Kangzhan Zhang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a silicon nitride stack
- Patent number 7,465,669
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Poly-silicon-germanium gate stack and method for forming the same
- Patent number 7,354,848
- Issue date Apr 8, 2008
- Applied Materials, Inc.
- Ajit Paranjpe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR LOW TEMPERATURE AND LOW K SiBN DEPOSITION
- Publication number 20080145536
- Publication date Jun 19, 2008
- APPLIED MATERIALS, INC.
- KANGZHAN ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of fabricating a silicon nitride stack
- Publication number 20070111538
- Publication date May 17, 2007
- APPLIED MATERIALS, INC.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for the low temperature deposition of doped si...
- Publication number 20070082507
- Publication date Apr 12, 2007
- APPLIED MATERIALS, INC.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLY-SILICON-GERMANIUM GATE STACK AND METHOD FOR FORMING THE SAME
- Publication number 20060231925
- Publication date Oct 19, 2006
- Ajit Paranjpe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low temperature sin deposition methods
- Publication number 20060084283
- Publication date Apr 20, 2006
- Ajit P. Paranjpe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Poly-silicon-germanium gate stack and method for forming the same
- Publication number 20060060920
- Publication date Mar 23, 2006
- APPLIED MATERIALS, INC.
- Ajit Paranjpe
- H01 - BASIC ELECTRIC ELEMENTS

Kangzhan Zhang

Person

Patents Grantslast 30 patents

Method of fabricating a silicon nitride stack

Poly-silicon-germanium gate stack and method for forming the same

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR LOW TEMPERATURE AND LOW K SiBN DEPOSITION

Method of fabricating a silicon nitride stack

Method and apparatus for the low temperature deposition of doped si...

POLY-SILICON-GERMANIUM GATE STACK AND METHOD FOR FORMING THE SAME

Low temperature sin deposition methods

Poly-silicon-germanium gate stack and method for forming the same