Kafal Lai

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Poughkeepsie, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Reducing contamination in immersion lithography
- Patent number 7,869,002
- Issue date Jan 11, 2011
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing contamination in immersion lithography
- Patent number 7,782,445
- Issue date Aug 24, 2010
- International Business Machines Corporation
- Dmitriy Shneyder
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY
- Publication number 20080284993
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY
- Publication number 20080284994
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY