator component (B) that generates acid on exposure, and a cross-linking agent component (C).
Furthermore, the negative resist composition of the present invention is dissolved in an alcohol-based organic solvent that does not dissolve the first or second resist layer that contacts the resist layer formed from the negative resist composition.
In other words, the aforementioned “first or second resist layer that contacts the resist layer formed from the negative resist composition” (for the sake of brevity, hereafter also referred to as “the other resist layer”) refers to the second resist layer in those cases where the negative resist composition of the present invention is used to form the first resist layer, or refers to the first resist layer in those cases where the negative resist composition of the present invention is used to form the second resist layer.
Either a single resist layer may be formed from a negative resist composition of the present invention, or two resist layers may be formed using negative resist compositions of the present invention. In those cases where two resist layers are formed, the negative resist composition that forms the first resist layer employs a negative resist composition that uses an organic solvent that does not dissolve the second resist layer, and the negative resist composition that forms the second resist layer employs a negative resist composition that uses an organic solvent that does not dissolve the first resist layer.
In the present invention, an alcohol-based organic solvent that does not dissolve the other resist layer is used. As a result, mixing of the resist layers can be suppressed.
As this type of alcohol-based organic solvent, any alcohol solvent that lacks compatibility with the other resist layer can be used, but in terms of the coating properties obtained, and the dissolution of materials such as the resin component, a monohydric alcohol-based organic solvent is preferred.
The expression “does not dissolve the other resist layer” preferably means that at 23° C., when the other resist layer is formed with a film thickness 0.2 μm and this resist layer is then immersed in the organic solvent, no change is observed in the film thickness even after 60 minutes.
Of the various possible alcohols, although dependent on the number of carbon atoms, primary or secondary monohydric alcohol-based organic solvents are preferred, and primary monohydric alcohol-based organic solvents are the most desirable.
The boiling point is preferably within a range from 80 to 160° C., and even more preferably from 90 to 150° C., and from the viewpoints of the resulting coating properties, the stability of the composition upon storage, and the heating temperature required in the PAB step and/or PEB step, boiling points within a range from 100 to 135° C. are the most desirable.
In this description, the term “monohydric alcohol-based organic solvent” refers to compounds in which the number of hydroxyl groups incorporated within the alcohol molecule is 1, and does not include dihydric alcohol-based organic solvents, trihydric alcohol-based organic solvents, or derivatives thereof.
Specific examples of the alcohol-based solvent include n-amyl alcohol (boiling point: 138.0° C.), s-amyl alcohol (boiling point: 119.3° C.), t-amyl alcohol (boiling point: 101.8° C.), isoamyl alcohol (boiling point: 130.8° C.), isobutanol (also called isobutyl alcohol or 2-methyl-1-propanol) (boiling point: 107.9° C.), isopropyl alcohol (boiling point: 82.3° C.), 2-ethylbutanol (boiling point: 147° C.), neopentyl alcohol (boiling point: 114° C.), n-butanol (boiling point: 117.7° C.), s-butanol (boiling point: 99.5° C.), t-butanol (boiling point: 82.5° C.), 1-propanol (boiling point: 97.2° C.), n-hexanol (boiling point: 157.1° C.), 2-heptanol (boiling point: 160.4° C.), 3-heptanol (boiling point: 156.2° C.), 2-methyl-1-butanol (boiling point: 128.0° C.), 2-methyl-2-butanol (boiling point: 112.0° C.), and 4-methyl-2-pentanol (boiling point: 131.8° C.). Of these, isobutanol (2-methyl-1-propanol), 4-methyl-2-pentanol, and n-butanol are preferred. Of these, isobutanol and n-butanol are particularly desirable.
These alcohol-based organic solvents may be used either alone, or in mixtures of two or more different solvents.
The organic solvent may also include other organic solvents besides the alcohol-based solvent, provided the solvent does not dissolve the other resist layer, although the alcohol-based solvent preferably accounts for at least 80% by weight, and preferably 100% by weight of the solvent.
Examples of possible other organic solvents include either one, or two or more solvents selected from known materials used as the solvents for conventional chemically amplified resists.
Suitable examples include lactones such as γ-butyrolactone; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone or 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, or the monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, or ethyl ethoxypropionate.
There are no particular restrictions on the quantity used of the organic solvent, which is set in accordance with the desired film thickness so as to produce a concentration that enables favorable application to a substrate or the like, and is typically sufficient to produce a solid fraction concentration within the resist composition of 2 to 20% by weight, and preferably from 5 to 15% by weight.
There are no particular restrictions on the alkali-soluble resin component (A0), the acid generator component (B) that generates acid on exposure, the cross-linking agent component (C), and any other optional components that may be added, and the types of materials proposed for use within conventional negative resist compositions may be used.
Considering the effects relating to the negative resist composition making contact with the other resist layer, the negative resist composition preferably exhibits a high level of sensitivity.
Preferred compositions are described below.
In the following description of the negative resist composition, the meanings of the terms used are as listed below.
A “structural unit” refers to a monomer unit that contributes to the formation of a polymer (resin).
A “structural unit derived from acrylic acid” refers to a structural unit formed by cleavage of the ethylenic double bond of acrylic acid.
A “structural unit derived from an acrylate ester” refers to a structural unit formed by cleavage of the ethylenic double bond of an acrylate ester.
The term “structural unit derived from an acrylate ester” is a general concept that is deemed to also include those units in which the hydrogen atom at the α-position is substituted with another substituent group such as an alkyl group. In a “structural unit derived from acrylic acid” or a “structural unit derived from an acrylate ester”, unless stated otherwise, the term “α-position” or “α-position carbon atom” refers to the carbon atom to which the carboxyl group is bonded.
Furthermore, the term “structural unit derived from acrylic acid” is a general concept that is deemed to include structural units in which the hydrogen atom bonded to the α-position carbon atom is substituted with another substituent group such as an alkyl group, as well as structural units derived from an acrylate ester in which a hydrogen atom is bonded to the α-position carbon atom.
Furthermore, unless stated otherwise, an “alkyl group” refers to a straight-chain, cyclic, or branched-chain alkyl group.
The component (A0) is preferably a resin component (A) containing a structural unit (a1) that includes an alicyclic group having a fluorinated hydroxyalkyl group, and a structural unit (a2), which is a structural unit derived from an acrylate ester and includes a hydroxyl group-containing alicyclic group.
Structural Unit (a1) that includes an alicyclic group having a fluorinated hydroxyalkyl group
By including the structural unit (a1), swelling of the negative resist composition, which is a potential problem, can be suppressed.
Alicyclic group having a fluorinated hydroxyalkyl group
In the structural unit (a1), the alicyclic group includes a fluorinated hydroxyalkyl group.
A fluorinated hydroxyalkyl group refers to an alkyl group containing a hydroxyl group in which either a portion of, or all of, the hydrogen atoms of the alkyl group have been substituted with fluorine atoms. In this group, the fluorination increases the ease with which the hydrogen atom of the hydroxyl group is released.
In the fluorinated hydroxyalkyl group, the alkyl group is either a straight-chain or branched-chain group, and although there are no particular restrictions on the number of carbon atoms, a typical number of carbon atoms is from 1 to 20, and preferably from 4 to 16. There are no particular restrictions on the number of hydroxyl groups, although a single hydroxyl group is typical.
Of the various possibilities, alkyl groups in which a fluorinated alkyl group and/or a fluorine atom is bonded to the α-position carbon atom to which the hydroxyl group is bonded (which refers to the α-position carbon atom of the hydroxyalkyl group) are preferred. Furthermore, the fluorinated alkyl group bonded to the α-position is preferably a group in which all of the hydrogen atoms of the alkyl group have been substituted with fluorine atoms.
The alicyclic group may be either a monocyclic or polycyclic group, although a polycyclic group is preferred. Furthermore, an alicyclic hydrocarbon group is preferred. Furthermore, the group is preferably saturated. Moreover, the number of carbon atoms within the alicyclic group is preferably within a range from 5 to 15.
Specific examples of the alicyclic group include the groups described below.
Namely, examples of suitable monocyclic groups include groups in which one or two hydrogen atom has been removed from a cycloalkane. Examples of suitable polycyclic groups include groups in which one or two hydrogen atoms have been removed from a bicycloalkane, tricycloalkane or tetracycloalkane or the like.
Specific examples of monocyclic groups include groups in which one or two hydrogen atoms have been removed from cyclopentane or cyclohexane, and groups in which two hydrogen atoms have been removed from cyclohexane are particularly preferred.
Examples of suitable polycyclic groups include groups in which one or two hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.
