Junichi Arami

Person

Shinjuku-Ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus
- Patent number 9,653,357
- Issue date May 16, 2017
- Disco Corporation
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 9,379,015
- Issue date Jun 28, 2016
- Disco Corporation
- Sakae Matsuzaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas switching mechanism for plasma processing apparatus
- Patent number 7,717,061
- Issue date May 18, 2010
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus
- Patent number 7,658,801
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Junichi Arami
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus and method, high speed rotary valve...
- Patent number 7,481,902
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin-film deposition apparatus
- Patent number 7,273,526
- Issue date Sep 25, 2007
- ASM Japan K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma processing apparatus
- Patent number 6,764,575
- Issue date Jul 20, 2004
- Tokyo Electron Limited
- Tomomi Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,156,151
- Issue date Dec 5, 2000
- Tokyo Electron Limited
- Mitsuaki Komino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Turbomolecular pump
- Patent number 6,062,810
- Issue date May 16, 2000
- Ebara Corporation
- Matsutaro Miyamoto
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Process chamber apparatus
- Patent number 6,035,804
- Issue date Mar 14, 2000
- Tokyo Electron Limited
- Junichi Arami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process device
- Patent number 6,014,943
- Issue date Jan 18, 2000
- Tokyo Electron Limited
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
One-by-one type heat-processing apparatus
- Patent number 5,958,140
- Issue date Sep 28, 1999
- Tokyo Electron Limited
- Junichi Arami
- C30 - CRYSTAL GROWTH
Information Patent Grant
Single wafer heat treatment apparatus
- Patent number 5,938,850
- Issue date Aug 17, 1999
- Tokyo Electron Limited
- Junichi Arami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating device, method of manufacturing the same, and processing ap...
- Patent number 5,904,872
- Issue date May 18, 1999
- Tokyo Electron Limited
- Junichi Arami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,888,338
- Issue date Mar 30, 1999
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic electrostatic chuck with built-in heater
- Patent number 5,665,260
- Issue date Sep 9, 1997
- Shin-Etsu Chemical Co., Ltd.
- Nobuo Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,660,671
- Issue date Aug 26, 1997
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus
- Patent number 5,618,350
- Issue date Apr 8, 1997
- Tokyo Electron Limited
- Kenji Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 5,591,269
- Issue date Jan 7, 1997
- Tokyo Electron Limited
- Junichi Arami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum exhaust system for processing apparatus
- Patent number 5,575,853
- Issue date Nov 19, 1996
- Tokyo Electron Limited
- Junichi Arami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic electrostatic chuck with built-in heater
- Patent number 5,566,043
- Issue date Oct 15, 1996
- Shin-Etsu Chemical Co., Ltd.
- Nobuo Kawada
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma treatment apparatus
- Patent number 5,542,559
- Issue date Aug 6, 1996
- Tokyo Electron Kabushiki Kaisha
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a multilayer structure for attracting an...
- Patent number 5,539,179
- Issue date Jul 23, 1996
- Tokyo Electron Limited
- Toshihisa Nozawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma processing apparatus
- Patent number 5,474,643
- Issue date Dec 12, 1995
- Tokyo Electron Limited
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Permanent magnet magnetic circuit and magnetron plasma processing a...
- Patent number 5,387,893
- Issue date Feb 7, 1995
- Tokyo Electron Limited
- Masami Oguriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,376,211
- Issue date Dec 27, 1994
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus
- Patent number 5,290,381
- Issue date Mar 1, 1994
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mount for supporting substrates and plasma processing apparatus usi...
- Patent number 5,275,683
- Issue date Jan 4, 1994
- Tokyo Electron Limited
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma apparatus equipped therewith
- Patent number 5,255,153
- Issue date Oct 19, 1993
- Tokyo Electron Limited
- Toshihisa Nozawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma treating apparatus
- Patent number 5,250,137
- Issue date Oct 5, 1993
- Tokyo Electron Limited
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20150020973
- Publication date Jan 22, 2015
- Disco Corporation
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD
- Publication number 20140141596
- Publication date May 22, 2014
- Disco Corporation
- Sakae Matsuzaki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
THIN FILM FORMATION BY ATOMIC LAYER GROWTH AND CHEMICAL VAPOR DEPOS...
- Publication number 20070264427
- Publication date Nov 15, 2007
- ASM JAPAN K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment apparatus
- Publication number 20070095289
- Publication date May 3, 2007
- TOKYO ELECTRON LIMITED
- Junichi Arami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Processing apparatus and processing method
- Publication number 20060027167
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin-film deposition apparatus
- Publication number 20050229848
- Publication date Oct 20, 2005
- ASM JAPAN K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and substrate processing method, hig...
- Publication number 20050074983
- Publication date Apr 7, 2005
- TOKYO ELECTRON LIMITED
- Hiroshi Shinriki
- B08 - CLEANING

Junichi Arami

Person

Patents Grantslast 30 patents

Plasma etching apparatus

Wafer processing method

Gas switching mechanism for plasma processing apparatus

Heat treatment apparatus

Substrate processing apparatus and method, high speed rotary valve...

Thin-film deposition apparatus

Magnetron plasma processing apparatus

Plasma processing apparatus

Turbomolecular pump

Process chamber apparatus

Plasma process device

One-by-one type heat-processing apparatus

Single wafer heat treatment apparatus

Heating device, method of manufacturing the same, and processing ap...

Magnetron plasma processing apparatus and processing method

Ceramic electrostatic chuck with built-in heater

Magnetron plasma processing apparatus and processing method

Processing apparatus

Vacuum processing apparatus

Vacuum exhaust system for processing apparatus

Ceramic electrostatic chuck with built-in heater

Plasma treatment apparatus

Electrostatic chuck having a multilayer structure for attracting an...

Plasma processing apparatus

Permanent magnet magnetic circuit and magnetron plasma processing a...

Magnetron plasma processing apparatus and processing method

Plasma etching apparatus

Mount for supporting substrates and plasma processing apparatus usi...

Electrostatic chuck and plasma apparatus equipped therewith

Plasma treating apparatus

Patents Applicationslast 30 patents

PLASMA ETCHING APPARATUS

WAFER PROCESSING METHOD

THIN FILM FORMATION BY ATOMIC LAYER GROWTH AND CHEMICAL VAPOR DEPOS...

Heat treatment apparatus

Processing apparatus and processing method

Thin-film deposition apparatus

Substrate processing apparatus and substrate processing method, hig...