Jun Ooyabu

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate control system and shower plate used for partial pressure...
- Patent number 8,109,288
- Issue date Feb 7, 2012
- Tokyo Electron Limited
- Hideki Nagaoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ring mechanism, and plasma processing device using the ring mechanism
- Patent number 7,882,800
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Focus ring and plasma processing apparatus
- Patent number 7,658,816
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,506,610
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial pressure control system, flow rate control system and showe...
- Patent number 7,481,240
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Worktable device and plasma processing apparatus for semiconductor...
- Patent number 6,723,202
- Issue date Apr 20, 2004
- Tokyo Electron Limited
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus for eliminating damages in a...
- Patent number 6,576,860
- Issue date Jun 10, 2003
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus for eliminating damages in a...
- Patent number 6,426,477
- Issue date Jul 30, 2002
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system
- Patent number 6,072,147
- Issue date Jun 6, 2000
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode for manufacturing semiconductors
- Patent number D412513
- Issue date Aug 3, 1999
- Tokyo Electron Limited
- Jun Ooyabu
- D15 - Machines not elsewhere specified

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flow rate control system and shower plate used for partial pressure...
- Publication number 20080300728
- Publication date Dec 4, 2008
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus ring and plasma processing apparatus
- Publication number 20070169891
- Publication date Jul 26, 2007
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060000803
- Publication date Jan 5, 2006
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
- Publication number 20050269292
- Publication date Dec 8, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050257743
- Publication date Nov 24, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050106869
- Publication date May 19, 2005
- Jun Ooyabu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Partial pressure control system, flow rate control system and showe...
- Publication number 20050029369
- Publication date Feb 10, 2005
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ring mechanism, and plasma processing device using the ring mechanism
- Publication number 20050005859
- Publication date Jan 13, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus for eliminating damages in a...
- Publication number 20020179577
- Publication date Dec 5, 2002
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Worktable device and plasma processing apparatus for semiconductor...
- Publication number 20020029745
- Publication date Mar 14, 2002
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Plasma processing method and apparatus

Flow rate control system and shower plate used for partial pressure...

Ring mechanism, and plasma processing device using the ring mechanism

Focus ring and plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method, and electrode plate for pla...

Partial pressure control system, flow rate control system and showe...

Worktable device and plasma processing apparatus for semiconductor...

Plasma processing method and apparatus for eliminating damages in a...

Plasma processing method and apparatus for eliminating damages in a...

Plasma processing system

Upper electrode for manufacturing semiconductors

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING METHOD AND APPARATUS

Flow rate control system and shower plate used for partial pressure...

Focus ring and plasma processing apparatus

Plasma processing method and apparatus

Plasma processing apparatus and method, and electrode plate for pla...

Plasma processing apparatus and method

Plasma processing apparatus

Partial pressure control system, flow rate control system and showe...

Ring mechanism, and plasma processing device using the ring mechanism

Plasma processing method and apparatus for eliminating damages in a...

Worktable device and plasma processing apparatus for semiconductor...