These types of polycyclic groups can be selected appropriately from the multitude of groups proposed for forming acid-dissociable, dissolution-inhibiting groups for use within resins for positive photoresist compositions used within ArF excimer laser processes.
Of the various possibilities, groups in which two hydrogen atoms have been removed from cyclohexane, adamantane, norbornane or tetracyclododecane are readily available industrially, and are consequently preferred.
Of the monocyclic and polycyclic groups exemplified above, groups in which two hydrogen atoms have been removed from norbornane are particularly preferred.
The structural unit (a1) is preferably a structural unit derived from acrylic acid, and structures in which the above alicyclic group is bonded to the ester group [—C(O)O—] of the acrylate ester (namely, structures in which the hydrogen atom of the carboxyl group is substituted with the aforementioned alicyclic group) are preferred. Specifically, as the structural unit (a1), units represented by a general formula (1) shown below are particularly preferred.
(wherein, R represents a hydrogen atom, an alkyl group, a fluorinated alkyl group, or a fluorine atom, and m, n and p each represent, independently, an integer from 1 to 5.)
R represents a hydrogen atom, an alkyl group, a fluorinated alkyl group, or a fluorine atom.
As the alkyl group, lower alkyl groups of no more than 5 carbon atoms are preferred, and specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, or neopentyl group, although a methyl group is preferred.
The fluorinated alkyl group is preferably a lower alkyl group of no more than 5 carbon atoms in which one or more of the hydrogen atoms have been substituted with fluorine atoms. Specific examples of suitable alkyl groups include the same groups as those listed above.
The hydrogen atoms substituted with fluorine atoms may represent either a portion of, or all of, the hydrogen atoms of the alkyl group.
A hydrogen atom or an alkyl group is preferred as the R group, a hydrogen atom or a methyl group is even more preferred, and a hydrogen atom is the most desirable.
Furthermore, n, m and p preferably each represent 1.
Of the structural units represented by the general formula (1), a structural unit derived from α,α′-bis-(trifluoromethyl)-bicyclo[2.2.1]hept-5-ene-2-ethanol acrylate (which corresponds with the unit 1 in the formula 23 shown below) is preferred in terms of the effects achieved, the ease of synthesis, and the superior etching resistance obtained.
The structural unit (a1) may be either a single type of structural unit or a mixture of two or more different structural units.
In the component (A), by including the structural unit (a2), the swelling suppression effect is further enhanced. Furthermore, the etching resistance is also improved.
When the component (A) is blended into the negative resist composition, the hydroxyl group (alcoholic hydroxyl group) of the structural unit (a2) undergoes a reaction with the cross-linking agent (C) under the action of the acid generated from the acid generator (B), and this reaction causes the component (A) to change from a state of being soluble in the alkali developing solution to a state of being insoluble, thereby effecting the negative conversion.
In the structural unit (a2), the hydroxyl group-containing alicyclic group is preferably bonded to the ester group (—C(O)O—) of the acrylate ester.
Moreover, in the structural unit (a2), another substituent group may be bonded to the α-position (the α-position carbon atom) instead of a hydrogen atom. Examples of preferred substituent groups include an alkyl group, fluorinated alkyl group, or fluorine atom.
These groups are as described above in relation to the group R within the general formula (1) of the aforementioned structural unit (a1), and of the various groups that can be bonded to the α-position, a hydrogen atom or an alkyl group is preferred, a hydrogen atom or a methyl group is even more preferred, and a hydrogen atom is the most desirable.
Furthermore, the term “hydroxyl group-containing alicyclic group” refers to a group in which a hydroxyl group is bonded to an alicyclic group.
The number of hydroxyl groups is preferably within a range from 1 to 3, and is most preferably 1.
Furthermore, alkyl groups of 1 to 4 carbon atoms may also be bonded to the alicyclic group.
The alicyclic group may be either a monocyclic or polycyclic group, although a polycyclic group is preferred. Furthermore, an alicyclic hydrocarbon group is preferred. Furthermore, the group is preferably saturated. Moreover, the number of carbon atoms within the alicyclic group is preferably within a range from 5 to 15.
Specific examples of the alicyclic group include the groups described below.
Namely, examples of suitable monocyclic groups include groups in which one hydrogen atom has been removed from a cycloalkane. Examples of suitable polycyclic groups include groups in which one hydrogen atom has been removed from a bicycloalkane, tricycloalkane or tetracycloalkane or the like.
Specific examples of monocyclic groups include groups in which one hydrogen atom has been removed from cyclopentane or cyclohexane, and a cyclohexyl group is particularly preferred.
Examples of suitable polycyclic groups include groups in which one hydrogen atom has been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.
These types of polycyclic groups can be selected appropriately from the multitude of groups proposed for forming acid-dissociable, dissolution-inhibiting groups for use within resins for positive photoresist compositions used within ArF excimer laser processes.
Of the various possibilities, a cyclohexyl group, an adamantyl group, a norbornyl group, and a tetracyclododecanyl group are readily available industrially, and are consequently preferred.
Of the monocyclic and polycyclic groups exemplified above, a cyclohexyl group or adamantyl group is preferred, and an adamantyl group is particularly preferred.
Specific examples of preferred structural units (a2) include structural units represented by a general formula (2) shown below.
(wherein, R represents a hydrogen atom, an alkyl group, a fluorinated alkyl group, or a fluorine atom, and q represents an integer from 1 to 3.)
R represents a hydrogen atom, an alkyl group, a fluorinated alkyl group or a fluorine atom that is bonded to the α-position, and is as described above in relation to the general formula (1). In the general formula (2), R is most preferably a hydrogen atom.
Furthermore, q represents an integer from 1 to 3, and is preferably 1.
Furthermore, although there are no particular restrictions on the bonding position of the hydroxyl group, units in which the hydroxyl group is bonded to position 3 of the adamantyl group are preferred.
The structural unit (a2) may be either a single type of structural unit or a mixture of two or more different structural units.
Structural Unit (a3), which is derived from acrylic acid, contains no cyclic structures, and includes an alcoholic hydroxyl group as a side chain
In addition to the structural unit (a1) and the structural unit (a2), the component (A) preferably also includes a structural unit (a3).
Including the structural unit (a3) enables an improvement in resolution to be achieved. Furthermore, thickness loss can also be suppressed. Furthermore, the controllability of the cross-linking reaction during pattern formation is favorable. Moreover, the film density also tends to increase. As a result, the heat resistance tends to improve. The etching resistance also improves.
The expression “contains no cyclic structures” means the structural unit contains no alicyclic groups or aromatic groups.
The structural unit (a3) is readily distinguishable from the structural unit (a2) as a result of containing no cyclic structures. When a component (A) that includes the structural unit (a3) is blended into the negative resist composition, the hydroxyl group of the hydroxyalkyl group of the structural unit (a3), together with the aforementioned hydroxyl group of the structural unit (a2), undergoes reaction with the cross-linking agent (C) under the action of the acid generated from the acid generator (B), and this reaction causes the component (A) to change from a state of being soluble in the alkali developing solution to a state of being insoluble, thereby effecting the negative conversion.
The description “includes an alcoholic hydroxyl group as a side chain” refers to a structural unit which includes, for example, a bonded hydroxyalkyl group.
The hydroxyalkyl group may be bonded to the α-position carbon atom of the main chain (the portion formed by cleavage of the ethylenic double bond of acrylic acid), or may form an ester group through substitution of the hydrogen atom of the acrylic acid carboxyl group, and in the structural unit (a3), the hydroxyalkyl group preferably exists at either one, or both, of these locations.
In those cases where the hydroxyalkyl group is not bonded to the α-position, the hydrogen atom at the α-position carbon atom may be replaced with an alkyl group, a fluorinated alkyl group, or a fluorine atom. These groups are as described above in relation to the group R within the general formula (1).
Furthermore, the structural unit (a3) is preferably a unit represented by a general formula (3) shown below.
(wherein, R1 represents a hydrogen atom, an alkyl group, a fluorinated alkyl group, a fluorine atom or a hydroxyalkyl group, and R2 represents a hydrogen atom, an alkyl group, or a hydroxyalkyl group, provided that at least one of R1 and R2 represents a hydroxyalkyl group.)
For the group R1, a hydroxyalkyl group is preferably a lower hydroxyalkyl group of no more than 10 carbon atoms, even more preferably a lower hydroxyalkyl group of 2 to 8 carbon atoms, and is most preferably a hydroxymethyl group or hydroxyethyl group. There are no particular restrictions on the number of hydroxyl groups or the bonding positions of those groups, although one hydroxyl group is typical, and the hydroxyl group is preferably bonded to the terminal of the alkyl group.
