Jun SATO

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition method
- Patent number 11,718,911
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method
- Patent number 11,616,194
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Ken Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 11,495,457
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Jun Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry cleaning a susceptor and substrate processing apparatus
- Patent number 11,479,852
- Issue date Oct 25, 2022
- Tokyo Electron Limited
- Jun Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method
- Patent number 11,393,673
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Takashi Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,367,611
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Yuji Nishino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and film deposition method
- Patent number 11,359,279
- Issue date Jun 14, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 11,131,023
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching object to be processed
- Patent number 10,685,816
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Yoshihiro Umezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle removal method and substrate processing method
- Patent number 10,668,512
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method
- Patent number 10,480,067
- Issue date Nov 19, 2019
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method and sub...
- Patent number 10,217,642
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,202,687
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing a substrate and substrate processing apparatus
- Patent number 10,151,031
- Issue date Dec 11, 2018
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device and operation method
- Patent number 10,103,009
- Issue date Oct 16, 2018
- Tokyo Electron Limited
- Shigehiro Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gap fill using deposition and etch processes
- Patent number 9,865,499
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,865,454
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing object to be processed
- Patent number 9,793,130
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Jun Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a substrate and substrate processing apparatus
- Patent number 9,714,467
- Issue date Jul 25, 2017
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of processing a substrate
- Patent number 9,711,370
- Issue date Jul 18, 2017
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a silicon-containing film
- Patent number 9,607,828
- Issue date Mar 28, 2017
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,601,318
- Issue date Mar 21, 2017
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon oxide film
- Patent number 9,472,394
- Issue date Oct 18, 2016
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming method for forming silicon oxide film on tungsten film...
- Patent number 9,466,476
- Issue date Oct 11, 2016
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming method for forming silicon oxide film on tungsten film...
- Patent number 9,460,913
- Issue date Oct 4, 2016
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process method
- Patent number 9,447,926
- Issue date Sep 20, 2016
- Tokyo Electron Limited
- Naomi Onodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and operation method
- Patent number 9,376,751
- Issue date Jun 28, 2016
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method, film formation apparatus and storage medium
- Patent number 8,853,100
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slimming method of carbon-containing thin film and oxidation apparatus
- Patent number 8,703,000
- Issue date Apr 22, 2014
- Tokyo Electron Limited
- Jun Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method for using same
- Patent number 8,697,578
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20240170281
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Yuya TAKAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240006163
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230402256
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230094328
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20210050208
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20210028356
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Ken ANDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD
- Publication number 20200370178
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD
- Publication number 20200373156
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND FILM DEPOSITION METHOD
- Publication number 20200141001
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DRY CLEANING A SUSCEPTOR AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190360092
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Jun SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20190287787
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Yuji NISHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ETCHING OBJECT TO BE PROCESSED
- Publication number 20180337025
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Yoshihiro UMEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE REMOVAL METHOD AND SUBSTRATE PROCESSING METHOD
- Publication number 20180169716
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20180135178
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170268104
- Publication date Sep 21, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD
- Publication number 20170253964
- Publication date Sep 7, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD
- Publication number 20170218510
- Publication date Aug 3, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING OBJECT TO BE PROCESSED
- Publication number 20170133233
- Publication date May 11, 2017
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND SUB...
- Publication number 20170125258
- Publication date May 4, 2017
- TOKYO ELECTRON LIMITED
- Jun SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20170002464
- Publication date Jan 5, 2017
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR DEPOSITING A SILICON-CONTAINING FILM
- Publication number 20160379868
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Jun SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND OPERATION METHOD
- Publication number 20160268105
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING A SILICON-CONTAINING FILM
- Publication number 20160254136
- Publication date Sep 1, 2016
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20160071722
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE
- Publication number 20160064246
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD FOR FORMING SILICON OXIDE FILM ON TUNGSTEN FILM...
- Publication number 20150332917
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150332895
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND OPERATION METHOD
- Publication number 20150235813
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150225849
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150126044
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Deposition method

Etching method

Film forming method

Method for dry cleaning a susceptor and substrate processing apparatus

Deposition method

Film forming method and film forming apparatus

Cleaning method and film deposition method

Film deposition apparatus and film deposition method

Method of etching object to be processed

Particle removal method and substrate processing method

Film deposition method

Substrate processing apparatus, substrate processing method and sub...

Substrate processing method and substrate processing apparatus

Method for processing a substrate and substrate processing apparatus

Plasma processing device and operation method

Method and apparatus for gap fill using deposition and etch processes

Substrate processing apparatus and substrate processing method

Method for processing object to be processed

Method for processing a substrate and substrate processing apparatus

Substrate processing apparatus and method of processing a substrate

Method of depositing a silicon-containing film

Plasma processing method and plasma processing apparatus

Method of forming silicon oxide film

Film-forming method for forming silicon oxide film on tungsten film...

Film-forming method for forming silicon oxide film on tungsten film...

Plasma process method

Plasma processing device and operation method

Film formation method, film formation apparatus and storage medium

Slimming method of carbon-containing thin film and oxidation apparatus

Film formation apparatus and method for using same

Patents Applicationslast 30 patents

DEPOSITION METHOD AND DEPOSITION APPARATUS

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

DEPOSITION METHOD AND DEPOSITION APPARATUS

FILM FORMING METHOD

ETCHING METHOD

DEPOSITION METHOD

DEPOSITION METHOD

CLEANING METHOD AND FILM DEPOSITION METHOD

METHOD FOR DRY CLEANING A SUSCEPTOR AND SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

METHOD OF ETCHING OBJECT TO BE PROCESSED

PARTICLE REMOVAL METHOD AND SUBSTRATE PROCESSING METHOD

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

METHOD FOR PROCESSING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

FILM DEPOSITION METHOD

FILM DEPOSITION METHOD

METHOD FOR PROCESSING OBJECT TO BE PROCESSED

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND SUB...

Substrate Processing Method and Substrate Processing Apparatus

METHOD AND APPARATUS FOR DEPOSITING A SILICON-CONTAINING FILM

PLASMA PROCESSING DEVICE AND OPERATION METHOD

METHOD OF DEPOSITING A SILICON-CONTAINING FILM

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE

FILM-FORMING METHOD FOR FORMING SILICON OXIDE FILM ON TUNGSTEN FILM...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING DEVICE AND OPERATION METHOD

METHOD FOR PROCESSING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD