Jun Shinagawa

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Virtual metrology for wafer result prediction
- Patent number 12,112,107
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Virtual metrology enhanced plasma process optimization method
- Patent number 11,869,756
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Jun Shinagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool health monitoring and classifications with virtual metrology a...
- Patent number 11,669,079
- Issue date Jun 6, 2023
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor-to-sensor matching methods for chamber matching
- Patent number 10,916,411
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for chamber matching and monitoring
- Patent number 10,622,219
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Jun Shinagawa
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for chamber matching and monitoring
- Patent number 10,438,805
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Jun Shinagawa
- G01 - MEASURING TESTING
Information Patent Grant
E-beam enhanced decoupled source for semiconductor processing
- Patent number 9,177,756
- Issue date Nov 3, 2015
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam enhanced decoupled source for semiconductor processing
- Patent number 9,111,728
- Issue date Aug 18, 2015
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system with source for decoupled ion and r...
- Patent number 8,980,046
- Issue date Mar 17, 2015
- Lam Research Corporation
- Akira Koshiishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pitch reduction using oxide spacer
- Patent number 8,592,318
- Issue date Nov 26, 2013
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL
- Publication number 20230352282
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA FUSION OF MULTIPLE SENSORS
- Publication number 20230317483
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Masaki KITSUNEZUKA
- G05 - CONTROLLING REGULATING
Information Patent Application
VIRTUAL METROLOGY MODEL BASED SEASONING OPTIMIZATION
- Publication number 20230315047
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- G05 - CONTROLLING REGULATING
Information Patent Application
TOOL HEALTH MONITORING AND CLASSIFICATIONS WITH VIRTUAL METROLOGY A...
- Publication number 20230009419
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIRTUAL METROLOGY ENHANCED PLASMA PROCESS OPTIMIZATION METHOD
- Publication number 20220406580
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
VIRTUAL METROLOGY FOR WAFER RESULT PREDICTION
- Publication number 20220092242
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA PROCESSING TOOL MATCHING AFTER PREVE...
- Publication number 20210050191
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Kenichi Usami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR-TO-SENSOR MATCHING METHODS FOR CHAMBER MATCHING
- Publication number 20200051787
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING
- Publication number 20180158652
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Jun SHINAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING
- Publication number 20180158657
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Processing System with Source for Decoupled Ion and R...
- Publication number 20130157469
- Publication date Jun 20, 2013
- LAM RESEARCH CORPORATION
- Akira Koshiishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258601
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258607
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258606
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCTION USING OXIDE SPACER
- Publication number 20120052683
- Publication date Mar 1, 2012
- LAM RESEARCH CORPORATION
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS

Jun Shinagawa

Person

Patents Grantslast 30 patents

Virtual metrology for wafer result prediction

Virtual metrology enhanced plasma process optimization method

Tool health monitoring and classifications with virtual metrology a...

Sensor-to-sensor matching methods for chamber matching

Methods and systems for chamber matching and monitoring

Methods and systems for chamber matching and monitoring

E-beam enhanced decoupled source for semiconductor processing

E-beam enhanced decoupled source for semiconductor processing

Semiconductor processing system with source for decoupled ion and r...

Pitch reduction using oxide spacer

Patents Applicationslast 30 patents

AUTONOMOUS OPERATION OF PLASMA PROCESSING TOOL

DATA FUSION OF MULTIPLE SENSORS

VIRTUAL METROLOGY MODEL BASED SEASONING OPTIMIZATION

TOOL HEALTH MONITORING AND CLASSIFICATIONS WITH VIRTUAL METROLOGY A...

VIRTUAL METROLOGY ENHANCED PLASMA PROCESS OPTIMIZATION METHOD

VIRTUAL METROLOGY FOR WAFER RESULT PREDICTION

METHODS AND SYSTEMS FOR PLASMA PROCESSING TOOL MATCHING AFTER PREVE...

SENSOR-TO-SENSOR MATCHING METHODS FOR CHAMBER MATCHING

METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING

METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING

Semiconductor Processing System with Source for Decoupled Ion and R...

E-Beam Enhanced Decoupled Source for Semiconductor Processing

E-Beam Enhanced Decoupled Source for Semiconductor Processing

E-Beam Enhanced Decoupled Source for Semiconductor Processing

PITCH REDUCTION USING OXIDE SPACER