For the group R1, an alkyl group is preferably a lower alkyl group of no more than 10 carbon atoms, even more preferably a lower alkyl group of 2 to 8 carbon atoms, and is most preferably an ethyl group or methyl group.
For the group R1, a fluorinated alkyl group is preferably a lower alkyl group of no more than 5 carbon atoms (most preferably an ethyl group or methyl group) in which a portion of, or all of, the hydrogen atoms have been substituted with fluorine atoms.
For the group R2, suitable alkyl groups and hydroxyalkyl groups are the same as those described for R1.
Specific examples of suitable units include structural units derived from (α-hydroxyalkyl)acrylic acids, structural units derived from alkyl (α-hydroxyalkyl)acrylate esters, and structural units derived from hydroxyalkyl (α-alkyl)acrylate esters.
Of these, from the viewpoints of improving the effects and increasing the film density, the structural unit (a3) is preferably a structural unit derived from an alkyl (α-hydroxyalkyl)acrylate ester.
Of these, structural units derived from either ethyl (α-hydroxymethyl)acrylate or methyl (α-hydroxymethyl)acrylate are particularly desirable.
Furthermore, the structural unit (a3) preferably includes a structural unit derived from a hydroxyalkyl (α-alkyl)acrylate ester. Of these, a structural unit derived from hydroxyethyl α-methyl-acrylate or hydroxymethyl α-methyl-acrylate is preferred.
The structural unit (a3) may be either a single type of structural unit or a mixture of two or more different structural units.
In addition to the structural unit (a1) and the structural unit (a2), the component (A) preferably also includes a structural unit (a4) derived from an acrylate ester that includes a lactone-containing monocyclic or polycyclic group.
Furthermore, a combination of the structural unit (a1), the structural unit (a2), the structural unit (a4), and the structural unit (a3) may also be used.
When used in forming a resist film, the lactone-containing monocyclic or polycyclic group of the structural unit (a4) is effective in improving the adhesion of the resist film to the substrate, and enhancing the hydrophilicity of the component (A) relative to the developing solution. Furthermore, the structural unit (a4) also improves the swelling suppression effect.
In this description, the term “lactone” refers to a single ring containing a —O—C(O)— structure, and this lactone ring is counted as the first ring. Accordingly, groups that contain only the lactone ring are referred to as monocyclic groups, whereas groups that also contain other ring structures are described as polycyclic groups regardless of the structure of the other rings.
As the structural unit (a4), any group can be used without any particular restrictions, provided it includes a lactone ring that contains both the above type of ester structure (—O—C(O)—) and a cyclic structure.
Specifically, examples of lactone-containing monocyclic groups include groups in which one hydrogen atom has been removed from γ-butyrolactone. Examples of lactone-containing polycyclic groups include groups in which one hydrogen atom has been removed from a lactone ring-containing bicycloalkane, tricycloalkane, or tetracycloalkane.
Groups obtained by removing one hydrogen atom from a lactone-containing tricycloalkane with a structural formula such as that shown below are particularly preferred in terms of industrial availability.
Furthermore, in the structural unit (a4), a lactone-containing polycyclic group is preferred, and structural units containing a norbornane lactone are particularly preferred.
In the structural unit (a4), another substituent group may be bonded to the α-position (the α-position carbon atom) instead of a hydrogen atom. Examples of preferred substituent groups include an alkyl group, fluorinated alkyl group, or fluorine atom.
These groups are as described above in relation to the group R within the general formula (1) of the aforementioned structural unit (a1), and of the various groups that can be bonded to the α-position, a hydrogen atom or an alkyl group is preferred, a hydrogen atom or a methyl group is even more preferred, and a hydrogen atom is the most desirable.
More specific examples of the structural unit (a4) include the structural units represented by general formulas (a4-1) to (a4-5) shown below.
(wherein, R is as defined above, each R1 represents, independently, a hydrogen atom, an alkyl group, or an alkoxy group of 1 to 5 carbon atoms, and m represents an integer of either 0 or 1.)
Examples of the alkyl group of R1 within the general formulas (a4-1) to (a4-5) include the same alkyl groups as those described in relation to the group R in the structural unit (a1). In the general formulas (a4-1) to (a4-5), from the viewpoint of factors such as industrial availability, R′ is most preferably a hydrogen atom.
Moreover, as the structural unit (a4), units represented by the general formulas (a4-2) and (a4-3) are particularly preferred.
The structural unit (a4) may be either a single type of structural unit or a mixture of two or more different structural units.
Combination of Structural Unit (a1) through Structural Unit (a4)
In the component (A), the structural unit (a1) through structural unit (a4) are preferably selected within one of the four combinations described below.
(i) Structural Units Selected so as to Include a Combination of the Structural Unit (a1) and the Structural Unit (a2)
In this case, the structural unit (a1) is preferably a structural unit represented by the general formula (1), and the group R within the general formula (1) is preferably a hydrogen atom. In addition, a hydrogen atom is preferably bonded to the α-position (the carbon atom to which the carboxyl group is bonded) of the structural unit (a2).
The reason for these preferences is that the above configuration yields an improved solubility contrast.
(ii) Structural Units Selected so as to Include a Combination of the Structural Unit (a1), the Structural Unit (a2), and the Structural Unit (a3)
In this case, the structural unit (a1) is preferably a structural unit represented by the general formula (1), and the group R within the general formula (1) is preferably a hydrogen atom. In addition, a hydrogen atom is preferably bonded to the α-position of the structural unit (a2). The reason for these preferences is that this configuration yields an improved solubility contrast.
(iii) Structural Units Selected so as to Include a Combination of the Structural Unit (a1), the Structural Unit (a2), and the Structural Unit (a4)
In this case, the structural unit (a1) is preferably a structural unit represented by the general formula (1), and the group R within the general formula (1) is preferably a hydrogen atom. In addition, a hydrogen atom is preferably bonded to the α-position of the structural unit (a2), and a hydrogen atom is preferably bonded to the α-position of the structural unit (a4).
The reason for these preferences is that this configuration yields an improved solubility contrast.
(iv) Structural Units Selected so as to Include a Combination of the Structural Unit (a1), the Structural Unit (a2), the Structural Unit (a3), and the Structural Unit (a4)
In this case, the structural unit (a1) is preferably a structural unit represented by the general formula (1), and the group R within the general formula (1) is preferably a hydrogen atom. In addition, a hydrogen atom is preferably bonded to the α-position of the structural unit (a2), and a hydrogen atom is preferably bonded to the α-position of the structural unit (a4).
The reason for these preferences is that this configuration yields an improved solubility contrast.
Proportions of Structural Units (a1) to (a4)
In the component (A), when combining the structural units (a1) through (a4), one of the four combinations (i), (ii), (iii) or (iv) described above is preferably selected. For each of these combinations, the preferred proportions for each of the structural units are as described below.
(i) Combination of the Structural Unit (a1) and the Structural Unit (a2)
In the case of a resin that contains at least the structural unit (a1) and the structural unit (a2) as essential units, and which is preferably formed solely from these two structural units, the proportions of each of the structural units within the resin preferably satisfy the numerical ranges described below.
Namely, the proportion of the structural unit (a1) is preferably within a range from 20 to 80 mol %, even more preferably from 30 to 70 mol %, and is most preferably from 35 to 55 mol %.
The proportion of the structural unit (a2) is preferably within a range from 20 to 80 mol %, even more preferably from 30 to 70 mol %, and is most preferably from 45 to 65 mol %.
Proportions that satisfy the above ranges yield an improvement in the swelling suppression effect.
(ii) Combination of the Structural Unit (a1), the Structural Unit (a2), and the Structural Unit (a3)
In the case of a resin that contains the structural unit (a1), the structural unit (a2) and the structural unit (a3), and which is preferably formed solely from these structural units, the proportions of each of the structural units within the resin preferably satisfy the numerical ranges described below.
Namely, the proportion of the structural unit (a1) is preferably within a range from 20 to 80 mol %, even more preferably from 30 to 70 mol %, and is most preferably from 35 to 55 mol %.
The proportion of the structural unit (a2) is preferably within a range from 10 to 70 mol %, even more preferably from 10 to 50 mol %, and is most preferably from 20 to 40 mol %.
The proportion of the structural unit (a3) is preferably within a range from 10 to 70 mol %, even more preferably from 10 to 40 mol %, and is most preferably from 15 to 35 mol %.
Proportions that satisfy the above ranges yield an improvement in the swelling suppression effect. Furthermore, by ensuring a favorable balance between the structural unit (a2) and the structural unit (a3), a suitable level of contrast is obtained, enabling an improvement in the resolution. Furthermore, the etching resistance also improves. Moreover, a favorable exposure margin is also obtained.
(iii) Combination of the Structural Unit (a1), the Structural Unit (a2), and the Structural Unit (a4)
In the case of a resin that contains the structural units (a1), (a2) and (a4), and which is preferably formed solely from these structural units, the proportions of each of the structural units within the resin preferably satisfy the numerical ranges described below.
Namely, the proportion of the structural unit (a1) is preferably within a range from 20 to 85 mol %, even more preferably from 30 to 70 mol %, and is most preferably from 35 to 50 mol %.
The proportion of the structural unit (a2) is preferably within a range from 14 to 70 mol %, even more preferably from 15 to 50 mol %, and is most preferably from 30 to 50 mol %.
The proportion of the structural unit (a4) is preferably within a range from 1 to 70 mol %, even more preferably from 3 to 50 mol %, and is most preferably from 5 to 20 mol %.
Proportions that satisfy the above ranges yield an improvement in the swelling suppression effect. Furthermore, the resist pattern shape is also more favorable.
By ensuring a favorable balance between the structural units (a1), (a2) and (a4), a suitable level of contrast is obtained, enabling an improvement in the resolution. Furthermore, the etching resistance also improves. Moreover, a favorable exposure margin is also obtained.
(iv) Combination of the Structural Unit (a1), the Structural Unit (a2), the Structural Unit (a3), and the Structural Unit (a4)
In the case of a resin that contains all of the structural units (a1) through (a4), and which is preferably formed solely from these structural units, the proportions of each of the structural units within the resin preferably satisfy the numerical ranges described below.
Namely, the proportion of the structural unit (a1) is preferably within a range from 10 to 85 mol %, even more preferably from 20 to 70 mol %, and is most preferably from 25 to 50 mol %.
The proportion of the structural unit (a2) is preferably within a range from 10 to 80 mol %, even more preferably from 20 to 70 mol %, and is most preferably from 30 to 50 mol %.
The proportion of the structural unit (a3) is preferably within a range from 4 to 70 mol %, even more preferably from 7 to 50 mol %, and is most preferably from 10 to 30 mol %.
The proportion of the structural unit (a4) is preferably within a range from 1 to 70 mol %, even more preferably from 3 to 50 mol %, and is most preferably from 5 to 20 mol %.
Proportions that satisfy the above ranges yield an improvement in the swelling suppression effect. Furthermore, the resist pattern shape is also more favorable.
By ensuring a favorable balance between the structural units (a1) through (a4), a suitable level of contrast is obtained, enabling an improvement in the resolution. Furthermore, the etching resistance also improves. Moreover, a favorable exposure margin is also obtained.
In addition to the structural units selected from amongst the units (a1) through (a4), the component (A) may also include other copolymerizable structural units, but resins in which the primary components are selected from amongst the structural units (a1) through (a4) are preferred.
Here, the term “primary components” means that the combined total of these selected structural units preferably accounts for at least 70 mol %, even more preferably 80 mol % or greater, and most preferably 100 mol %, of the resin.
Particularly preferred configurations for the component (A) include resins formed from the structural unit (a1) and the structural unit (a2), resins formed from the structural unit (a1), the structural unit (a2) and the structural unit (a3), resins formed from the structural unit (a1), the structural unit (a2) and the structural unit (a4), and resins formed from the structural units (a1) through (a4), and the most preferred configurations are resins formed from the structural unit (a1), the structural unit (a2) and the structural unit (a3).
Weight Average Molecular Weight
The weight average molecular weight (Mw: the polystyrene equivalent weight average molecular weight determined using gel permeation chromatography) of the component (A) is preferably within a range from 2,000 to 30,000, even more preferably from 2,000 to 10,000, and is most preferably from 3,000 to 8,000. Ensuring a molecular weight within this range is preferred in terms of suppressing swelling, and suppressing the occurrence of the resulting microbridges. Furthermore, a molecular weight within the above range is also preferred in terms of achieving a high level of resolution. Lower molecular weights tend to result in more favorable properties.
The component (A) can be obtained, for example, by a conventional radical polymerization of the monomers that yield each of the structural units.
The component (A) may use either a single resin, or a combination of two or more different resins.
Furthermore, preferred weight average molecular weight values for the component (A0) are the same as those described for the component (A).
The component (A0) may use either a single resin, or a combination of two or more different resins. Furthermore, the component (A0) can use a resin besides the component (A).
The quantity of the component (A0) is preferably adjusted in accordance with the film thickness of the resist that is to be formed.
Acid Generator Component (B) that Generates Acid on Exposure
There are no particular restrictions on the component (B), and any of the known acid generators used within conventional chemically amplified resist compositions can be used.
Examples of these acid generators are numerous, and include onium salt-based acid generators such as iodonium salts and sulfonium salts, oxime sulfonate-based acid generators, diazomethane-based acid generators such as bisalkyl or bisaryl sulfonyl diazomethanes and poly(bis-sulfonyl)diazomethanes, iminosulfonate-based acid generators, and disulfone-based acid generators.
Specific examples of suitable onium salt-based acid generators include diphenyliodonium trifluoromethanesulfonate or nonafluorobutanesulfonate; bis(4-tert-butylphenyl)iodonium trifluoromethanesulfonate or nonafluorobutanesulfonate; triphenylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; tri(4-methylphenyl)sulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; dimethyl(4-hydroxynaphthyl)sulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; monophenyldimethylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; diphenylmonomethylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; (4-methylphenyl)diphenylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; (4-methoxyphenyl)diphenylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate; and tri(4-tert-butyl)phenylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate.
Specific examples of suitable oxime sulfonate-based acid generators include α-(methylsulfonyloxyimino)-phenyl acetonitrile, α-(methylsulfonyloxyimino)-p-methoxyphenyl acetonitrile, α-(trifluoromethylsulfonyloxyimino)-phenyl acetonitrile, α-(trifluoromethylsulfonyloxyimino)-p-methoxyphenyl acetonitrile, α-(ethylsulfonyloxyimino)-p-methoxyphenyl acetonitrile, α-(propylsulfonyloxyimino)-p-methylphenyl acetonitrile, and α-(methylsulfonyloxyimino)-p-bromophenyl acetonitrile. Of these, α-(methylsulfonyloxyimino)-p-methoxyphenyl acetonitrile is preferred.
Of the aforementioned diazomethane-based acid generators, specific examples of suitable bisalkyl or bisaryl sulfonyl diazomethanes include bis(isopropylsulfonyl)diazomethane, bis(p-toluenesulfonyl)diazomethane, bis(1,1-dimethylethylsulfonyl)diazomethane, bis(cyclohexylsulfonyl)diazomethane, and bis(2,4-dimethylphenylsulfonyl)diazomethane.
Furthermore, specific examples of poly(bis-sulfonyl)diazomethanes include the structures shown below, such as 1,3-bisphenylsulfonyldiazomethylsulfonyl)propane (compound A), 1,4-bisphenylsulfonyldiazomethylsulfonyl)butane (compound B), 1,6-bis(phenylsulfonyldiazomethylsulfonyl)hexane (compound C), 1,10-bis(phenylsulfonyldiazomethylsulfonyl)decane (compound D), 1,2-bis(cyclohexylsulfonyldiazomethylsulfonyl)ethane (compound E), 1,3-bis(cyclohexylsulfonyldiazomethylsulfonyl)propane (compound F), 1,6-bis(cyclohexylsulfonyldiazomethylsulfonyl)hexane (compound G), and 1,10-bis(cyclohexylsulfonyldiazomethylsulfonyl)decane (compound H).
Furthermore, as the component (B), the use of at least one sulfonium compound selected from the group consisting of structural units represented by general formulas (b-1) and (b-2) shown below is also preferred.
[In these formulas, X represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; Y and Z each represent, independently, an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; and R11 to R13 each represent, independently, an aryl group or an alkyl group, although at least one of the groups R11 to R13 is an aryl group.]
In the formulas (b-1) and (b-2), the group X is a straight-chain or branched alkylene group in which at least one hydrogen atom has been substituted with a fluorine atom, and the number of carbon atoms within the alkylene group is typically within a range from 2 to 6, preferably from 3 to 5, and is most preferably 3.
Y and Z each represent, independently, a straight-chain or branched alkyl group in which at least one hydrogen atom has been substituted with a fluorine atom, and the number of carbon atoms within the alkyl group is typically within a range from 1 to 10, preferably from 1 to 7, and is most preferably from 1 to 3.
Lower numbers of carbon atoms within the alkylene group X or the alkyl groups Y and Z result in better solubility within the resist solvent, and are consequently preferred.
Furthermore, in the alkylene group X or the alkyl groups Y and Z, the larger the number of hydrogen atoms that have been substituted with fluorine atoms, the stronger the acid becomes, and the transparency relative to high energy light beams of 200 nm or less or electron beams also improves favorably. The fluorine atom proportion within the alkylene group or alkyl groups, namely the fluorination ratio, is preferably within a range from 70 to 100%, and even more preferably from 90 to 100%, and perfluoroalkylene or perfluoroalkyl groups in which all of the hydrogen atoms have been substituted with fluorine atoms are the most desirable.
R11 to R13 each represent, independently, an aryl group or an alkyl group.
Of the groups R11 to R13, at least one group represents an aryl group. Compounds in which at least two of R11 to R13 represent aryl groups are preferred, and compounds in which all of R11 to R13 are aryl groups are the most preferred.
There are no particular restrictions on the aryl groups of R11 to R13, and suitable examples include aryl groups of 6 to 20 carbon atoms, such as phenyl groups and naphthyl groups, which may, or may not, be substituted with alkyl groups, alkoxy groups, or halogen atoms or the like. In terms of enabling low cost synthesis, aryl groups of 6 to 10 carbon atoms are preferred.
There are no particular restrictions on the alkyl groups of R11 to R13, and suitable examples include straight-chain, branched, or cyclic alkyl groups of 1 to 10 carbon atoms. From the viewpoint of achieving excellent resolution, alkyl groups of 1 to 5 carbon atoms are preferred. Specific examples include a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, n-pentyl group, cyclopentyl group, hexyl group, cyclohexyl group, nonyl group, and decanyl group, although in terms of achieving superior resolution and enabling low cost synthesis, a methyl group is the most desirable.
Of the above possibilities, compounds in which R11 to R13 are all phenyl groups are the most preferred.
These sulfonium compounds may be used either alone, or in combinations of two or more different compounds.
Of the above, from the viewpoint of the reactivity between the component (A0) and the component (C), the component (B) is preferably an onium salt having a fluorinated alkylsulfonate ion as the anion.
Similarly, in the positive resist composition described below, the use of an onium salt having a fluorinated alkylsulfonate ion as the anion is preferred.
As the component (B), either a single acid generator may be used alone, or a combination of two or more different acid generators may be used.
The quantity of the component (B), is typically within a range from 0.5 to 30 parts by weight and preferably from 1 to 10 parts by weight, per 100 parts by weight of the component (A0). Ensuring the quantity satisfies this range enables satisfactory pattern formation to be conducted. Furthermore, a uniform solution is obtained, and the storage stability is also favorable, both of which are desirable.
There are no particular restrictions on the component (C), which may be selected appropriately from the various cross-linking agents used in conventional chemically amplified negative resist compositions.
Specific examples include aliphatic cyclic hydrocarbons containing a hydroxyl group and/or a hydroxyalkyl group, or oxygen-containing derivatives thereof, such as 2,3-dihydroxy-5-hydroxymethylnorbornane, 2-hydroxy-5,6-bis(hydroxymethyl)norbornane, cyclohexane dimethanol, 3,4,8(or 9)-trihydroxytricyclodecane, 2-methyl-2-adamantanol, 1,4-dioxane-2,3-diol, and 1,3,5-trihydroxycyclohexane.
Furthermore, other suitable examples include compounds produced by reacting an amino group-containing compound such as melamine, acetoguanamine, benzoguanamine, urea, ethylene urea, or glycoluril with either formaldehyde or a combination of formaldehyde and a lower alcohol, thereby substituting the hydrogen atoms of the amino group with hydroxymethyl groups or lower alkoxymethyl groups.
Of these, compounds that use melamine are referred to as melamine-based cross-linking agents, compounds that use urea are referred to as urea-based cross-linking agents, compounds that use ethylene urea are referred to as ethylene urea-based cross-linking agents, compounds that use propylene urea are referred to as propylene urea-based cross-linking agents, and compounds that use glycoluril are referred to as glycoluril-based cross-linking agents.
Specific examples include hexamethoxymethylmelamine, bismethoxymethylurea, bismethoxymethylbismethoxyethylene urea, tetramethoxymethylglycoluril, and tetrabutoxymethylglycoluril.
The component (C) is preferably at least one compound selected from amongst melamine-based cross-linking agents, urea-based cross-linking agents, ethylene urea-based cross-linking agents, propylene urea-based cross-linking agents, and glycoluril-based cross-linking agents. Glycoluril-based cross-linking agents are particularly desirable.
As the glycoluril-based cross-linking agent, glycoluril compounds in which the N-position is substituted with hydroxyalkyl groups and/or lower alkoxyalkyl groups that function as cross-link-forming groups are preferred.
Specific examples of glycoluril-based cross-linking agents include mono-, di-, tri-, or tetra-hydroxymethylated glycoluril, mono-, di-, tri-, and/or tetra-methoxymethylated glycoluril, mono-, di-, tri-, and/or tetra-ethoxymethylated glycoluril, mono-, di-, tri-, and/or tetra-propoxymethylated glycoluril, and mono-, di-, tri-, and/or tetra-butoxymethylated glycoluril.
The expression “mono-, di-, tri-, and/or tetra-” means the compound may include one, or two or more of the mono-substituted form, di-substituted form, tri-substituted form or tetra-substituted form, and the tri- and tetra-substituted forms are preferred.
Furthermore, mono-, di-, tri-, and/or tetra-methoxymethylated glycoluril, and mono-, di-, tri-, and/or tetra-butoxymethylated glycoluril are also particularly preferred.
From the viewpoints of achieving superior contrast and resolution, mono-, di-, tri-, and/or tetra-methoxymethylated glycoluril is the most preferred. This cross-linking agent is available commercially under the product name “Mx270” (manufactured by Sanwa Chemical Co., Ltd.). This product contains almost entirely tri- and tetra-substituted compounds, and is a mixture of monomers, dimers and trimers.
The blend quantity of the component (C) is typically within a range from 3 to 15 parts by weight, and preferably from 5 to 10 parts by weight, per 100 parts by weight of the component (A0). By ensuring this quantity is at least as large as the lower limit of the above range, the component (A0) can be readily converted to an alkali-insoluble state. Ensuring the quantity is no larger than the upper limit enables any deterioration in the resolution to be prevented. Lower quantities of the cross-linking agent tend to yield improved resolution.
In the negative resist composition, in order to improve the resist pattern shape and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer, a nitrogen-containing organic compound (N) (hereafter referred to as the component (N)) may also be added as an optional component.
A multitude of these components (N) have already been proposed, and any of these known compounds can be used, although an aliphatic amine, and particularly a secondary aliphatic amine or tertiary aliphatic amine is preferred.
Examples of these aliphatic amines include amines in which at least one hydrogen atom of ammonia NH3 has been substituted with an alkyl group or hydroxyalkyl group of no more than 12 carbon atoms (that is, alkylamines or alkyl alcohol amines). Specific examples of these aliphatic amines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-hexylamine, tri-n-pentylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decanylamine, and tri-n-dodecylamine; and alkyl alcohol amines such as diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, and tri-n-octanolamine. These compounds may be used either alone, or in combinations of two or more different compounds.
The component (N) is typically used in a quantity within a range from 0.01 to 5.0 parts by weight per 100 parts by weight of the component (A0). Of the above amines, alkyl alcohol amines and trialkylamines are preferred, and alkyl alcohol amines are the most desirable. Amongst the various alkyl alcohol amines, triethanolamine and triisopropanolamine are the most preferred.
In order to prevent any deterioration in sensitivity caused by the addition of the above component (N), and improve the resist pattern shape and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer, an organic carboxylic acid, or a phosphorus oxo acid or derivative thereof (E) (hereafter referred to as the component (E)) may also be added as another optional component. The component (N) and the component (E) can be used in combination, or either one can also be used alone.
Examples of suitable organic carboxylic acids include malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid.
Examples of suitable phosphorus oxo acids or derivatives thereof include phosphoric acid or derivatives thereof such as esters, including phosphoric acid, di-n-butyl phosphate and diphenyl phosphate; phosphonic acid or derivatives thereof such as esters, including phosphonic acid, dimethyl phosphonate, di-n-butyl phosphonate, phenylphosphonic acid, diphenyl phosphonate, and dibenzyl phosphonate; and phosphinic acid or derivatives thereof such as esters, including phosphinic acid and phenylphosphinic acid, and of these, phosphonic acid is particularly preferred. The component (E) is typically used in a quantity within a range from 0.01 to 5.0 parts by weight per 100 parts by weight of the component (A0).
Other miscible additives can also be added to the negative resist composition according to need, and examples include additive resins for improving the performance of the resist film, surfactants for improving the coating properties, dissolution inhibitors, plasticizers, stabilizers, colorants, halation prevention agents, and dyes.
A negative resist composition according to the second aspect of the present invention includes an alkali-soluble resin component (A″), an acid generator component (B) that generates acid on exposure, and a cross-linking agent component (C) dissolved in a monohydric alcohol-based organic solvent.
A feature of the negative resist composition of this aspect is the use of a monohydric alcohol-based organic solvent. By using a monohydric alcohol-based organic solvent, mixing between the resist layer formed from the negative resist composition, and the other resist layer that contacts the resist layer formed from the negative resist composition can be prevented.
As one example of a potential application, the above negative resist composition is extremely useful when employed within the steps of the first or second example of the first aspect described above. In other words, a resist layer can be formed without any mixing occurring with the other resist layer that contacts the resist layer formed from the negative resist composition of the present invention.
As the component (A″) of the negative resist composition, the types of resin components used in conventional negative resist compositions can be used.
Any resin component that is soluble within alkali developing solutions but then becomes insoluble in alkali as a result of an interaction with the cross-linking agent can be used, and the resin may be appropriately selected from the alkali-soluble resin components used within conventional negative resist compositions.
Examples of suitable resins include novolak resins, polyhydroxystyrenes, copolymers of hydroxystyrene and styrene, and alkali-soluble resin components that contain structural units derived from α-(hydroxyalkyl)acrylic acids, structural units derived from alkyl α-(hydroxyalkyl)acrylate esters, structural units derived from hydroxyalkyl α-(alkyl)acrylate esters, or at least a fluorinated hydroxyalkyl group and an alicyclic group.
Of these possibilities, alkali-soluble resin components containing at least a fluorinated hydroxyalkyl group and an alicyclic group are preferred, and a resin component (A) that includes a structural unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group, and a structural unit (a2), which is a structural unit derived from an acrylate ester and comprises a hydroxyl group-containing alicyclic group is the most desirable.
It is the same as described above for the component (A) of the negative resist composition according to the first aspect.
It is the same as described above for the negative resist composition of the first aspect.
It is the same as described above for the negative resist composition of the first aspect.
It is the same as described above for the negative resist composition of the first aspect.
It is the same as described above for the negative resist composition of the first aspect.
In this aspect of the present invention, a monohydric alcohol-based organic solvent is used. This monohydric alcohol-based organic solvent is an organic solvent that does not dissolve the other resist layer that contacts the resist layer formed from the negative resist composition. As a result, mixing of the resist layers can be suppressed.
As this type of monohydric alcohol-based organic solvent, any solvent that lacks compatibility with the other resist layer can be used.
The expression “does not dissolve the other resist layer” preferably means that at 23° C., when a first resist layer is formed with a film thickness 0.2 μm and this resist layer is then immersed in the organic solvent, no change is observed in the film thickness even after 60 minutes.
Monohydric alcohol-based organic solvents are preferred in terms of the coating properties obtained, and although dependent on the number of carbon atoms, primary or secondary monohydric alcohol-based organic solvents are preferred, and primary monohydric alcohol-based organic solvents are the most desirable.
The boiling point is preferably within a range from 80 to 160° C., and even more preferably from 90 to 150° C., and from the viewpoints of the resulting coating properties, the stability of the composition upon storage, and the heating temperature required in the PAB step and/or PEB step, boiling points within a range from 100 to 135° C. are the most desirable.
In this description, the term “monohydric alcohol-based organic solvent” refers to compounds in which the number of hydroxyl groups incorporated within the alcohol molecule is 1, and does not include dihydric alcohol-based organic solvents, trihydric alcohol-based organic solvents, or derivatives thereof.
Specific examples of the monohydric alcohol-based organic solvent include the same monohydric alcohol-based organic solvents as those exemplified above in relation to the negative resist composition of the first aspect. Of these, isobutanol (2-methyl-1-propanol), 4-methyl-2-pentanol, and n-butanol are preferred. Of these, isobutanol and n-butanol are particularly desirable.
These monohydric alcohol-based organic solvents may be used either alone, or in mixtures of two or more different solvents.
The organic solvent may also include other organic solvents besides the monohydric alcohol-based solvent, provided the solvent does not dissolve the other resist layer, although the alcohol-based solvent preferably accounts for at least 80% by weight, and preferably 100% by weight of the solvent.
Examples of possible other solvents include either one, or two or more solvents selected from known materials used as the solvents for conventional chemically amplified resists.
Suitable examples include lactones such as γ-butyrolactone; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, or the monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate.
There are no particular restrictions on the quantity used of the organic solvent, which is set in accordance with the desired film thickness so as to produce a concentration that enables favorable application to a substrate or the like, and is typically sufficient to produce a solid fraction concentration within the resist composition of 2 to 20% by weight, and preferably from 5 to 15% by weight.
In those cases where a positive resist composition is used as the resist composition that forms the other resist layer, a preferred composition is as described below.
In the following description of the positive resist composition, the meanings of the terms used are as listed below.
The term “(α-lower alkyl)acrylate ester” is a generic term that includes α-lower alkyl acrylates such as methacrylate, and/or acrylate.
Here, an “α-lower alkyl acrylate ester” refers to a structure in which the hydrogen atom bonded to the α-carbon atom of an acrylate ester has been substituted with a lower alkyl group.
A “structural unit” refers to a monomer unit that contributes to the formation of a polymer.
The expression “structural unit derived from an acrylate ester” refers to a structural unit that is formed by cleavage of the ethylenic double bond of an acrylate ester.
The expression “structural unit derived from an α-lower alkyl acrylate ester” refers to a structural unit that is formed by cleavage of the ethylenic double bond of an α-lower alkyl acrylate ester.
The expression “structural unit derived from an (α-lower alkyl)acrylate ester” refers to a structural unit that is formed by cleavage of the ethylenic double bond of an (α-lower alkyl)acrylate ester.
The positive resist composition is a resist composition containing a resin component (A0′) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein
the above component (A0′) is preferably a resin component (A′), which contains structural units derived from (α-lower alkyl)acrylate esters, and exhibits increased alkali solubility under the action of acid.
Moreover, the component (A′) preferably includes a structural unit (a1′) derived from an (α-lower alkyl)acrylate ester that contains an acid dissociable, dissolution inhibiting group, and a structural unit (a′) derived from an (α-lower alkyl)acrylate ester that contains a lactone ring.
Furthermore, the component (A′) preferably also includes a structural unit (a3′) derived from an (α-lower alkyl)acrylate ester that contains a polar group-containing polycyclic group.
Structural Unit (a1′)
In the structural unit (a1′), a hydrogen atom or a lower alkyl group is bonded to the α-carbon atom.
The lower alkyl group is preferably a straight-chain or branched alkyl group of 1 to 5 carbon atoms, and specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, and neopentyl group. Of these, a methyl group is preferred industrially.
Of the above possibilities, a hydrogen atom or a methyl group is preferred.
The acid dissociable, dissolution inhibiting group of the structural unit (a1′) is a group that exhibits an alkali dissolution inhibiting effect that renders the entire component (A′) alkali-insoluble prior to exposure, but then dissociates under the action of acid generated from the acid generator (B) following exposure, causing the entire component (A′) to change to an alkali-soluble state.
The acid dissociable, dissolution inhibiting group can be selected appropriately from the multitude of such groups proposed for use within resins for resist compositions used with an ArF excimer laser. Typically, groups that form either a cyclic or chain-like tertiary alkyl ester, or a cyclic or chain-like alkoxyalkyl ester with the carboxyl group of acrylic acid are the most widely known.
A cyclic or chain-like alkoxyalkyl ester refers to a structure in which the hydrogen atom of a carboxyl group has been substituted with an alkoxyalkyl group to form an ester, so that the alkoxyalkyl group is bonded to the terminal oxygen atom of the carbonyloxy group (—C(O)—O—), and when an acid acts on this alkoxyalkyl ester, the bond between the oxygen atom and the alkoxyalkyl group is broken. Examples of these types of cyclic or chain-like alkoxyalkyl groups include a 1-methoxymethyl group, 1-ethoxyethyl group, 1-isopropoxyethyl group, 1-cyclohexyloxyethyl group, 2-adamantoxymethyl group, 1-methyladamantoxymethyl group, and 4-oxo-2-adamantoxymethyl group.
Examples of acid dissociable, dissolution inhibiting groups that form a chain-like tertiary alkyl ester include a t-butyl group or tert-amyl group.
As the structural unit (a1′), structural units that include an acid dissociable, dissolution inhibiting group that contains a cyclic group, and particularly an alicyclic group, are preferred. The alicyclic group may be either a monocyclic or a polycyclic group, and can be selected appropriately from the multitude of such groups proposed for use within ArF resists, although from the viewpoint of etching resistance, a polycyclic alicyclic group is preferred. Furthermore, the alicyclic group is preferably a hydrocarbon group, and is preferably saturated.
Examples of suitable monocyclic alicyclic groups include groups in which one hydrogen atom has been removed from a cycloalkane. Examples of suitable polycyclic alicyclic groups include groups in which one hydrogen atom has been removed from a bicycloalkane, tricycloalkane or tetracycloalkane or the like.
Specifically, examples of suitable monocyclic groups include a cyclopentyl group or cyclohexyl group. Examples of suitable polycyclic groups include groups in which one hydrogen atom has been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.
Of these groups, an adamantyl group in which one hydrogen atom has been removed from adamantane, a norbornyl group in which one hydrogen atom has been removed from norbornane, a tricyclodecanyl group in which one hydrogen atom has been removed from tricyclodecane, and a tetracyclododecanyl group in which one hydrogen atom has been removed from tetracyclododecane are preferred industrially.
More specifically, the structural unit (a1′) is preferably at least one unit selected from the general formulas (I′) to (III′) shown below.
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and R21 represents a lower alkyl group.]
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and R22 and R23 each represent, independently, a lower alkyl group.]
[wherein, R24 represents a tertiary alkyl group.]
The group R0 is a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably a straight-chain or branched alkyl group of 1 to 5 carbon atoms, and specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, or neopentyl group. Of these, a methyl group is preferred industrially. Furthermore, of the various possibilities, a hydrogen atom or a methyl group is preferred.
The group R21 is preferably a straight-chain or branched lower alkyl group of 1 to 5 carbon atoms, and specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, pentyl group, isopentyl group, or neopentyl group. Of these, a methyl group or ethyl group is preferred from the viewpoint of industrial availability.
The groups R22 and R23 each preferably represent, independently, a straight-chain or branched lower alkyl group of 1 to 5 carbon atoms. Of these groups, those cases in which R22 and R23 are both methyl groups are preferred industrially, and a structural unit derived from 2-(1-adamantyl)-2-propyl acrylate is a specific example.
Furthermore, the group R24 is preferably a chain-like tertiary alkyl group or a cyclic tertiary alkyl group. Examples of chain-like tertiary alkyl groups include a tert-butyl group or tert-amyl group, although those cases in which R24 is a tert-butyl group are preferred industrially. A tertiary alkyl group refers to an alkyl group that includes a tertiary carbon atom.
Examples of cyclic tertiary alkyl groups include the same groups as those exemplified above in relation to the “acid dissociable, dissolution inhibiting group that contains an alicyclic group”, and specific examples include a 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 2-(1-adamantyl)-2-propyl group, 1-ethylcyclohexyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group or 1-methylcyclopentyl group.
Furthermore, the group —COOR24 may be bonded to either position 3 or 4 of the tetracyclododecanyl group shown in the formula, although the bonding position cannot be further specified. Furthermore, the carboxyl group residue of the acrylate structural unit may be bonded to either position 8 or 9 within the formula, although similarly, the bonding position cannot be further specified.
The structural unit (a1′) may use either a single structural unit, or a combination of two or more different structural units.
The proportion of the structural unit (a1′), relative to the combined total of all the structural units within the component (A′), is typically within a range from 20 to 60 mol %, and is preferably from 30 to 50 mol %, and most preferably from 35 to 45 mol %. By ensuring that this proportion is at least as large as the lower limit of the above range, a favorable pattern can be obtained, whereas ensuring that the proportion is no greater than the upper limit enables a favorable balance to be achieved with the other structural units.
Structural Unit (a2′)
In the structural unit (a2′), a hydrogen atom or a lower alkyl group is bonded to the α-carbon atom, as was the case for the structural unit (a1′).
Examples of the structural unit (a2′) include structural units in which a monocyclic group formed from a lactone ring or a polycyclic group that includes a lactone ring is bonded to the ester side-chain portion of an (α-lower alkyl)acrylate ester. The term lactone ring refers to a single ring containing a —O—C(O)— structure, and this ring is counted as the first ring. Accordingly, in this description, the case in which the only ring structure is the lactone ring is referred to as a monocyclic group, and groups containing other ring structures are described as polycyclic groups regardless of the structure of the other rings.
Specific examples of the structural unit (a2′) include units that contain a monocyclic group in which one hydrogen atom has been removed from γ-butyrolactone, and units that contain a polycyclic group in which one hydrogen atom has been removed from a lactone ring-containing bicycloalkane.
Specifically, the structural unit (a2′) is preferably at least one unit selected from general formulas (V′) through (VII′) shown below.
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and R25 and R26 each represent, independently, a hydrogen atom or a lower alkyl group.]
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and m represents either 0 or 1.]
[wherein, R0 represents a hydrogen atom or a lower alkyl group.]
[wherein, R0 represents a hydrogen atom or a lower alkyl group.]
R0 is as described above.
In the formula (IV′), R25 and R26 each represent, independently, a hydrogen atom or a lower alkyl group, and preferably a hydrogen atom.
Suitable lower alkyl groups for the groups R25 and R26 are preferably straight-chain or branched alkyl groups of 1 to 5 carbon atoms, and specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, or neopentyl group. A methyl group is preferred industrially.
Furthermore, amongst the structural units represented by the general formulas (IV′) through (VII′), structural units represented by the general formula (IV′) are preferred, and of the possible structural units represented by the formula (IV′), α-methacryloyloxy-γ-butyrolactone, in which R0 is a methyl group, R25 and R26 are both hydrogen atoms, and the position of the ester linkage between the methacrylate ester and the γ-butyrolactone is at the α-position of the lactone ring, is the most desirable.
The structural unit (a1′) may use either a single structural unit, or a combination of two or more different structural units.
The proportion of the structural unit (a2′), relative to the combined total of all the structural units within the component (A′), is typically within a range from 20 to 60 mol %, and is preferably from 20 to 50 mol %, and most preferably from 30 to 45 mol %. Ensuring that this proportion is at least as large as the lower limit of the above range improves the lithography characteristics, whereas ensuring that the proportion is no greater than the upper limit enables a favorable balance to be achieved with the other structural units.
Structural Unit (a′)
Including the structural unit (a3′) increases the hydrophilicity of the entire component (A′), thereby improving the affinity with the developing solution, improving the alkali solubility within the exposed portions of the resist, and contributing to an improvement in the resolution.
In the structural unit (a3′), either a lower alkyl group or a hydrogen atom may be bonded to the α-carbon atom. Details of suitable lower alkyl groups are as described above.
Examples of the polar group include a hydroxyl group, cyano group, carboxyl group, or amino group or the like, although a hydroxyl group is particularly preferred.
Examples of the polycyclic group include polycyclic alicyclic hydrocarbon groups (polycyclic groups). This polycyclic group can be selected appropriately from the same multitude of polycyclic groups exemplified above in relation to the structural unit (a1′).
Specifically, the structural unit (a3′) is preferably at least one unit selected from the general formulas (VIII′) through (IX) shown below.
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and n′ represents an integer from 1 to 3.]
R0 is as described above.
Of these units, structural units in which n′ is 1, and the hydroxyl group is bonded to position 3 of the adamantyl group are preferred.
[wherein, R0 represents a hydrogen atom or a lower alkyl group, and k represents an integer from 1 to 3.]
R0 is as described above.
Of these units, structural units in which k is 1 are preferred. Furthermore, the cyano group is preferably bonded to position 5 or position 6 of the norbornyl group.
The structural unit (a3′) may use either a single structural unit, or a combination of two or more different structural units.
The proportion of the structural unit (a3′), relative to the combined total of all the structural units that constitute the component (A′), is typically within a range from 10 to 50 mol %, preferably from 15 to 40 mol %, and is most preferably from 20 to 30 mol %.
Ensuring that this proportion is at least as large as the lower limit of the above range improves the lithography characteristics, whereas ensuring that the proportion is no greater than the upper limit enables a favorable balance to be achieved with the other structural units.
The component (A′) may also include structural units other than the aforementioned structural units (a1′) through (a3′), but the combined total of these structural units (a1′) through (a3′), relative to the combined total of all the structural units, is typically at least 70 mol %, preferably 80 mol % or greater, and is most preferably 100 mol %.
A structural unit (a4′) other than the structural units (a1′) through (a3′) may be any other structural unit that cannot be classified as one of the above structural units (a1′) through (a3′), and there are no particular restrictions.
Structural units that, for example, contain a polycyclic alicyclic hydrocarbon group and are derived from an (α-lower alkyl)acrylate ester are preferred. Examples of the polycyclic alicyclic hydrocarbon group include, for example, the same multitude of groups listed above in relation to the structural unit (a1′), and of these, in terms of industrial availability and the like, one or more groups selected from amongst a tricyclodecanyl group, adamantyl group, tetracyclododecanyl group, norbornyl group, and isobornyl group is preferred.
Specific examples of the structural unit (a4′) include units of the structures (X) to (XII) shown below.
(wherein, R1 represents a hydrogen atom or a lower alkyl group.)
This structural unit is typically obtained as a mixture of isomers in which the bonding position is either position 5 or position 6.
(wherein, R0 represents a hydrogen atom or a lower alkyl group.)
(wherein, R0 represents a hydrogen atom or a lower alkyl group.)
R0 is as described above.
In those cases where a structural unit (a4′) is included, the proportion of the structural unit (a4′) within the component (A′), relative to the combined total of all the structural units, is typically within a range from 1 to 25 mol %, and is preferably from 5 to 20 mol %.
Furthermore, the component (A′) preferably includes either a copolymer represented by the chemical formula (A′-1) shown below, or a copolymer represented by the chemical formula (A′-2) shown below, and is even more preferably a mixture of these copolymers.
(wherein, R0 is as defined above.)
The component (A′) may include either a single resin, or a mixture of two or more different resins.
Furthermore, the component (A′) can be obtained, for example, by a conventional radical polymerization or the like of the monomers corresponding with each of the structural units, using a radical polymerization initiator such as azobisisobutyronitrile (AIBN).
Although there are no particular restrictions on the weight average molecular weight (the polystyrene equivalent weight average molecular weight determined by gel permeation chromatography, this also applies below) of the component (A′), the value is typically no more than 30,000, and is preferably no more than 20,000, even more preferably 12,000 or lower, and is most preferably 10,000 or lower.
There are no particular restrictions on the lower limit of the weight average molecular weight, although from the viewpoints of inhibiting pattern collapse and achieving a favorable improvement in resolution and the like, the weight average molecular weight is preferably at least 4,000, and even more preferably 5,000 or greater.
Furthermore, preferred weight average molecular weight values for the component (A0′) are the same as those described for the component (A′).
The component (A0′) may use either a single resin, or a mixture of two or more different resins. Furthermore, the component (A0′) may use a resin besides the component (A′).
The quantity of the component (A0′) is preferably adjusted in accordance with the film thickness of the resist that is to be formed.
It is the same as described for the negative resist composition.
It is the same as described for the negative resist composition.
It is the same as described for the negative resist composition.
The positive resist composition can be produced by dissolving the materials in an organic solvent.
The organic solvent may be any solvent capable of dissolving the various components to generate a uniform solution, and one or more solvents selected from known materials used as the solvents for conventional chemically amplified resists can be used.
Specific examples of the solvent include ketones such as γ-butyrolactone, acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, or the monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate.
These organic solvents may be used either alone, or as a mixed solvent of two or more different solvents.
Furthermore, mixed solvents of propylene glycol monomethyl ether acetate (PGMEA) and a polar solvent are preferred. Although the blend ratio (weight ratio) in such mixed solvents can be set in accordance with factors such as the co-solubility of the PGMEA and the polar solvent, the ratio is preferably within a range from 1:9 to 9:1, and even more preferably from 2:8 to 8:2.
More specifically, in those cases where EL is added as the polar solvent, the weight ratio PGMEA:EL is preferably within a range from 2:8 to 8:2, and even more preferably from 3:7 to 7:3.
Furthermore, as the organic solvent, mixed solvents containing at least one of PGMEA and EL, together with γ-butyrolactone, are also preferred. In such cases, the weight ratio of the former and latter components in the mixed solvent is preferably within a range from 70:30 to 95:5.
There are no particular restrictions on the quantity used of the organic solvent, although the quantity should provide a concentration that enables favorable application of the solution to a substrate or the like, should be set in accordance with the required coating film thickness, and is typically set so that the solid fraction concentration within the resist composition falls within a range from 2 to 20% by weight, and even more preferably from 5 to 15% by weight.
It is the same as described for the negative resist composition.
In the present invention, in a method of forming a resist pattern in which a dense pattern is formed in the lower layer and an isolated pattern is formed in the upper layer, a negative resist composition can be provided that suppresses mixing and enables formation of a favorable shape.
100 parts by weight of a mixture (weight ratio 1:1) of a resin 1 and a resin 2 represented by the chemical formulas shown below as a resin component, 3.0 parts by weight of triphenylsulfonium nonafluorobutanesulfonate as an acid generator, 0.15 parts by weight of triethanolamine as a nitrogen-containing organic compound, and 0.1 parts by weight of a surfactant (product name: R-08, manufactured by Dainippon Ink and Chemicals, Incorporated) as another component were dissolved in a mixed solvent (weight ratio 6:4) of propylene glycol monomethyl ether acetate and ethyl lactate as the organic solvent, yielding a positive resist composition with a solid fraction concentration of 10% by weight.
Resin 1 (weight average molecular weight: 10,000, polydispersity (weight average molecular weight/number average molecular weight): 2.0, l/m/n=4/4/2 (molar ratio))
Resin 2 (weight average molecular weight: 10,000, polydispersity (weight average molecular weight/number average molecular weight): 2.0, l/m/n/n=3/5/2 (molar ratio))
100 parts by weight of a resin 3 represented by a chemical formula shown below as a resin component, 2.0 parts by weight of triphenylsulfonium trifluoromethanesulfonate as an acid generator, 5.0 parts by weight of MX-270 manufactured by SANWA CHEMICAL Co., Ltd. as a cross-linking agent, and 0.1 parts by weight of triethanolamine as a nitrogen-containing organic compound were dissolved in isobutanol as the organic solvent, yielding a negative resist composition with a solid fraction concentration of 6% by weight.
(weight average molecular weight: 5,400, polydispersity (weight average molecular weight/number average molecular weight): 2.0, l/m/n=50/17/33 (molar ratio))
An organic anti-reflective film composition “ARC-29” (a product name, manufactured by Brewer Science Ltd.) was applied to the surface of an 8-inch silicon wafer using a spinner, and the composition was then baked and dried on a hotplate at 215° C. for 60 seconds, thereby forming an organic anti-reflective film with a film thickness of 77 nm.
The positive resist composition prepared in the aforementioned example was then applied to the surface of this anti-reflective film using a spinner, and was then prebaked (PAB) and dried on a hotplate at 115° C. for 60 seconds, thereby forming a resist layer with a film thickness of 300 nm.
Subsequently, this layer was selectively irradiated with an ArF excimer laser (193 nm) through a mask pattern, using an ArF exposure apparatus NSR-S302 (manufactured by Nikon Corporation; NA (numerical aperture)=0.60., σ=0.75).
The resist was then subjected to PEB treatment at 100° C. for 60 seconds, subsequently subjected to puddle development for 60 seconds at 23° C. in a 2.38% by weight aqueous solution of tetramethylammonium hydroxide, and was then washed for 20 seconds with water, and dried, thus forming a 140 nm 1:1 dense hole pattern.
Next, the negative resist composition prepared in the example was applied to the surface of the thus formed dense hole pattern using a spinner, and was then prebaked (PAB) and dried on a hotplate at 80° C. for 60 seconds, thereby forming a resist layer with a film thickness of 200 nm. During this layer formation, no mixing occurred with the lower resist layer. Subsequently, this layer was selectively irradiated with an ArF excimer laser (193 nm) through a mask pattern, using an ArF exposure apparatus NSR-S302 (manufactured by Nikon Corporation; NA (numerical aperture)=0.60, ⅔ annular illumination). The resist layer was then subjected to PEB treatment at 100° C. for 60 seconds, subsequently subjected to puddle development for 60 seconds at 23° C. in a 2.38% by weight aqueous solution of tetramethylammonium hydroxide, and was then washed for 20 seconds with water, and dried, thus forming an isolated-dense mixed pattern including both a 140 nm 1:1 dense contact hole pattern and a 140 nm isolated pattern.
In this manner, in an example according to the present invention, mixing was able to be prevented, and a practical resist pattern was able to be formed.
A negative resist composition of the present invention can be applied to the formation of resist patterns used during the production of semiconductor elements and liquid crystal display elements.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2004-335076 | Nov 2004 | JP | national |
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/JP2005/019726 | 10/26/2005 | WO | 00 | 5/16/2007 |
